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Thin layer metal chemical vapor deposition

  • US 6,849,122 B1
  • Filed: 03/07/2002
  • Issued: 02/01/2005
  • Est. Priority Date: 01/19/2001
  • Status: Active Grant
First Claim
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1. A method of forming a metal layer on a workpiece, the method comprising(a) depositing a layer of organo-metallic precursor on a surface of the workpiece;

  • (b) oxidizing the organo-metallic precursor to form a metal oxide layer on the surface; and

    (c) reducing at least a portion of the metal oxide layer to form the metal layer on the workpiece.

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