Methods of using adaptive sampling techniques based upon categorization of process variations, and system for performing same
First Claim
1. A method, comprising:
- acquiring metrology data regarding at least one process operation performed on a plurality of substrates in accordance with an initial metrology sampling plan;
providing said acquired metrology data to a controller that identifies process variations in said at least one process operation based upon said acquired metrology data and further identifies a plurality of categories of said process variations;
creating, using said controller, a modified metrology sampling plan based upon a relative weighting of said identified categories of said process variations, said modified metrology sampling plan differing from said initial metrology sampling plan in at least one aspect; and
acquiring metrology data from at least one subsequently processed wafer in accordance with said modified metrology sampling plan.
1 Assignment
0 Petitions
Accused Products
Abstract
Methods of using adaptive sampling techniques based upon categorization of process variations, and a system for performing same are disclosed. In one illustrative embodiment, the method comprises acquiring metrology data regarding at least one process operation performed on a plurality of substrates in accordance with an initial metrology sampling plan, providing the acquired metrology dam to a controller that identifies process variations in the at least one process operation based upon the acquired metrology data and further identifies a plurality of categories of the process variations. The method further comprises creating, using the controller, a modified metrology sampling plan based upon a relative weighing of the identified categories of the process variations, wherein the modified metrology sampling plan differs from the initial metrology sampling plan in at least one aspect, and acquiring metrology data from at least one subsequently processed wafer in accordance with the modified neology sampling plan.
-
Citations
24 Claims
-
1. A method, comprising:
-
acquiring metrology data regarding at least one process operation performed on a plurality of substrates in accordance with an initial metrology sampling plan;
providing said acquired metrology data to a controller that identifies process variations in said at least one process operation based upon said acquired metrology data and further identifies a plurality of categories of said process variations;
creating, using said controller, a modified metrology sampling plan based upon a relative weighting of said identified categories of said process variations, said modified metrology sampling plan differing from said initial metrology sampling plan in at least one aspect; and
acquiring metrology data from at least one subsequently processed wafer in accordance with said modified metrology sampling plan. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A method, comprising:
-
acquiring metrology data regarding at least one process operation performed on a plurality of substrates in accordance with an initial metrology sampling plan;
providing said a metrology data to a controller that identifies process variations in said at least one process operation based upon said acquired metrology data and further identifies a plurality of categories of said process variations;
creating, using said controller, a modified metrology sampling plan based upon a relative weighting of said identified categories of said process variations, said modified metrology sampling plan involving acquiring an enhanced amount of metrology data relevant to one of said identified categories having a higher relative weighting; and
acquiring metrology data from at least one subsequently processed wafer in accordance with said modified metrology sampling plan. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
-
Specification