Optical waveguide element, manufacturing method for optical waveguide element, optical deflecting element, and optical switching element

• US 6,862,393 B2
• Filed: 11/08/2002
• Issued: 03/01/2005
• Est. Priority Date: 03/15/2000
• Status: Expired due to Fees

• Current Assignee: EpiPhotonics Corp.
• Original Assignee: Nozomi Photonics Co., Ltd.
• Inventors: Nashimoto, Keiichi
• Primary Examiner(s): Nasri, Javaid H.
• Application Number:
  US10/290,214
• Publication Number:
  US 20030081900A1
• Time in Patent Office: 844 Days
• Field of Search: 385/14, 385/129, 385/130, 385/131, 385/132, 385/43
• US Class Current: 385/129
• CPC Class Codes: G02B 2006/12145 Switch
• CPC Class Codes: G02B 6/1228 Tapered waveguides, e.g. integrated spot-size transformers for coupling with fibres G02B6/305
• CPC Class Codes: G02B 6/131 by using epitaxial growth epitaxial growth for semiconductors H01L21/02365
• CPC Class Codes: G02B 6/136 by etching
• CPC Class Codes: G02B 6/305 and having an integrated mode-size expanding section, e.g. tapered waveguide
• CPC Class Codes: G02F 1/0553 specially adapted for gating or modulating in optical waveguides

Abstract

An optical waveguide element capable of being coupled with optical fibers at high coupling efficiency is to be provided. Also an optical waveguide element manufacturing method permitting accurate production of such optical waveguide elements is to be provided. The optical waveguide element is provided with a buffer layer formed over a monocrystalline substrate and an optical waveguide layer formed over the buffer layer, and a recess is formed in the buffer layer along the lengthwise direction of the monocrystalline substrate. The optical waveguide layer is provided to fit into this recess to form a channel optical waveguide. Over the upper face of the optical waveguide layer on the light incidence side and the light emission side, a cladding layer whose refractive index is smaller than that of the optical waveguide layer and whose thickness increases towards the end face(s) in a flared shape is provided in the same width as that of the monocrystalline substrate. By providing the cladding layer whose refractive index is smaller than that of the optical waveguide layer, it is made possible to expand the mode field diameter and substantially reduce the coupling loss between the optical fiber and the optical waveguide element. Further by increasing the thickness of the cladding layer in a flared shape toward the end face(s), it is made possible to gradually compress the mode field diameter and to reduce the optical propagation loss within the optical waveguide.

Claims

1. An optical waveguide element comprising:

an optical waveguide layer having optical waveguide, and

a cladding layer which is provided over at least one of an incidence end and emission end of the optical waveguide layer, the cladding layer having an outer surface that curves outward until an end portion of the outer surface corresponds to the at least one of an incidence end and emission end of the optical waveguide layer,

wherein the optical waveguide element has parts gradually decreasing in thickness on the at least one of an incidence end an emission end of the optical waveguide layer.

2. An optical waveguide element manufacturing method for manufacturing an optical waveguide element, the optical waveguide element comprising:

an optical waveguide layer having optical waveguide, and

a cladding layer which is provided over at least one of an incidence end and emission end of the optical waveguide on the surface of the optical waveguide layer, has a lower refractive index than that of the optical waveguide layer, and has an outer surface that curves outward,

the method comprising the steps of;

forming, over the surface of an optical waveguide layer provided with an optical waveguide, an amorphous thin film whose refractive index is smaller than that of the optical waveguide layer;

shaping the amorphous thin film over at least one of an incidence end and emission end of the optical waveguide to have the outer surface that curves outward until an end portion of the outer surface corresponds to the at least one of an incidence end and emission end of the optical waveguide layer; and

forming the shaped amorphous thin film into a cladding layer by solid phase epitaxial growth.

3. An optical waveguide element manufacturing method according to claim 2, comprising the steps of:

forming a resist film having a specific opening pattern over the amorphous thin film; and

sharing the amorphous thin film by etching with the resist film to increase its thickness towards the at least one end in a flared shape.

