Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus

• US 6,855,236 B2
• Filed: 12/28/2000
• Issued: 02/15/2005
• Est. Priority Date: 12/28/1999
• Status: Expired due to Term

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Sato, Michio, Yabe, Yoichiro, Nakamura, Takashi
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US09/926,041
• Publication Number:
  US 20030121777A1
• Time in Patent Office: 1,510 Days
• Field of Search: 204/298.12, 204/298.13, 204/298.02, 204/298.11, 204/298.14, 204/298.15, 118/715, 118/720, 118/723.E, 118/728
• US Class Current: 204/298.11
• CPC Class Codes: C23C 14/564 Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
• CPC Class Codes: C23C 16/4404 Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
• CPC Class Codes: C23C 4/00 Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge build-up welding B23K, e.g. B23K5/18, B23K9/04
• CPC Class Codes: C23C 4/02 Pretreatment of the material to be coated, e.g. for coating on selected surface areas
• CPC Class Codes: C23C 4/08 containing only metal elements C23C4/073 takes precedence
• CPC Class Codes: C23C 4/18 After-treatment
• CPC Class Codes: H01J 37/32477 characterised by the means for protecting vessels or internal parts, e.g. coatings
• CPC Class Codes: H01J 37/32559 Protection means, e.g. coatings

Abstract

A component for a vacuum deposition apparatus comprises a component body and a spray deposit formed on a surface of a component body. A spray deposit has surface roughness in which a mean spacing S of tops of local peak of profile is in the range from 50 to 150 μm, and distances to a bottom of profile valley line Rv and to a top of profile peak line are in the ranges from 20 to 70 μm, respectively. Furthermore, a spray deposit has a low hardness coat selected from an Al base spray deposit of Hv 30 (Vickers hardness) or less, a Cu base spray deposit of Hv 100 or less, a Ni base spray deposit of Hv 200 or less, a Ti base spray deposit of Hv 300 or less, a Mo base spray deposit of Hv 300 or less and a W base spray deposit of Hv 500 or less. Such component for a vacuum deposition apparatus may suppress, with stability and effectiveness, peeling of deposition material adhering on a component during deposition. In addition, the number of apparatus cleaning and of exchange of components may be largely reduced. A target comprises a similar spray deposit. A vacuum deposition apparatus is one in which above component for a vacuum deposition apparatus is applied in a holder of a sample to be deposited, a deposition material source holder, a preventive component and so on.

Claims

1. A component of a vacuum deposition apparatus, comprising:

a component body; and

a spray deposit coated on a surface of the component body and having surface roughness in which a mean spacing S of tops of local peak of profile is in a range from 50 to 150 μ

m, a distance from a mean line to a bottom of profile valley line Rv is in a range from 20 to 70 μ

m, and a distance from a mean line to a top of profile peak line Rp is in a range from 20 to 70 μ

m, wherein a difference in distance between the top of profile peak line Rp and the bottom of profile valley line Rv (Rp-Rv) is in a range from −

11 to 6 μ

m so that a film adhered on the surface of the spray deposit grows with a stable columnar structure.

2. The component as set forth in claim 1:

wherein the spray deposit comprises a coat comprising metal of which thermal expansion coefficient is different by 15×

10<sup>−

6</sup>/K or less from that of a material deposited by the vacuum deposition apparatus.

3. The component as set forth in claim 1:

wherein the spray deposit comprises a coat comprising metal of which thermal expansion coefficient is different by 20×

10<sup>−

6</sup>/K or less from that of the component body.

4. The component as set forth in claim 1:

wherein the spray deposit comprises coats of two or more layers of different materials.

5. The component as set forth in claim 4:

wherein the spray deposit comprises a stress relief layer formed on the component body and comprising at least one of Al, Cu, or Ni or alloys of Al, Cu, or Ni, and a thermal expansion relief layer formed on the stress relief layer and comprising metal of which thermal expansion coefficient is different by 10×

10<sup>−

6</sup>/K or less from that of a material deposited by the vacuum deposition apparatus.

6. The component as set forth in claim 1:

wherein the spray deposit comprises at least one coat selected from an Al base spray deposit of Vickers hardness of Hv 30 or less, a Cu base spray deposit of Vickers hardness of Hv 100 or less, a Ni base spray deposit of Vickers hardness of Hv 200 or less, a Ti base spray deposit of Vickers hardness of Hv 300 or less, a Mo base spray deposit of Vickers hardness of Hv 300 or less, and a W base spray deposit of Vickers hardness of Hv 500 or less.

7. The component as set forth in claim 1:

wherein the spray deposit has a thickness in the range from 50 to 500 μ

m.

8. The component as set forth in claim 1:

wherein the mean spacing S of tops of local peak of profile is more than 100 μ

m.

9. The component as set forth in claim 1:

wherein the mean spacing S of tops of local peak of profile is 107 μ

m or more.

10. A vacuum deposition apparatus, comprising:

a vacuum chamber;

a sample holder holding a sample to be deposited and disposed in the vacuum chamber;

a deposition material source disposed in the vacuum chamber facing to the sample holder;

a source holder holding the deposition material source; and

a preventive component disposed in the surroundings of the sample holder or the source holder;

wherein at least one selected from the sample holder, the source holder and the preventive component comprises the component for a vacuum deposition apparatus set forth in claim 1.

11. The vacuum deposition apparatus as set forth in claim 10:

wherein the spray deposit formed on the surface of the component for a vacuum deposition apparatus comprises a coat containing at least one of metal forming the deposition material source.

12. The vacuum deposition apparatus as set forth in claim 10:

wherein the deposition apparatus is a sputtering apparatus.

13. A target apparatus, comprising:

a target body; and

a spray deposit coated on a non-erosion area of the target body and having surface roughness in which a mean spacing S of tops of local peak of profile is in a range from 50 to 150 μ

m, a distance from a mean line to a bottom of profile valley line Rv is in a range from 20 to 70 μ

m, and a distance from a mean line to a top of profile peak line Rp is in a range from 20 to 70 μ

m, wherein a difference in distance between the top of profile peak line Rp and the bottom of profile valley line Rv (Rp-Rv) is in a range from −

11 to 6 μ

m so that a film adhered on the surface of the spray deposit grows with a stable columnar structure.

14. The target apparatus as set forth in claim 13:

wherein the mean spacing S of tops of local peak of profile is more than 100 μ

m.

15. The target apparatus as set forth in claim 13:

wherein the mean spacing S of tops of local peak of profile is 107 μ

m or more.

16. A target apparatus, comprising:

a target; and

a backing plate comprising a backing plate body holding the target, and a spray deposit coated on a surface of the backing plate body and having surface roughness in which a mean spacing S of tops of local peak of profile is in a range from 50 to 150 μ

m, a distance from a mean line to a bottom of profile valley line Rv is in a range from 20 to 70 μ

m, and a distance from a mean line to a top of profile peak line Rp is in a range from 20 to 70 μ

m, wherein a difference in distance between the top of profile peak line Rp and the bottom of profile valley line Rv (Rp-Rv) is in a range from −

11 to 6 μ

m so that a film adhered on the surface of the spray deposit grows with a stable columnar structure.

17. The target apparatus as set forth in claim 16:

wherein the mean spacing S of tops of local peak of profile is more than 100 μ

m.

18. The target apparatus as set forth in claim 16:

wherein the mean spacing S of tops of local peak of profile is 107 μ

m or more.