Capacitively coupled plasma reactor with magnetic plasma control
First Claim
1. A plasma reactor comprising:
- a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and a plasma source power electrode connected to said RE power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;
at least a first overhead solenoidal electromagnet adjacent said ceiling, said overhead solenoidal electromagnet, said ceiling, said sidewall and said workpiece support being located along a common axis of symmetry;
a current source connected to said first solenoidal electromagnet and furnishing a first electric current in said first solenoidal electromagnet whereby to generate within said chamber a magnetic field which is a function of said first electric current, said first electric current having a value such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support; and
wherein said electric current is a D.C. electric current and said magnetic field is a static magnetic field.
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Accused Products
Abstract
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the sidewall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.
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Citations
30 Claims
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1. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and a plasma source power electrode connected to said RE power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;
at least a first overhead solenoidal electromagnet adjacent said ceiling, said overhead solenoidal electromagnet, said ceiling, said sidewall and said workpiece support being located along a common axis of symmetry;
a current source connected to said first solenoidal electromagnet and furnishing a first electric current in said first solenoidal electromagnet whereby to generate within said chamber a magnetic field which is a function of said first electric current, said first electric current having a value such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support; and
wherein said electric current is a D.C. electric current and said magnetic field is a static magnetic field. - View Dependent Claims (2, 3)
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4. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and a plasma source power electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;
at least a first overhead solenoidal electromagnet adjacent said ceiling, said overhead solenoidal electromagnet, said ceiling, said sidewall and said workpiece support being located along a common axis of symmetry;
a current source connected to said first solenoidal electromagnet and furnishing a first electric current in said first solenoidal electromagnet whereby to generate within said chamber a magnetic field which is a function of said first electric current, said first electric current having a value such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support; and
a second overhead solenoidal electromagnet approximately concentric with said first overhead solenoidal electromagnet and connected to said current source, said current source furnishing a second electric current to said second solenoidal electromagnet to generate magnetic flux in said second solenoidal electromagnetic that contributes to said magnetic field, whereby said magnetic field is determined by both said first and second electric currents in said first and second solenoidal electromagnets, said first and second electric currents having values such that said magnetic field increases said uniformity of plasma ion density radial distribution. - View Dependent Claims (5, 6, 7, 8, 9)
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10. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and an electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;
a plurality of overhead solenoidal electromagnets adjacent said ceiling for generating a combined magnetic field in said chamber comprising a sum of individual magnetic fields produced by respective ones of said plurality of solenoidal electromagnets, a plurality of electric currents flowing in said solenoidal electromagnets, said combined magnetic field being determined by said plurality of electric currents, wherein said overhead solenoid, said ceiling, said sidewall and said workpiece support are located along a common axis of symmetry;
a current source connected to said plurality of solenoidal electromagnets and furnishing said plurality of electric currents to said solenoidal electromagnets, said electric currents having respective values such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support;
wherein said plurality of solenoidal electromagnets are concentric and are arranged in order of ascending diameter and descending axial height above said ceiling;
wherein the outermost ones of said electromagnets exert a correspondingly greater radial magnetic pressure on plasma across a greater radial area than the innermost ones of said electromagnets; and
wherein the innermost ones of said electromagnets exert radial magnetic pressure on plasma within a region confined near the center of said chamber. - View Dependent Claims (11, 12, 13, 15, 16, 17)
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14. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and an electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;
a plurality of overhead solenoidal electromagnets adjacent said ceiling for generating a combined magnetic field in said chamber comprising a sum of individual magnetic fields produced by respective ones of said plurality of solenoidal electromagnets, a plurality of electric currents flowing in said solenoidal electromagnets, said combined magnetic field being determined by said plurality of electric currents, wherein said overhead solenoid, said ceiling, said sidewall and said workpiece support are located along a common axis of symmetry;
a current source connected to said plurality of solenoidal electromagnets and furnishing said plurality of electric currents to said solenoidal electromagnets, said electric currents having respective values such that said magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support; and
wherein said plurality of electric currents are D.C. electric currents and said combined magnetic field is a static magnetic field.
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18. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and a plasma source power electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;
a plurality of overhead solenoidal magnets adjacent said ceiling having a combined static magnetic field in said chamber comprising a sum of individual static magnetic fields produced by respective ones of said plurality of solenoidal magnets, wherein said overhead solenoid, said ceiling, said sidewall and said workpiece support are located along a common axis of symmetry; and
wherein said combined magnetic field increases uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support. - View Dependent Claims (19, 20)
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21. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and a plasma source power electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;
an overhead solenoidal magnet outside of said chamber and facing an external surface of said ceiling, said overhead solenoidal magnet, said ceiling, said sidewall and said workpiece support being located along a common axis of symmetry; and
said overhead solenoidal magnet having a D.C. magnetic field within said chamber that has a sufficient radial component to increase uniformity of plasma ion density radial distribution about said axis of symmetry near a surface of said workpiece support.
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22. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and an electrode connected to said RF power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma;
a plurality of overhead solenoidal electromagnets adjacent said ceiling for generating a combined magnetic field in said chamber comprising a sum of individual magnetic fields produced by respective ones of said plurality of solenoidal electromagnets, a plurality of electric currents flowing in said solenoidal electromagnets, said combined magnetic field being determined by said plurality of electric currents, wherein said overhead solenoid, said ceiling, said sidewall and said workpiece support are located along a common axis of symmetry;
said plurality of solenoidal electromagnets being concentric and being arranged in order of ascending diameter and descending axial height above said ceiling;
a plasma steering controller connected to said plurality of solenoidal electromagnets and furnishing said plurality of electric currents to said solenoidal electromagnets, said plurality of electric currents constituting a first set of currents whenever plasma is directed primarily at a wafer on said wafer support and constituting a second set of currents different from said first set of currents whenever plasma is directed toward said ceiling. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29)
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30. A plasma reactor comprising:
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a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within said chamber and facing said ceiling for supporting a planar workpiece, said workpiece support and said ceiling together defining a processing region between said workpiece support and said ceiling;
process gas inlets for furnishing process gas into said chamber;
an RF power generator and a plasma source power electrode connected to said RE power generator for capacitively coupling plasma source power into said chamber for maintaining a plasma within said chamber;
a plasma RF bias power generator coupled to said workpiece support, whereby said workpiece support constitutes a bias power electrode;
at least a first overhead solenoidal electromagnet adjacent said ceiling, said overhead solenoidal electromagnet, said ceiling, said sidewall and said workpiece support being located along a common axis of symmetry; and
a current source connected to said first solenoidal electromagnet and furnishing a first electric current in said first solenoidal electromagnet whereby to generate within said chamber a magnetic field which is a function of said first electric current.
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Specification