Characterizing in-situ deformation of hard pellicle during fabrication and mounting with a sensor array
First Claim
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1. A system comprising:
- a pellicle to be used in photolithography;
a plurality of sensors to measure surface strain of the pellicle as the pellicle is mounted to an object;
a processor to couple to the sensors and to process data from the sensors; and
a pellicle mounter to mount the pellicle according to the processed data to minimize pellicle mounting error.
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Abstract
A system comprising a reticle, a pellicle and a plurality of sensors attached to at least one of the reticle or pellicle. The sensors are configured to sense in-situ strains on the pellicle as the pellicle is mounted to the reticle or frame.
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Citations
36 Claims
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1. A system comprising:
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a pellicle to be used in photolithography;
a plurality of sensors to measure surface strain of the pellicle as the pellicle is mounted to an object;
a processor to couple to the sensors and to process data from the sensors; and
a pellicle mounter to mount the pellicle according to the processed data to minimize pellicle mounting error. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 21, 34)
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16. A mask pellicle system comprising:
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a plurality of sensors to measure surface deflection of the mask pellicle as the mask pellicle is mounted to an object;
a processor to process deflection data from the sensors and coupled to the sensors; and
a feedback and control unit to collect data from the processor and reduce mask pellicle mounting error. - View Dependent Claims (17, 35, 36)
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18. A system to reduce pellicle mounting error comprising:
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a reticle;
a pellicle; and
a plurality of sensors attached to at least one of the reticle or pellicle, wherein the sensors are operative to sense forces on the pellicle as the pellicle is mounted to the reticle;
an array processor to couple to the sensors and to process measurements from the sensors; and
a mounter control to couple to the array processor, the mounter control being operative to adjust pellicle mounting based on processed measurements from the array processor. - View Dependent Claims (19, 20, 22, 23, 24, 25)
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26. A method comprising:
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mounting a pellicle to an object; and
sensing in-situ forces on the pellicle with a plurality of strain-gage sensors during the mounting. - View Dependent Claims (27, 28, 29, 30, 32, 33)
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31. A method comprising:
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mounting a pellicle to an object;
sensing in-situ forces on the pellicle with a plurality of sensors during the mounting; and
adjusting the mounting based on said sensed forces.
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Specification