Method for transforming bandpass filters to facilitate their production and resulting devices

• US 6,870,441 B2
• Filed: 10/23/2001
• Issued: 03/22/2005
• Est. Priority Date: 10/24/2000
• Status: Expired due to Fees

• Current Assignee: Orange S.A.
• Original Assignee: Orange S.A.
• Inventors: Detaint, Jacques, Veyres, Camille
• Primary Examiner(s): Summons, Barbara
• Application Number:
  US10/415,056
• Publication Number:
  US 20040036554A1
• Time in Patent Office: 1,246 Days
• Field of Search: 333124-129, 333131-134, 333/187, 333/189, 333/193, 333/206
• US Class Current: 333/133
• CPC Class Codes: H03H 2260/00 Theory relating to impedance networks
• CPC Class Codes: H03H 7/0115 comprising only inductors and capacitors H03H7/075, H03H7/09, H03H7/12, H03H7/13 take precedence

Abstract

The invention concerns a method for optimizing elements of a narrow or intermediate band bandpass filter whereof the LC prototype has been determined. The invention is characterized in that it comprises steps which consist in: (i) breaking down several parallel or series capacitors of resonators with X elements, (ii) inserting pairs of transformers between the first and second separated element and the rest of the resonator, (iii) displacing the residual transformers to modify the impedance levels of the resonators, and (iv) absorbing the residual transformers by transformation. The invention also concerns the resulting filters.

Claims

1. Process for optimisation of the elements of a narrow or intermediate pass band filter for which the LC prototype has been determined, characterised by the fact that it includes the following steps:

i) decompose resonators with X elements into several parallel or series capacitances

ii) insert pairs of transformers between the first separate element and the rest of the resonator,

iii) displace transformers to modify resonator impedance levels, and

iv) absorb residual transformers by transformation.

2. Process according to claim 1, characterised by the fact that the decomposition step i) comprises decomposing X-element resonators into two parallel or series capacitances.

3. Process according to claim 1, characterised by the fact that the decomposition step i) comprises decomposing X-element resonators into three parallel or series capacitances.

4. Process according to one of claims 1 to 3, characterised by the fact that the decomposition step i) is applicable to two-element resonators.

5. Process according to claim 4, characterised by the fact that the decomposition step i) comprises replacing a parallel circuit comprising an inductance L_p in parallel with a capacitance C_p by a circuit comprising an inductance L_p in parallel with three capacitances C_pu, C_pv and C_pw.

6. Process according to claim 4, characterised by the fact that the decomposition step i) comprises replacing a series circuit comprising an inductance L_s in series with a capacitance C_s by a circuit comprising an inductance L_s in series with three capacitances C_su, C_sv and C_sw.

7. Process according to one of claims 1 to 3, characterised by the fact that the decomposition step i) is applicable to three-element resonators.

8. Process according to claim 7, characterised by the fact that the decomposition step i) comprises replacing a circuit comprising a capacitance C_s in series with a resonator formed from an inductance M_p in parallel with a capacitance C_p, by a circuit comprising two capacitances C_su, C_sw, in series on the input side of a resonator formed from an inductance M_p in parallel with a capacitance C_p and a third capacitance C_sw in series on the output side of this resonator.

9. Process according to claim 7, characterised by the fact that the decomposition step i) comprises replacing a circuit comprising capacitance Cp in parallel with a resonator formed by an inductance Ls in series with a capacitance Cs, by a circuit comprising three capacitances Cpu, Cpv and Cpw in parallel with a resonator formed by an inductance Ls in series with a capacitance Cs.

10. Process according to claim 1, characterised by the fact that the transformer insertion step ii) comprises inserting pairs of transformers with ratios 1/mi and mi/1.

11. Process according to claim 1, characterised by the fact that the transformer displacement step iii) comprises making transformers with ratios such as m₁/m₂=1, then m₂/m₃=1 then m₃/m₄=1, . . . , etc. appear.

12. Process according to claim 1, characterised by the fact that the transformer elimination step iv) comprises replacing a transformer and two capacitances, by two other capacitances.

13. Process according to claim 12, characterised by the fact that the transformer elimination step iv) comprises replacing a circuit comprising a parallel capacitance C_p on the input side and a parallel transformer on the output side, connected through a series capacitance C_s on the head line by a circuit comprising a series capacitance C_st on the input side and a parallel capacitance C_pt on the output side.

