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Exposure device and method for compensating optical defects

  • US 6,844,920 B2
  • Filed: 03/08/2001
  • Issued: 01/18/2005
  • Est. Priority Date: 03/11/2000
  • Status: Expired due to Term
First Claim
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1. An exposure device for exposing a projection of an electronically stored artwork pattern onto a substrate, in particular a printing plate (1), with image processing electronics (2) that can store the image data, with a light modulator (7) that can be electronically controlled by the image processing electronics (2), in particular an LCD display (7) or a micro-mirror device, with an illuminating device (8, 9) for illuminating the light modulator (7) and with a projection lens for projecting the light modulator (7) onto the substrate (1), characterized in that the image processing electronics (2) include a compensation device (4, 5) to compensate for optical defects and/or tolerances in the beam path of the exposure device, and the compensation device (4, 5) can modulate the total quantity of incident light striking any point of the substrate (1) to be exposed during the exposure process.

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