Method and apparatus for filtering metrology data based on collection purpose

• US 6,836,691 B1
• Filed: 05/01/2003
• Issued: 12/28/2004
• Est. Priority Date: 05/01/2003
• Status: Expired due to Term

• Current Assignee: Ocean Semiconductor LLC (Fullbrite Capital Partners, LLC)
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Stirton, James B.
• Primary Examiner(s): Picard, Leo
• Assistant Examiner(s): ORTIZ RODRIGUEZ, CARLOS R
• Application Number:
  US10/427,620
• Time in Patent Office: 607 Days
• Field of Search: 700/108, 700/95, 700/110, 700/117, 702/85, 709/108, 709/320, 712/228, 714/25, 714/54, 438/12, 345/708
• US Class Current: 700/108
• CPC Class Codes: G05B 17/02 electric
• CPC Class Codes: G05B 23/0221 Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
• CPC Class Codes: G05B 23/0281 Quantitative, e.g. mathematical distance; Clustering; Neural networks; Statistical analysis

Abstract

A method includes collecting metrology data related to the processing of workpieces in a plurality of tools. Context data for the metrology data is generated. The context data includes collection purpose data. The metrology data is filtered based on the collection purpose data. A process control activity related to one of the tools is conducted based on the filtered metrology data. A system includes at least one metrology tool, a computer, and a process controller. The metrology tool is configured to collect metrology data related to the processing of workpieces in a plurality of tools. The computer is configured to generate context data for the metrology data, the context data including collection purpose data. The process controller is configured to filter the metrology data based on the collection purpose data and conduct a process control activity related to one of the tools based on the filtered metrology data.

Claims

1. A method, comprising:

collecting metrology data related to the processing of workpieces in a plurality of tools;

generating context data for the metrology data, the context data including collection purpose data;

filtering the metrology data based on the collection purpose data; and

conducting a process control activity related to one of the tools based on the filtered metrology data.

2. The method of claim 1, wherein generating the context data further comprises generating identification data associated with the metrology data, and filtering the metrology data further comprises filtering the metrology data based on the identification data and the collection purpose data.

3. The method of claim 1, wherein generating the context data further comprises generating collection purpose data indicating at least one of a process control sampling purpose, a fault detection sampling purpose, and a targeted fault detection purpose.

4. The method of claim 1, further comprising:

identifying a fault condition for a workpiece based on the metrology data; and

changing the collection purpose data responsive to identifying the fault condition.

5. The method of claim 1, further comprising:

identifying an absence of a fault condition for a workpiece based on the metrology data; and

changing the collection purpose data responsive to identifying the absence of the fault condition.

6. The method of claim 1, wherein conducting the process control activity further comprises updating a state of a control model employed by a process controller associated with one of the tools.

7. The method of claim 1, wherein conducting the process control activity further comprises determining at least one parameter of an operating recipe employed by one of the tools.

8. The method of claim 1, wherein filtering the metrology data further comprising excluding metrology data associated with a potential defect condition based on the collection purpose data.

9. The method of claim 1, further comprising storing the metrology data and the context data in a data store.

19. The system of claim 1, wherein the computer comprises at least one of a manufacturing execution system server and a fault monitor.

10. A system, comprising:

at least one metrology tool configured to collect metrology data related to the processing of workpieces in a plurality of tools;

a computer configured to generate context data for the metrology data, the context data including collection purpose data; and

a process controller configured to filter the metrology data based on the collection purpose data and conduct a process control activity related to one of the tools based on the filtered metrology data.

11. The system of claim 10, wherein the context data further comprises identification data associated with the metrology data, and the process controller is further configured to filter the metrology data based on the identification data and the collection purpose data.

12. The system of claim 10, wherein the collection purpose data indicates at least one of a process control sampling purpose, a fault detection sampling purpose, and a targeted fault detection purpose.

13. The system of claim 10, further comprising a fault monitor configured to identify a fault condition for a workpiece based on the metrology data, wherein at least one of the computer and the fault monitor is configured to change the collection purpose data responsive to identifying the fault condition.

14. The system of claim 10, further comprising a fault monitor configured to identify an absence of a fault condition for a workpiece based on the metrology data, wherein at least one of the computer and the fault monitor is further configured to change the collection purpose data responsive to identifying the absence of the fault condition.

15. The system of claim 10, wherein the process controller is further configured to update a state of a control model employed by a process controller associated with one of the tools based on the filtered metrology data.

16. The system of claim 10, wherein the process controller is further configured to determine at least one parameter of an operating recipe employed by one of the tools based on the filtered metrology data.

17. The system of claim 10, wherein the process controller is further configured to filter the metrology data by excluding metrology data associated with a potential defect condition based on the collection purpose data.

18. The system of claim 10, further comprising a data store configured to store the metrology data and the context data.

20. A system, comprising:

means for collecting metrology data related to the processing of workpieces in a plurality of tools;

means for generating context data for the metrology data, the context data including collection purpose data;

means for filtering the metrology data based on the collection purpose data; and

means for conducting a process control activity related to one of the tools based on the filtered metrology data.