Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method

• US 6,847,696 B2
• Filed: 10/21/2003
• Issued: 01/25/2005
• Est. Priority Date: 06/03/1999
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Watanabe, Yutaka, Oqushi, Nobuaki, Chinju, Hideyuki, Miyake, Akira
• Primary Examiner(s): Bruce, David V.
• Assistant Examiner(s): THOMAS, COURTNEY D
• Application Number:
  US10/689,031
• Publication Number:
  US 20040081272A1
• Time in Patent Office: 462 Days
• Field of Search: 378/10, 378/19, 378/34, 378/113, 378/119, 378/137, 378/138, 378/145
• US Class Current: 378/34
• CPC Class Codes: H05H 1/0025 by using photoelectric means H05H1/0031 - H05H1/0043 take precedence

Abstract

A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.

Claims

1. A measurement apparatus comprising:

a first detector that measures an intensity of a line-shaped beam from a light source, said first detector configured such that the intensity of the line-shaped beam from the light source is integrated over the entire range of the beam in the vertical direction of the beam;

a second detector for measuring the intensity of the beam at a plurality of points where positions along the vertical direction of the beam are different; and

a calculator for calculating a beam profile in the vertical direction of the beam on the basis of the detections by said first and second detectors.

2. A measurement method comprising the steps of:

measuring an intensity of a line-shaped beam, the intensity being integrated over the entire range of the beam in the vertical direction of the beam;

measuring the intensity of the beam at plurality of points where positions along the vertical direction of the beam are different; and

calculating a beam profile in the vertical direction of the beam on the basis of the respective measumrents.

3. An exposure apparatus comprising:

a mirror for reflecting a beam from a light source;

a stage which holds a substrate to be exposed to the beam; and

a measuring device disposed for measuring intensity distribution of the beam irradiating the substrate, the measuring device comprising;

a first detector that measures an intensity of a line-shaped beam, said first detector configured such that the intensity of the line-shaped beam is integrated over the entire range of the beam in the vertical direction of the beam;

a second detector for measuring the intensity of the beam at a plurality of points where positions along the vertical direction of the beam are different; and

calculating means for calculating a beam profile in the vertical direction of the beam on the basis of the detections by said first and second detectors.

4. An exposure apparatus comprising:

a mirror for reflecting a beam from a light source;

a stage which holds a substrate to be exposed to the beam; and

a measuring device having a measuring method for measuring intensity distribution of a line-shaped beam irradiating the substrate, the measuring method comprising;

measuring an intensity of a line-shaped beam, the intensity being integrated over the entire range of the beam in the vertical direction of the beam;

measuring the intensity of the beam at a plurality of points where positions along the vertical direction of the beam are different; and

calculating a beam profile in the vertical direction of the beam on the basis of the respective measurements.