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Integrated platen assembly for a chemical mechanical planarization system

  • US 6,837,964 B2
  • Filed: 11/12/2002
  • Issued: 01/04/2005
  • Est. Priority Date: 08/16/2001
  • Status: Expired due to Term
First Claim
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1. An apparatus for supporting a web of polishing material, comprising:

  • a platen assembly having a support surface;

    a web of polishing material having a first portion disposed across the support surface and a second portion wound on a first roll coupled to the platen assembly;

    a platen port disposed in the platen assembly and fluidly coupled to the support surface;

    a venturi having a vacuum port fluidly coupled to the platen port, a pressure supply port and an exit port, wherein fluid flowing between the pressure supply port and the exit port pulls fluid through the vacuum port;

    a valve fluidly coupled to the exit port, the valve having a first state that causes vacuum to be drawn through the vacuum port and a second state that causes flow from the vacuum port through the platen port; and

    a tensioning mechanism coupled to the platen assembly and adapted to tension the web of polishing material in response to a diameter of the second portion of the web of polishing material wound on the first roll.

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