Microlens arrays having high focusing efficiency

• US 6,835,535 B2
• Filed: 07/30/2001
• Issued: 12/28/2004
• Est. Priority Date: 07/31/2000
• Status: Expired due to Term

• Current Assignee: Corning Incorporated
• Original Assignee: Corning Incorporated
• Inventors: Morris, G. Michael, Sales, Tasso R. M., Gretton, Geoffrey B.
• Primary Examiner(s): Angebranndt, Martin J
• Application Number:
  US09/918,257
• Publication Number:
  US 20020034014A1
• Time in Patent Office: 1,247 Days
• Field of Search: 430/320, 430/321, 430/945, 264/2.5
• US Class Current: 430/321
• CPC Class Codes: G02B 3/0012 characterised by the manufacturing method
• CPC Class Codes: G02B 3/0025 Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
• CPC Class Codes: G02B 3/0031 Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
• CPC Class Codes: G02B 3/0043 Inhomogeneous or irregular arrays, e.g. varying shape, size, height
• CPC Class Codes: G02B 3/08 with discontinuous faces, e.g. Fresnel lens diffractive Fresnel lenses G02B5/1876
• CPC Class Codes: G02B 5/1871 Transmissive phase gratings
• CPC Class Codes: H01L 27/14627 Microlenses
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

Microlens arrays (105) having high focusing efficiencies are provided. The high focusing efficiencies are achieved by accurately producing the individual microlenses making up the array at high fill factors. Arrays of positive microlenses are produced by forming a master having a concave surface-relief pattern (101) in a positive photoresist (21) using direct laser writing. Through this approach, the problems associated with the convolution of a finite laser beam with a desired profile for a microlens are overcome. The microlens arrays of the invention have focusing efficiencies of at least 75%.

Claims

1. A method for producing a microlens array, said microlens array having a surface configuration having peaks and valleys and comprising a plurality of unit cells and a plurality of microlenses, one microlens per unit cell, said method comprising:

(a) providing a positive photoresist;

(b) exposing the positive photoresist with a laser beam having a finite beam width at the photoresist of less than the transverse size of any of the microlenses being formed, said exposing being performed using a direct laser writing process which employs relative movement between the finite beam width of the laser beam and the positive photoresist to form a latent image in the photoresist;

(c) developing the latent image to form a photoresist master, said photoresist master having a surface configuration which is substantially the negative of the surface configuration of the microlens array; and

(d) using the photoresist master to;

(i) produce the microlens array, and/or

(ii) produce a further master used to form the microlens array, said further master having a surface configuration which is substantially the negative of the surface configuration of the microlens array;

wherein;

(A) said microlens array comprises only convex microlenses at adjacent unit cells so that the photoresist master and the further master if produced comprises only concavities at adjacent unit cells;

(B) the microlens array has a focusing efficiency greater than 50 percent; and

(C) the microlens array would have a focusing efficiency of 50 percent or less if prepared by the same direct laser writing process using the same laser beam with the same finite beam width at the photoresist but with the photoresist master being written so as to comprise convexities at adjacent unit cells rather than concavities.

2. The method of claim 1 wherein the photoresist master lies between a first plane and a second plane, the concavities extend into the photoresist master in the direction from the first plane towards the second plane, and the maximum sag of each concavity is at the first plane.

3. The method of claim 1 wherein the photoresist master lies between a first plane and a second plane, the concavities extend into the photoresist master in the direction from the first plane towards the second plane, and the location of the maximum sag of each concavity relative to the first plane varies between at least some adjacent unit cells at a sufficiently slow rate so that the focusing efficiency of the microlens array is not reduced below 75 percent.

4. The method of claim 1 wherein the photoresist master lies between a first plane and a second plane, the concavities extend into the photoresist master in the direction from the first plane towards the second plane, and the distances between the apexes of the concavities and the first plane are different.

5. The method of claim 4 wherein said distances are randomly distributed.

6. The method of claim 5 wherein the microlens array has a focusing efficiency of at least 75 percent.

7. The method of claim 5 wherein the fill factor of the microlens array is at least 90 percent.

8. The method of claim 5 wherein the microlens array has a focusing efficiency of at least 75 percent and a fill factor of at least 90 percent.

9. The method of claim 5 wherein the microlens array has a focusing efficiency of at least 95 percent and a fill factor substantially equal to 100 percent.

10. The method of claim 1 wherein at least one of said concavities is anamorphic.

11. The method of claim 1 wherein the microlens array has a focusing efficiency of at least 75 percent.

12. The method of claim 1 wherein the microlens array has a focusing efficiency of at least 85 percent.

13. The method of claim 1 wherein the microlens array has a focusing efficiency of at least 95 percent.

14. The method of claim 1 wherein the fill factor of the microlens array is at least 90 percent.

15. The method of claim 1 wherein the fill factor of the microlens array is at least 95 percent.

16. The method of claim 1 wherein the fill factor of the microlens array is substantially equal to 100 percent.

17. The method of claim 1 wherein the microlens array has a focusing efficiency of at least 75 percent and a fill factor of at least 90 percent.

