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Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data

  • US 6,841,403 B2
  • Filed: 01/21/2003
  • Issued: 01/11/2005
  • Est. Priority Date: 09/20/2001
  • Status: Expired due to Term
First Claim
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1. A method for processing detected defect data comprising:

  • a step of generating a defects distribution on a semiconductor substrate in order to investigate the cause of the defects by processing detected defect data obtained by inspecting semiconductor substrates processed until a predetermined sub-process, with an inspection equipment, for defects or suspected defects occurred to the semiconductor substrates in a fabrication line consisting of a plurality of sub-processes arranged in sequence, each sub-process being performed by one or a plurality of manufacturing equipments;

    a step of quantitatively evaluating defect features of the defects distribution on a semiconductor substrate generated by said step of generating a defects distribution;

    a step of generating data of the defect features quantitatively evaluated by said step of quantitatively evaluating defect features for the manufacturing equipments that processed the semiconductor substrates and the sub-processes that applied to the semiconductor substrates; and

    a causation inferring step of evaluating cyclicity of the defect features data for the manufacturing equipments that processed the semiconductor substrates and the sub-processes that applied to the semiconductor substrates, generated by said step of generating data, thereby inferring a causal manufacturing equipment that caused the defects.

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