Sample processing apparatus, methods and systems

• US 6,855,553 B1
• Filed: 10/02/2000
• Issued: 02/15/2005
• Est. Priority Date: 10/02/2000
• Status: Expired due to Fees

• Current Assignee: 3M Innovative Properties Company (3M Company)
• Original Assignee: 3M Innovative Properties Company (3M Company)
• Inventors: Bedingham, William, Robole, Barry W., Aysta, James
• Primary Examiner(s): Warden, Jill
• Assistant Examiner(s): Gordon, Brian R.
• Application Number:
  US09/677,805
• Time in Patent Office: 1,597 Days
• Field of Search: 422/101, 422/63, 422/64, 436/180, 436/174, 436/177, 436/43, 436/45
• US Class Current: 436/45
• CPC Class Codes: B01L 3/0293 for liquids
• CPC Class Codes: G01N 21/07 Centrifugal type cuvettes G01N21/09 takes precedence
• CPC Class Codes: G01N 35/028 having reaction cells in the form of microtitration plates
• CPC Class Codes: G01N 35/10 Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices G01N35/0099 takes precedence
• CPC Class Codes: Y10T 436/11 Automated chemical analysis
• CPC Class Codes: Y10T 436/111666 Utilizing a centrifuge or compartmented rotor
• CPC Class Codes: Y10T 436/25 including sample preparation
• CPC Class Codes: Y10T 436/25375 Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.]

Abstract

Apparatus, methods, and systems for processing sample materials that may be presented in a standard microtiter plate are disclosed. The present invention provides a bridge between the standard microtiter plate systems, methods, protocols, etc. with their stationary wells and rotating sample processing devices that allow users to obtain the rapid processing advantages of the newer sample processing devices while retaining the benefits of the standard microtiter plate formats.

Claims

1. An apparatus for processing sample materials, the apparatus comprising:

a platform comprising an upper surface and a lower surface;

a plurality of stationary fluid chambers opening at the upper surface of the platform;

retention structure occupying a portion of the upper surface of the platform, wherein the retention structure is capable of retaining a rotating multi-chambered processing device proximate the upper surface of the platform, and wherein at least some of the plurality of stationary fluid chambers further comprise filter material.

2. An apparatus according to claim 1, wherein the fluid chambers comprising filter material further comprise a drain port opening at the lower surface of the platform.

3. An apparatus according to claim 2, wherein each of the drain ports comprises a drain extension.

4. An apparatus for processing sample materials, the apparatus comprising:

a platform comprising an upper surface and a lower surface;

a plurality of stationary fluid chambers opening at the upper surface of the platform, wherein the plurality of stationary fluid chambers are arranged in a rectilinear array on the upper surface of the platform;

retention structure occupying a portion of the upper surge of the platform; and

a processing device located within the retention structure proximate the upper surface of the platform, the processing device comprising a plurality of process chambers, wherein the processing device is capable of being rotated within the retention structure to move the plurality process chambers, and wherein at least one of the process chambers on the processing device is positioned at a transfer site proximate the upper surface of the platform, wherein the location of the transfer site is fixed relative to the stationary fluid chambers, and further comprising complementary registration structure on the platform and the processing device, the complementary registration structure aligning the at least one process chamber at the location defined by the rectilinear array of the stationary fluid chamber when the processing device is stationary.

5. An apparatus for processing sample materials, the apparatus comprising:

a platform comprising an upper surface and a lower surface;

a plurality of stationary fluid chambers opening at the upper surface of the platform, wherein at least some of the plurality of stationary fluid chambers further comprise filter material;

retention structure occupying a portion of the upper surface of the platform; and

a processing device located within the retention structure proximate the upper surface of the platform, the processing device comprising a plurality of process chambers, wherein the processing device is capable of being rotated within the retention structure to move the plurality process chambers.

6. An apparatus according to claim 5, wherein the fluid chambers comprising filter material further comprise a drain port opening at the lower surface of the platform.

7. An apparatus according to claim 6, wherein each of the ports comprises a drain extension.

8. An apparatus according to claim 6, further comprising a vacuum manifold.

9. An apparatus for processing sample materials, the apparatus comprising:

a platform comprising an upper surface and a lower surface;

a plurality of stationary fluid chambers opening at the upper surface of the platform;

retention structure occupying a portion of the upper surface of the platform; and

a processing device located within the retention structure proximate the upper surface of the platform, the processing device comprising a plurality of process chambers, wherein the processing device is capable of being rotated within the retention structure to move the plurality of process chambers, and wherein the processing device is captive within the retention structure on the platform.

10. A method of processing sample material, the method comprising:

providing a platform comprising an upper surface and a lower surface, a plurality of stationary fluid chambers opening at the upper surface of the platform, and retention structure occupying a portion of the upper surface of the platform;

providing a processing device in the retention structure proximate the upper surface of the platform, the processing device comprising a plurality of process chambers;

providing sample material in a plurality of the plurality of process chambers on the processing device;

delivering energy to the process chambers containing sample material to raise the temperature of the sample materials in the process chambers; and

rotating the processing device about an axis of rotation within the retention structure while delivering the energy, wherein the temperature of the sample materials in the process chambers is controlled as the processing device rotates to process the sample materials.

11. A method according to claim 10, wherein the energy comprises electromagnetic energy.

12. A method according to claim 10, wherein rotating the processing device comprises extending a spindle through a spindle opening formed through the upper and lower surfaces of the platform, the spindle opening located within the retention structure, and rotating the processing device using the spindle.

