X-ray projection exposure apparatus and a device manufacturing method

• US 6,836,531 B2
• Filed: 10/07/2003
• Issued: 12/28/2004
• Est. Priority Date: 03/12/1996
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Hara, Shinichi, Tsukamoto, Masami
• Primary Examiner(s): Church, Craig E.
• Application Number:
  US10/679,278
• Publication Number:
  US 20040071260A1
• Time in Patent Office: 448 Days
• Field of Search: 378/34
• US Class Current: 378/34
• CPC Class Codes: G03F 7/70708 being electrostatic; Electrostatically deformable vacuum chucks
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G21K 5/10 with provision for relative movement of beam source and object to be irradiated

Abstract

An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.

Claims

1. An exposure apparatus comprising:

a chuck for holding an object; and

an optical system for directing light from a light source to the object held by said chuck, said optical system including a multilayer film mirror which has a concave reflecting surface,

wherein an area of contacting portions of said chuck is set so that the contacting portions area of the chuck is at most 10% of an area of the object held by said chuck.

2. An exposure apparatus according to claim 1, wherein the area of contacting portions of said chuck is set so that the contacting portions area of the chuck is at most 2% of the area of the object held by said chuck.

3. A device manufacturing method using an exposure apparatus that includes (i) a chuck for holding an object, and (ii) an optical system for directing light from a light surface to the object held by said chuck, said optical system including a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of said chuck is set so that the contacting portions area of the chuck is at most 10% of an area of the object hold by said chuck, said method comprising the steps of:

holding the object by the chuck; and

directing the light to the object using the optical system.

4. An exposure apparatus comprising:

an illumination system for illuminating a reflection mask with light from a light source, said illumination system including a multilayer film mirror which has a concave reflecting surface;

a projection optical system for projecting a pattern of the reflection mask onto an object; and

a mask chuck for holding the reflection mask,

wherein an area of contacting portions of said mask chuck is set so that the contacting portions area of the mask chuck is at most 10% of an area of the reflection mask held by said mask chuck.

5. An exposure apparatus according to claim 4, wherein the area of contacting portions of said mask chuck is set so that the contacting portions area of the mask chuck is at most 10% of the area of the reflection mask held by said mask chuck.

6. A device manufacturing method comprising the steps of:

exposing an object using an exposure apparatus; and

developing the object that has been exposed,

wherein the exposure apparatus includes;

an illumination system for illuminating a reflection mask with light from a light source, said illumination system including a multilayer film mirror which has a concave reflecting surface;

a projection optical system for projecting a pattern of the reflection mask onto the object; and

a mask chuck for holding the reflection mask,

wherein an area of contacting portions of the mask chuck is set so that the contacting portions area of the mask chuck is at most 10% of an area of the reflection mask held by the mask chuck.