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Method of forming MEMS device

  • US 6,861,277 B1
  • Filed: 10/02/2003
  • Issued: 03/01/2005
  • Est. Priority Date: 10/02/2003
  • Status: Expired due to Term
First Claim
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1. A method of forming a MEMS device, the method comprising:

  • depositing a conductive material on a substructure;

    forming a first sacrificial layer over the conductive material, including forming a substantially planar surface of the first sacrificial layer;

    forming a first element over the substantially planar surface of the first sacrificial layer, including communicating the first element with the conductive material through the first sacrificial layer;

    forming a second sacrificial layer over the first element, including forming a substantially planar surface of the second sacrificial layer;

    forming a support through the second sacrificial layer to the first element after forming the second sacrificial layer, including filling the support;

    forming a second element over the support and the substantially planar surface of the second sacrificial layer; and

    substantially removing the first sacrificial layer and the second sacrificial layer, including supporting the second element relative to the first element with the support.

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