Method of fabricating a magneto-resistive random access memory (MRAM) device

• US 6,841,484 B2
• Filed: 04/17/2003
• Issued: 01/11/2005
• Est. Priority Date: 04/17/2003
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Yan, Chun, Kumar, Ajay, Chen, Xiaoyi, Ying, Chentsau
• Primary Examiner(s): LE, DUNG ANH
• Application Number:
  US10/418,449
• Publication Number:
  US 20040209476A1
• Time in Patent Office: 635 Days
• Field of Search: 438611-614, 438636-638, 438718-720
• US Class Current: 438/710
• CPC Class Codes: B82Y 25/00 Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C23F 4/00 Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
• CPC Class Codes: H01F 41/308 lift-off processes, e.g. ion milling, for trimming or patterning
• CPC Class Codes: H01L 21/02071 the processing being a delineation, e.g. RIE, of conductive layers
• CPC Class Codes: H01L 21/32136 using plasmas
• CPC Class Codes: H10N 50/01 Manufacture or treatment

Abstract

A method of etching a multi-layer magnetic stack (e.g., layers of cobalt-iron alloy (CoFe), ruthenium (Ru), platinum-manganese alloy (PtMn), and the like) of a magneto-resistive random access memory (MRAM) device is disclosed. Each layer of the multi-layer magnetic stack is etched using a process sequence including a plasma etch step followed by a plasma treatment step. The plasma treatment step uses a plasma comprising an inert gas to remove residues formed during the plasma etch step.

Claims

1. A method of plasma etching metal layers, comprising:

(a) providing a substrate having a patterned mask formed on a plurality of metal layers thereon,

(b) generating a first plasma comprising a first gas mixture;

(c) etching a first metal layer of the plurality of metal layers using the first plasma, wherein metallic residue is formed on the substrate; and

(d) replacing the first plasma with a second plasma comprising an inert gas;

wherein exposure of the substrate to the second plasma removes the metallic residue formed on the substrate.

2. The method of claim 1 wherein the second plasma replaces the first plasma coincident with the end of step (c).

3. The method of claim 1 wherein the inert gas comprises at least one gas selected from the group consisting of argon (Ar), neon (Ne) and helium (He).

4. The method of claim 1 wherein the plurality of metal layers comprise at least one of a magnetic layer and an anti-ferromagnetic layer.

5. The method of claim 1 wherein the plurality of metal layers comprise at least one of cobalt-iron alloy (CoFe), ruthenium (Ru), nickel-iron alloy (NiFe), nickel-iron-chromium alloy (NiFeCr), platinum-manganese alloy (PtMn), iridium-manganese alloy (IrMn), tantalum (Ta) and tantalum nitride (TaN).

6. The method of claim 1 wherein step (d) is performed at a chamber pressure within a range of about 5 to 40 mTorr.

7. The method of claim 1 wherein step (d) comprises exposing the substrate to the second plasma for between about 5 and 30 seconds.

8. The method of claim 1 wherein step (d) comprises:

providing argon (Ar) at a flow of between 50 to 400 sccm;

maintaining the substrate at a temperature of about 15 to 250 degrees Celsius at a process chamber pressure between 5 and 40 mTorr;

applying up to about 3000 W of power to an inductively coupled antenna to form an argon (Ar) plasma; and

exposing the substrate to the argon (Ar) plasma for about 5 to 30 seconds.

9. The method of claim 1 wherein steps (c)-(d) are repeated for at least a second metal layer of the plurality of metal layers.

10. A computer-readable medium containing software that when executed by a computer causes a semiconductor wafer processing system to etch a material layer on a substrate using a method, comprising:

(a) providing a substrate having a patterned mask formed on a plurality of metal layers thereon,

(b) generating a first plasma comprising a first gas mixture;

(c) etching a first metal layer of the plurality of metal layers using the first plasma, wherein metallic residue is formed on the substrate; and

(d) replacing the first plasma with a second plasma comprising an inert gas,

wherein exposure of the substrate to the second plasma removes the metallic residue formed on the substrate.

11. The computer readable medium of claim 10 wherein the second plasma replaces the first plasma coincident with the end of step (c).

12. The computer-readable medium of claim 10 wherein the inert gas comprises at least one gas selected from the group consisting of argon (Ar), neon (Ne) and helium (He).

13. The computer-readable medium of claim 10 wherein the plurality of metal layers comprise at least one of a magnetic layer and an anti-ferromagnetic layer.

14. The computer-readable medium of claim 10 wherein step (d) is performed at a chamber pressure within a range of about 5 to 40 mTorr.

15. The computer-readable medium of claim 10 wherein step (d) is performed for between about 5 and 30 seconds.