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Etching process for making electrodes

  • US 6,838,013 B2
  • Filed: 06/12/2002
  • Issued: 01/04/2005
  • Est. Priority Date: 05/12/2000
  • Status: Expired due to Fees
First Claim
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1. A process for forming an electrode, the process comprising:

  • forming on a substrate, in order, a bottom high index layer, a conductive layer, and a top high index layer with a conductivity of at least about 400 Ω

    /square; and

    chemically etching the bottom high index layer, the top high index layer and the conductive layer with an etching solution comprising H2SO4 and FeCl3 to form an electrode in the conductive layer.

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