Guideless stage with isolated reaction stage
First Claim
1. A method of making a microlithography system that forms an image onto an object, comprising the steps of:
- providing an irradiation apparatus that irradiates the object with radiation to form the image on the object;
providing a movable stage associated with the irradiation apparatus, the movable stage having a first mirror;
providing a first support structure;
providing a second mirror that is connected to the irradiation apparatus;
providing a second support structure dynamically isolated from the first support structure to support the irradiation apparatus, the second support structure including a base member that supports the movable stage;
providing a drive having a first portion connected to the movable stage and a second portion connected to the first support structure to move the movable stage in a two-dimensional plane such that a reaction force exerted by the movement of the movable stage is transferred to the first support structure, the second portion of the drive not contacting the movable stage mechanically; and
providing a position detector that cooperates with the first mirror and the second mirror to detect a position of the movable stage in the two-dimensional plane, the position detector being supported by the second support structure.
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Accused Products
Abstract
A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween. The linear positioning forces of the actuator drive means are mounted and controlled so that the vector sum of the moments of force at the center of gravity of the object stage due to the positioning forces of the drive means is substantially equal to zero. The actuator mounting means can include at least two thin flexible members mounted in series with the primary direction of flex of the members being orthogonal to one another.
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Citations
106 Claims
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1. A method of making a microlithography system that forms an image onto an object, comprising the steps of:
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providing an irradiation apparatus that irradiates the object with radiation to form the image on the object;
providing a movable stage associated with the irradiation apparatus, the movable stage having a first mirror;
providing a first support structure;
providing a second mirror that is connected to the irradiation apparatus;
providing a second support structure dynamically isolated from the first support structure to support the irradiation apparatus, the second support structure including a base member that supports the movable stage;
providing a drive having a first portion connected to the movable stage and a second portion connected to the first support structure to move the movable stage in a two-dimensional plane such that a reaction force exerted by the movement of the movable stage is transferred to the first support structure, the second portion of the drive not contacting the movable stage mechanically; and
providing a position detector that cooperates with the first mirror and the second mirror to detect a position of the movable stage in the two-dimensional plane, the position detector being supported by the second support structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. An image forming method that forms an image onto an object by an irradiation apparatus, comprising the steps of:
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moving a stage in a two-dimensional plane of a base member by a driver, the driver having a first portion connected to the stage and a second portion not connected to the stage mechanically;
transferring a reaction force caused by the movement of the stage to a first support structure, the first support structure connected to the second portion of the driver;
directing a measurement beam to a first mirror of the stage and directing a reference beam to a second mirror connected to the irradiation apparatus by using a position detector;
detecting a position of the stage in the two-dimensional plane by the position detector that is supported by a second support structure dynamically isolated from the first support structure, the second support structure supports the stage, the irradiation apparatus and the base member; and
forming the image onto the object by movement of the stage. - View Dependent Claims (36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59)
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60. A method of making a positioning apparatus that positions an object, comprising the steps of:
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providing a movable stage that holds the object, the movable stage having a first mirror;
providing a first support structure;
providing a second support structure dynamically isolated from the first support structure, the second support structure including a base member that supports the movable stage;
providing a second mirror that is connected to the second support structure;
providing a drive having a first portion connected to the movable stage and a second portion connected to the first support structure to move the movable stage in a two-dimensional plane such that a reaction force exerted by the movement of the movable stage is transferred to the first support structure, the second portion of the drive not in contact with the movable stage mechanically; and
providing a position detector that directs a measurement beam to the first mirror and that directs a reference beam to the second mirror to detect a positional information of the object in the two-dimensional plane, the position detector being supported by the second support structure. - View Dependent Claims (61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76)
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77. A positioning method that positions an object, comprising the steps of:
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moving a stage that holds the object in a two-dimensional plane of a base member by a driver, the driver having a first portion connected to the stage and a second portion not connected to the stage mechanically;
transferring a reaction force caused by movement of the object to a first support structure, the first support structure connected with the second portion of the driver;
directing a measurement beam to a first mirror of the stage and directing a reference beam to a second mirror connected to a second support structure by using a position detector, the second support structure being dynamically isolated from the first support structure;
detecting a position information of the object in the two-dimensional plane by the position detector supported by the second support structure, the second support structure supports the stage and the base member; and
positioning the object based on a detection result by the position detector. - View Dependent Claims (78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92)
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93. A method of making a microlithography system that exposes a pattern of a mask onto an object by a projection system, comprising the steps of:
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providing an object stage that holds the object in association with the projection system, the object stage having a first mirror;
providing a second mirror that is connected to the protection system;
providing a support structure that supports the projection system and the object stage, the support structure having a base member disposed below the projection system to support the object stage;
providing a vibration absorbing assembly that holds the support structure to prevent transmission of vibration from a foundation to the support structure, a holding surface of the vibration absorbing assembly being higher than a surface of the base member and lower than a holding surface of the mask;
providing a drive having a first portion connected to the object stage and a second portion not connected to the object stage to move the object stage;
providing a reaction frame dynamically isolated from the support structure, the reaction frame connected to the second portion of the drive;
providing a position detector that cooperates with the first mirror and the second mirror to detect a position of the object stage, the position detector being supported by the support structure. - View Dependent Claims (94, 95, 96, 97, 98, 99, 100, 101, 102, 103, 104, 105, 106)
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Specification