13. A method according to claim 10, further comprising transferring the sample materials from the process chambers on the processing device to the plurality of stationary fluid chambers on the platform after processing the sample materials.

14. A method according to claim 13, wherein the fluid chambers comprise filter material.

15. A method according to claim 13, further comprising transferring the sample material from the fluid chambers of the platform to a microliter plate comprising a plurality of wells.

16. A method according to claim 15, wherein transferring the sample materials comprises passing the sample materials in the fluid chambers through drain ports opening at the lower surface of the platform.

17. A method according to claim 16, wherein the fluid chambers comprise filter material, and further wherein passing the sample material through the drain ports comprises passing the sample materials through the filter material in the fluid chambers.

18. A method according to claim 16, wherein the passing of sample material through the drain ports is accomplished using vacuum.

19. A method according to claim 18, wherein the vacuum is delivered by placing the lower surface of the platform on a vacuum manifold and drawing a vacuum between the platform and the vacuum manifold.

20. A method according to claim 10, wherein the plurality of stationary fluid chambers on the platform are arranged in a rectilinear array on the upper surface of the platform.

21. A method according to claim 20, further comprising positioning at least one of the process chains on the processing device at a transfer site proximate the upper surface of the platform, wherein the location of the transfer site is fixed relative to the stationary fluid chambers.

22. A method according to claim 21, further comprising transferring the sample material from the process chamber located at the transfer site to one of the stationary fluid chambers on the platform after processing the sample materials.

23. A method according to claim 21, wherein the positioning further comprises providing complementary registration structure on the platform and the processing device, the complementary registration structure aligning the at least one process chamber at the transfer site when the processing device is stationary.

24. A method of processing sample material, the method comprising:

providing a platform comprising an upper surface and a lower surface, a plurality of stationary fluid chambers opening at the upper surface of the platform, and retention structure occupying a portion of the upper surface of the platform, wherein the plurality of stationary fluid chambers are arranged in a rectilinear array on the upper surface of the platform;

placing a processing device in the retention stricture proximate the upper surface of the platform, the processing device comprising a plurality of process chambers;

positioning at least one of the process chambers on the processing device at a transfer site proximate the upper suite of the platform, wherein the location of the transfer site is fixed relative to the stationary fluid chambers;

loading sample material in a plurality of the plurality of process chambers on the processing device, wherein the process chamber are loaded while positioned at the transfer site;

rotating the processing device about an axis of rotation within the retention structure on a spindle extending through a spindle opening formed through the upper and lower surfaces of the platform;

delivering energy to at least some of the plurality of process chambers containing sample material while rotating the processing device to control the temperature of the sample materials in the process chambers, whereby the sample materials am processed; and

transferring the sample materials from the process chambers on the processing device to the plurality of stationary fluid chambers on the platform after processing the sample materials;

where the sample materials in the process chamber are transferred while the process chambers are located at the transfer site.

25. A method according to claim 24, wherein the energy comprises electromagnetic energy.

26. A method according to claim 24, wherein the fluid chambers comprise filter material.

27. A method according to claim 26, further comprising transferring the sample material from the stationary fluid chambers of the platform to a microtiter plate comprising a plurality of wells.

28. A method according to claim 27, wherein the transferring of sample materials from the stationary fluid chambers comprises passing the sample materials in the fluid chambers through drain ports opening at the lower surface of the platform.

29. A method according to claim 28, wherein the fluid chambers comprise filter material, and farther wherein passing the sample material through the drain ports comprises passing the sample materials through the filter material in the fluid chambers.

30. A method according to claim 28, wherein the passing of sample material through the drain ports is accomplished using vacuum.

31. A method according to claim 30, wherein the vacuum is delivered by placing the lower surface of the platform on a vacuum manifold and drawing a vacuum between the platform and the vacuum manifold.

32. A method according to claim 24, wherein the positioning further comprises providing complementary registration structure on the platform and the processing device, the complementary registration structure aligning the at least one process chamber at the transfer site when the processing device is stationary.

33. A system for processing sample material, the system comprising:

a workspace comprising a processing station;

at least one platform located within the workspace, each platform comprising an upper surface and a lower surface, a plurality of stationary fluid chambers opening at the upper surface of the platform, and retention structure occupying a portion of the upper surface of the platform;

at least one processing device located within the workspace, each processing device comprising a plurality of process chambers, wherein rotation of the processing device within the retention structure on the platform moves the plurality of process chambers in a circular pattern;

a spindle located at the processing station; and

a transfer device operative within the workspace, the transfer device capable of erring sample material from the processing station to another location within the workspace.

34. A system according to claim 33, wherein the workspace further comprises an unloading station, and further wherein the transfer device transfers sample material by transferring the at least one platform from the processing station to the unloading station.

35. A system according to claim 33, wherein the transfer device is capable of transferring sample material from the at least one processing device to the stationary fluid chambers of the at least one platform.

36. A system according to claim 33, further comprising a plurality of processing devices located within the workspace.

37. A system according to claim 33, further comprising a plurality of platforms located within the workspace.

38. A system according to claim 33, wherein the at least one platform further comprises a spindle opening formed through the upper and lower surfaces of the platform, the spindle opening located within the retention structure, whereby a spindle is capable of contacting and rotating the processing device proximate the upper surface of the platform when the platform and the processing device are located at the processing station.