18. The method of claim 1 wherein the microlens array has a focusing efficiency of at least 95 percent and a fill factor substantially equal to 100 percent.

19. A method for producing a microlens array, said microlens array having a surface configuration having peaks and valleys and comprising a plurality of unit cells and a plurality of microlenses, one microlens per unit cell, said method comprising:

(a) providing a positive photoresist;

(b) exposing the positive photoresist with a laser beam having a finite beam width at the photoresist of less than the transverse size of any of the microlenses being formed, said exposing being performed using a direct laser writing process which employs relative movement between the finite beam width of the laser beam and the positive photoresist to form a latent image in the photoresist;

(c) developing the latent image to form a photoresist master, said photoresist master having a surface configuration which is substantially the negative of the surface configuration of the microlens array; and

(d) using the photoresist master to;

(i) produce the microlens array, and/or

(ii) produce a further master used to form the microlens array, said further master having a surface configuration which is substantially the negative of the surface configuration of the microlens array;

wherein;

(A) said microlens array comprises only convex microlenses at adjacent unit cells so that the photoresist master and the further master if produced comprises only concavities at adjacent unit cells;

(B) the microlens array has a focusing efficiency greater than 75 percent; and

(C) the microlens array would have a focusing efficiency of 75 percent or less if prepared by the same direct laser writing process using the same laser beam with the same finite beam width at the photoresist but with the photoresist master being written so as to comprise convexities at adjacent unit cells rather than concavities.

20. The method of claim 19 wherein the photoresist master lies between a first plane and a second plane, the concavities extend into the photoresist master in the direction from the first plane towards the second plane, and the distances between the apexes of the concavities and the first plane are different.

21. The method of claim 20 wherein said distances are randomly distributed.

22. The method of claim 19 wherein at least one of said concavities is anamorphic.

23. A method for producing a microlens array, said microlens array having a surface configuration having peaks and valleys and comprising a plurality of unit cells and a plurality of microlenses, one microlens per unit cell, said method comprising:

(a) providing a positive photoresist;

(b) exposing the positive photoresist with a laser beam having a finite beam width at the photoresist of less than the transverse size of any of the microlenses being formed, said exposing being performed using a direct laser writing process which employs relative movement between the finite beam width of the laser beam and the positive photoresist to form a latent image in the photoresist;

(c) developing the latent image to form a photoresist master, said photoresist master having a surface configuration which is substantially the negative of the surface configuration of the microlens array; and

of less than the transverse

(d) using the photoresist master to;

(i) produce the microlens array, and/or

(ii) produce a further master used to form the microlens array, said further master having a surface configuration which is substantially the negative of the surface configuration of the microlens array;

wherein;

(A) said microlens array comprises only convex microlenses at adjacent unit cells so that the photoresist master and the further master if produced comprises only concavities at adjacent unit cells;

(B) the microlens array has a focusing efficiency greater than 85 percent; and

(C) the microlens array would have a focusing efficiency of 85 percent or less if prepared by the same direct laser writing process using the same laser beam with the same finite beam width at the photoresist but with the photoresist master being written so as to comprise convexities at adjacent unit cells rather than concavities.

24. The method of claim 23 wherein the photoresist master lies between a first plane and a second plane, the concavities extend into the photoresist master in the direction from the first plane towards the second plane, and the distances between the apexes of the concavities and the first plane are different.

25. The method of claim 24 wherein said distances are randomly distributed.

26. The method of claim 23 wherein at least one of said concavities is anamorphic.

27. A method for producing a microlens array, said microlens array having a surface configuration having peaks and valleys and comprising a plurality of unit cells and a plurality of microlenses, one microlens per unit cell, said method comprising:

(a) providing a positive photoresist;

(b) exposing the positive photoresist with a laser beam having a finite beam width at the photoresist of less than the transverse size of any of the microlenses being formed, said exposing being performed using a direct laser writing process which employs relative movement between the finite beam width of the laser beam and the positive photoresist to form a latent image in the photoresist;

(c) developing the latent image to form a photoresist master, said photoresist master having a surface configuration which is substantially the negative of the surface configuration of the microlens array; and

(d) using the photoresist master to;

(i) produce the microlens array, and/or

(ii) produce a further master used to form the microlens array, said further master having a surface configuration which is substantially the negative of the surface configuration of the microlens array;

wherein;

(A) said microlens array comprises only convex microlenses at adjacent unit cells so that the photoresist master and the further master if produced comprises only concavities at adjacent unit cells;

(B) the microlens array has a focusing efficiency greater than 95 percent; and

(C) the microlens array would have a focusing efficiency of 95 percent or less if prepared by the same direct laser writing process using the same laser beam with the same finite beam width at the photoresist but with the photoresist master being written so as to comprise convexities at adjacent unit cells rather than concavities.

28. The method of claim 27 wherein the photoresist master lies between a first plane and a second plane, the concavities extend into the photoresist master in the direction from the first plane towards the second plane, and the distances between the apexes of the concavities and the first plane are different.

29. The method of claim 28 wherein said distances are randomly distributed.

30. The method of claim 27 wherein at least one of said concavities is anamorphic.