Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide

• US 6,840,988 B2
• Filed: 02/11/2003
• Issued: 01/11/2005
• Est. Priority Date: 08/27/1998
• Status: Expired due to Fees

• Current Assignee: MOSAID Technologies Inc. (f/k/a Conversant Intellectual Property Management)
• Original Assignee: Micron Technology, Inc.
• Inventors: Uhlenbrock, Stefan, Marsh, Eugene P.
• Primary Examiner(s): KLEMANSKI, HELENE G
• Application Number:
  US10/365,204
• Publication Number:
  US 20030154880A1
• Time in Patent Office: 700 Days
• Field of Search: 106/1.21, 106/1.24, 106/287.18, 106/287.17
• US Class Current: 106/1.21
• CPC Class Codes: C23C 16/18 from metallo-organic compounds
• CPC Class Codes: C23C 16/40 Oxides
• CPC Class Codes: H01L 21/28556 by chemical means, e.g. CVD, LPCVD, PECVD, laser CVD H01L21/28518 - H01L21/28537 and H01L21/28568 take precedence
• CPC Class Codes: H01L 28/60 Electrodes

Abstract

A method is provided for forming a film of ruthenium or ruthenium oxide to the surface of a substrate by employing the techniques of chemical vapor deposition to decompose ruthenium precursor formulations. The ruthenium precursor formulations of the present invention include a ruthenium precursor compound and a solvent capable of solubilizing the ruthenium precursor compound. A method is further provided for making a vaporized ruthenium precursor for use in the chemical vapor deposition of ruthenium and ruthenium-containing materials onto substrates, wherein a ruthenium precursor formulation having a ruthenium-containing precursor compound and a solvent capable of solubilizing the ruthenium-containing precursor compound is vaporized.

Claims

1. A solvated ruthenium precursor formulation comprising:

a tricarbonyl ruthenium compound containing an oxidizing agent; and

a solvent capable of solubilizing said tricarbonyl ruthenium compound.

2. The formulation of claim 1, wherein said solvated ruthenium precursor formulation is a liquid.

3. The formulation of claim 1, wherein said solvated ruthenium precursor formulation has a freezing point around room temperature.

4. The formulation of claim 1, wherein said solvated ruthenium precursor formulation decomposes at a temperature greater than room temperature.

5. The formulation of claim 1, wherein said oxidizing agent consists of a compound selected from the group consisting of O₂, N₂O, O₃, NO, NO₂, H₂O₂, H₂O, SO₂, SO₃, organic peroxides, and combinations thereof.

6. The formulation of claim 1, wherein said solvated ruthenium precursor formulation further contains oxygen.

7. The formulation of claim 1, wherein said solvated ruthenium precursor formulation further contains N₂O.

8. The formulation of claim 1, wherein said solvent is selected from the group consisting of hexane, pentane, heptane, and butylacetate.

9. A solvated ruthenium precursor formulation comprising:

an oxidized ruthenium compound; and

a solvent selected from the group consisting of hexane, pentane, heptane, and butylacetate.

10. The formulation of claim 9, wherein said solvated ruthenium precursor formulation contains an oxidizing agent.

11. The formulation of claim 10, wherein said oxidized ruthenium compound includes an oxidizing group selected from the group consisting of O₂, N₂O, O₃, NO, NO₂, H₂O₂, H₂O, SO₂, SO₃, organic peroxides, and combinations thereof.

12. The formulation of claim 9, wherein said solvated ruthenium precursor formulation further contains oxygen.

13. A solvated ruthenium precursor formulation comprising:

cyclohexadienetricarbonyl ruthenium;

a solvent selected from the group consisting of hexane, pentane, heptane, and butylacetate; and

an oxidizing agent.

14. The formulation of claim 13, wherein said cyclohexadienetricarbonyl ruthenium is a liquid.

15. The formulation of claim 13, wherein said solvated ruthenium precursor formulation has a freezing point around room temperature.

16. The formulation of claim 13, wherein said solvated ruthenium precursor formulation decomposes at a temperature greater than room temperature.

17. The formulation of claim 13, wherein said cyclohexadienetricarbonyl ruthenium is tricarbonyl ruthenium.

18. The formulation of claim 13, wherein said solvated ruthenium precursor formulation contains an oxidizing agent.

19. The formulation of claim 13, wherein said oxidizing agent consists of a compound selected from the group consisting of O₂, N₂O, O₃, NO, NO₂, H₂O₂, H₂O, SO₂, SO₃, organic peroxides, and combinations thereof.

20. The formulation of claim 13, wherein said cyclohexadienetricarbonyl ruthenium is tricarbonyl (1,2,3,4-η

)-1,3-cyclohexadiene ruthenium.