Method of forming MEMS device
First Claim
1. A method of forming a MEMS device, the method comprising:
- depositing a conductive material on a substructure;
forming a first sacrificial layer over the conductive material, including forming a substantially planar surface of the first sacrificial layer;
forming a first element over the substantially planar surface of the first sacrificial layer, including communicating the first element with the conductive material through the first sacrificial layer;
forming a second sacrificial layer over the first element, including forming a substantially planar surface of the second sacrificial layer;
forming a support through the second sacrificial layer to the first element after forming the second sacrificial layer, including filling the support;
forming a second element over the support and the substantially planar surface of the second sacrificial layer; and
substantially removing the first sacrificial layer and the second sacrificial layer, including supporting the second element relative to the first element with the support.
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Abstract
A method of forming a MEMS device includes depositing a conductive material on a substructure, forming a first sacrificial layer over the conductive material, including forming a substantially planar surface of the first sacrificial layer, and forming a first element over the substantially planar surface of the first sacrificial layer, including communicating the first element with the conductive material through the first sacrificial layer. In addition, the method includes forming a second sacrificial layer over the first element, including forming a substantially planar surface of the second sacrificial layer, forming a support through the second sacrificial layer to the first element after forming the second sacrificial layer, including filling the support, and forming a second element over the support and the substantially planar surface of the second sacrificial layer. As such, the method further includes substantially removing the first sacrificial layer and the second sacrificial layer, thereby supporting the second element relative to the first element with the support.
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Citations
27 Claims
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1. A method of forming a MEMS device, the method comprising:
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depositing a conductive material on a substructure;
forming a first sacrificial layer over the conductive material, including forming a substantially planar surface of the first sacrificial layer;
forming a first element over the substantially planar surface of the first sacrificial layer, including communicating the first element with the conductive material through the first sacrificial layer;
forming a second sacrificial layer over the first element, including forming a substantially planar surface of the second sacrificial layer;
forming a support through the second sacrificial layer to the first element after forming the second sacrificial layer, including filling the support;
forming a second element over the support and the substantially planar surface of the second sacrificial layer; and
substantially removing the first sacrificial layer and the second sacrificial layer, including supporting the second element relative to the first element with the support. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of forming a micro-mirror device, the method comprising:
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depositing a conductive material on a substructure;
forming a first layer of sacrificial material over the conductive material;
forming a hinge element over the first layer of sacrificial material, including communicating the hinge element with the conductive material through the first layer of sacrificial material;
forming a second layer of sacrificial material over the hinge element;
forming a plugged via through the second layer of sacrificial material to the hinge element after forming the second layer of sacrificial material;
forming a reflective element over the plugged via and the second layer of sacrificial material; and
substantially removing the first layer and the second layer of sacrificial material, including supporting the reflective element relative to the hinge element with the plugged via. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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Specification