4. An optical waveguide element manufacturing method according to claim 3, comprising the step of:

forming, between the amorphous thin film and the resist film, a layer for accelerating forming of a thickness-increasing portion of the amorphous thin film, the layer being etched faster than the amorphous thin film.

5. An optical waveguide element manufacturing method according to claim 3, wherein the etching is wet etching.

6. An optical waveguide element manufacturing method according to claim 2, wherein the solid phase epitaxial growth is accomplished by:

coating the optical waveguide layer with a solution of a metallic organic compound to form a coating film;

changing the coating film to an amorphous thin film by heating; and

crystallizing the amorphous thin film by heating.

7. A manufacturing method for manufacturing a channel optical waveguide element, the channel optical waveguide element comprising:

an optical waveguide layer having an optical waveguide, and

a cladding layer which is provided over at least one of an incidence end and emission end of the optical waveguide on the surface of the optical waveguide layer, has a lower refractive index than that of the optical waveguide layer, and has an outer surface that curves outward,

the method comprising the processes of;

forming an optical waveguide; and

forming a cladding layer,

wherein the optical waveguide forming process comprises the steps of;

shaping an amorphous thin film formed over the surface of a monocrystalline substrate into a predetermined channel pattern;

forming a buffer layer by subjecting the amorphous thin film so shaped to solid phase epitaxial growth; and

forming a channel optical waveguide by solid phase epitaxial growth of an optical waveguide layer over the buffer layer, and

the cladding layer forming process comprises;

forming, over the surface of the optical waveguide layer provided with the optical waveguide, an amorphous thin film whose refractive index is smaller than that of the optical waveguide layer;

shaping the amorphous thin film over at least one of an incidence end and emission end of the optical waveguide to have the outer surface that curves outward until an end portion of the outer surface corresponds to the at least one of an incidence end and emission end of the optical waveguide layer; and

forming the cladding layer by subjecting the amorphous thin film so shaped to solid phase epitaxial growth by heating.

8. An optical waveguide element manufacturing method according to claim 7, wherein the solid phase epitaxial growth is accomplished by:

coating the optical waveguide layer with a solution of metallic organic compound to form a coating film;

changing the coating film to an amorphous thin film by heating; and

crystallizing the amorphous thin film by heating.

9. An optical deflection element comprising:

an optical waveguide layer having an epitaxial or single-oriented electro-optical effect, the layer being provided over an electroconductive or semi-electroconductive monocrystalline substrate to serve as a lower electrode or over a substrate over the surface of which is formed an electroconductive or semi-electroconductive monocrystalline substrate to serve as a lower electrode;

a light beam controlling electrode which is arranged over the optical waveguide layer and forms, between the optical waveguide layer and the monocrystalline substrate or the monocrystalline thin film, a region having a refractive index varying with the voltage applied and deflecting a light beam which propagates through the optical waveguide layer according to the voltage applied; and

a cladding layer which is formed over at least one of an incidence end and emission end of the optical waveguide over the surface of the optical waveguide layer and has a smaller refractive index than that of the optical waveguide layer, and has an outer surface that curves outward until an end portion of the outer surface corresponds to the at least one of an incidence end and emission end of the optical waveguide layer.

10. An optical switching element comprising:

an optical waveguide layer having an epitaxial or single-oriented electro-optical effect, the layer provided over an electroconductive or semi-electroconductive monocrystalline substrate to serve as a lower electrode or over a substrate over the surface of which is formed an electroconductive or semi-electroconductive monocrystalline substrate to serve as a lower electrode;

an optical waveguide formed in the optical waveguide and having at least one branch part;

upper electrodes one of which is provided or for each branch of the branch part; and

a cladding layer which is formed over the at least one of an incidence end and emission end of the optical waveguide over the surface of the optical waveguide layer and has a smaller refractive index than that of the optical waveguide layer, and has an outer surface that curves outward until an end portion of the outer surface corresponds to the at least one of an incidence end and emission end of the optical waveguide layer.