Etching process for making electrodes
First Claim
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1. A process for forming an electrode, the process comprising:
- forming on a substrate, in order, a bottom high index layer, a conductive layer, and a top high index layer with a conductivity of at least about 400 Ω
/square; and
chemically etching the bottom high index layer, the top high index layer and the conductive layer with an etching solution comprising H2SO4 and FeCl3 to form an electrode in the conductive layer.
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Abstract
Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 Ω/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.
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Citations
15 Claims
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1. A process for forming an electrode, the process comprising:
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forming on a substrate, in order, a bottom high index layer, a conductive layer, and a top high index layer with a conductivity of at least about 400 Ω
/square; and
chemically etching the bottom high index layer, the top high index layer and the conductive layer with an etching solution comprising H2SO4 and FeCl3 to form an electrode in the conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A process for forming a substantially transparent electrode, the process comprising:
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depositing on a substrate, in order, a bottom high index layer, a conductive layer, and a top high index layer with a conductivity of at least about 400 Ω
/square,chemically etching in a single bath the bottom high index layer, the top high index layer and the conductive layer to form an electrode in the conductive layer, wherein the bath comprises H2SO4 and FeCl3.
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Specification