Exposure apparatus, microdevice, photomask, method of exposure, and method of production of device
First Claim
1. An exposure apparatus which transfers a pattern of a mask onto at least one of different areas with an overlapped peripheral part on a substrate by exposing the at least one area with illumination light irradiated onto the mask, comprising:
- a light attenuating member having a filter disposed on an optical path through which the illumination light passes to reduce the amount of light on the overlapped peripheral part, the filter having an attenuating portion of which a light attenuation rate is gradually varied; and
a detection device which detects a posture of the filter at least in a rotation direction.
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Accused Products
Abstract
A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate (4) while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor (126) on the substrate stage (6), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).
85 Citations
59 Claims
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1. An exposure apparatus which transfers a pattern of a mask onto at least one of different areas with an overlapped peripheral part on a substrate by exposing the at least one area with illumination light irradiated onto the mask, comprising:
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a light attenuating member having a filter disposed on an optical path through which the illumination light passes to reduce the amount of light on the overlapped peripheral part, the filter having an attenuating portion of which a light attenuation rate is gradually varied; and
a detection device which detects a posture of the filter at least in a rotation direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 36)
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20. An exposure apparatus which transfers a pattern of a mask onto at least one of different areas with an overlapped peripheral part on a substrate by exposing the at least one area with illumination light irradiated onto the mask, comprising:
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an illumination system disposed on an optical path through which the illumination light passes to illuminate the mask with th illumination light; and
a light attenuating member having a filter provided in a vicinity of the mask to reduce an amount of light on the overlapped peripheral part, the filter having an attenuating portion of which a light attenuation rate is gradually varied. - View Dependent Claims (21, 22, 23, 24, 25, 26)
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27. An exposure apparatus which transfers a pattern of a mask onto at least one of different areas with an overlapped peripheral part on a substrate by exposing the at least one area with illumination light irradiated onto the mask, comprising:
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a light attenuating member having a filter disposed on an optical path through which the illumination light passes to reduce an amount of light on the overlapped peripheral part, the filter having an attenuating portion of which a light attenuation rate is gradually varied; and
an adjusting device which adjusts posture of the filter so as to align the filter with the mask. - View Dependent Claims (28, 29, 30, 31, 32, 33)
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34. An exposure apparatus which transfers a pattern of a mask onto at least one of different areas with an overlapped peripheral part on a substrate by exposing the at least one area with illumination light irradiated onto the mask, comprising:
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a light attenuating member having an optical device in an optical path through which the illumination light passes to reduce an amount of light on the overlapped peripheral part so that a distribution of the amount of light formed on the substrate by the exposure of each area has sloped portion on the overlapped peripheral part of each area, of which the amount of light is gradually decreased; and
an adjusting device which adjusts a relative positional relationship on the substrate between the sloped portion of the distribution and the transferred pattern. - View Dependent Claims (35, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48)
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49. An exposure method of transferring a pattern of a mask onto at least one of different areas with an overlapped peripheral part on a substrate by exposing the at least one area with illumination light irradiated onto the mask comprising:
reducing an amount of light on the overlapped peripheral part so that a distribution of the amount of light formed on the substrate by the exposure of each area has a sloped portion on the overlapped peripheral part of each area, of which the amount of light is gradually decreased; and
adjusting a relative positional relationship on the substrate between the sloped portion of the distribution and the transferred pattern.- View Dependent Claims (50, 51, 52, 53, 54, 55, 56, 57, 58, 59)
Specification