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Mask and projection exposure apparatus

  • US 6,867,845 B2
  • Filed: 12/27/2001
  • Issued: 03/15/2005
  • Est. Priority Date: 12/28/2000
  • Status: Expired due to Fees
First Claim
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1. A projection exposure apparatus comprising;

  • i) a mask stage for installing a mask, the mask including;

    a) a substrate that has a pattern on one surface of the substrate b) a transparent member provided at the side of the one surface of the substrate; and

    c) a thin film that is adhered to said transparent member, and has an aspheric surface;

    ii) an illumination optical system for illuminating the mask; and

    iii) a projection optical system for projecting the pattern on the mask illuminated by said illumination optical system, said mask stage and said illumination and projection optical systems being configured such that the pattern on the mask may be projected.

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