Method for the production and configuration of organic field-effect transistors (OFET)
First Claim
Patent Images
1. A method for producing an OFET by printing at least one functional polymer onto a substrate, the functional polymer first being applied in an ink-like consistency and then being printed onto the substrate using a printing method by which color images are produced using a functional polymer.
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Abstract
The invention relates to an economical and precise method for the production and configuration of an organic field-effect transistor (OFET) whereby the solubility of at least one functional polymer of an OFET is utilized to such a degree, that the functional polymer is deposited on the OFET, or a substrate, by means of a conventional printing process as for a color.
87 Citations
10 Claims
- 1. A method for producing an OFET by printing at least one functional polymer onto a substrate, the functional polymer first being applied in an ink-like consistency and then being printed onto the substrate using a printing method by which color images are produced using a functional polymer.
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7. A method for producing an OFET by printing at least one functional polymer onto a substrate, the functional polymer first being applied in an ink-like consistency and then being printed onto the substrate in which a pad printing method is employed.
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8. A method for producing an OFET by printing at least one functional polymer onto a substrate, the functional polymer first being applied in an ink-like consistency and then being printed onto the substrate in which a pad made of silicone is employed.
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9. A method for producing an OFET by printing at least one functional polymer onto a substrate, the functional polymer first being applied in an ink-like consistency and then being printed onto the substrate in which a pad roll is employed in a continuous process.
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10. A method for producing an OFET by printing at least one functional polymer onto a substrate, the functional polymer first being applied in an ink-like consistency and then being printed onto the substrate in which a resolution and/or patterning in the μ
- m range is realized.
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Current AssigneePolyIC GmbH & Co. KG (Leonhard KURZ Stiftung & Company KG)
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Original AssigneeSiemens AG
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InventorsRost, Henning, Bernds, Adolf, Clemens, Wolfgang, Fix, Walter
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Primary Examiner(s)Smith, Matthew
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Assistant Examiner(s)LEE, GRANVILL D
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Application NumberUS10/332,140Publication NumberTime in Patent Office1,322 DaysField of Search438/21, 438/82, 438/90, 438/99, 438/197, 257/40US Class Current438/197CPC Class CodesH10K 10/468 characterised by the gate d...H10K 71/13 using printing techniques, ...H10K 71/60 Forming conductive regions ...