14. Process according to claim 12, characterised by the fact that the transformer elimination step iv) comprises replacing a circuit comprising a series capacitance C_p on the input side and a parallel capacitance C′

p on the input side of a parallel transformer on the output side, by a circuit comprising a parallel capacitance C′

_pt on the input side and a series capacitance C′

_st on the output side.

15. Process according to claim 1, characterised by the fact that the transformer elimination step iv) further comprises eliminating end transformers.

16. Process according to claim 15, characterised by the fact that the end transformer elimination step iv) comprises replacing an end transformer by two impedances with opposite signs.

17. Process according to claim 15, characterised by the fact that during the step to eliminate an end transformer, one of the end components is absorbed by this transformation or is replaced by another component with the same nature and with a different value.

18. Process according to claim 15, characterised by the fact that the end transformer elimination step iv) comprises doing a match using two impedances Z₁ and Z₂ with opposite signs, defined by:

$\begin{array}{ccccc}{Z}_1=\pm <br><br>j<br><br>\sqrt{Z_0<br><br>\left(Z^{*}-Z_0\right)}& \text{\hspace{1em}<br><br>}& \mathrm{and}& \text{\hspace{1em}<br><br>}& Z_2=\pm <br><br>j<br><br>\text{\hspace{1em}<br><br>}<br><br>Z^{*}<br><br>\sqrt{\frac{Z_0}{Z^{*}-Z_0}}.\end{array}$

and in these relations;

Z₀ is the required termination impedance, and

Z* is the termination impedance after displacement of transformers at the ends.

19. Process according to claim 18, characterised by the fact that one of the impedances (Z1) is a capacitance, while the other impedance (Z1) is a parallel inductance.

20. Process according to claim 18, characterised by the fact that one of the impedances (Z1) is a capacitance, while the other impedance (Z2) is a negative capacitance.

21. Process according to claim 15, characterised by the fact that the end transformer elimination step iv) comprises making a match using two impedances Z₁ and Z₂ with opposite signs, defined by:

$\begin{array}{ccccc}{Z}_1=\pm <br><br>j<br><br>\sqrt{Z_0<br><br>\left(Z^{*}-Z_0\right)}& \text{\hspace{1em}<br><br>}& \mathrm{and}& \text{\hspace{1em}<br><br>}& Z_2=\mp <br><br>j<br><br>\text{\hspace{1em}<br><br>}<br><br>Z_0<br><br>\sqrt{\frac{Z^{*}}{Z_0-Z^{*}}}.\end{array}$

relations in which;

Z₀ is the required termination impedance, and

Z* is the termination impedance after displacement of transformers at the ends.

22. Process according to claim 1, characterised by the fact that it uses a two-step optimisation process:

a first step that comprises choosing some auxiliary parameters such as the ratios of the capacitances of three-element resonators and one of the capacitances output from the decomposition of the two-element resonator at one end, to determine the range in which a solution exists for at least one chosen value of the inductances, and

a second step which comprises limiting variations of parameters in this range, starting from one end of the filter, to solve equations by choosing at least one of the impedance translation capacitances located between the resonators from a table of standard values, using an algorithm making use of the calculated value at the centre of the range.

23. Process according to claim 1, characterised by the fact that for the design of a multiplexer with several filters and for the ends of the filters, the capacitances of the series resonators of the arms joining the point common to the two filters is divided into two parts, and this division is made such that the transformation ratios are equal.

24. Process according to claim 1, characterised by the fact that it is used for the design of filters based on bulk wave resonators.

25. Process according to claim 1, characterised by the fact that it is used for the design of filters based on surface wave resonators.

26. Process according to claim 1, characterised by the fact that it is used for the design of filters based on piezoelectric crystal resonators, for example with lithium tantalate, or thin piezoelectric layers, for example zinc oxide.

27. Process according to claim 1, characterised by the fact that it is used for the design of a pass band filter for which all the inductances are made equal to a fixed value.

28. Process according to claim 1, characterised by the fact that it is used for the design of a pass band filter with dielectric resonators in TEM mode.

29. Process according to claim 1, characterised by the fact that it is used with at least one resonator in series, one of the accesses being on the central core of the resonator and the other access of the quadripole being on the external metallisation of the resonator.

30. Process according to claim 1, characterised by the fact that it is used for the design of a filter in which at least some capacitances are brought to fixed values, for example standardized.

31. Process according to claim 1, characterised by the fact that it is used for the design of a filter with dielectric resonators with the same characteristic impedance.

32. Process according to claim 1, characterised by the fact that it is used for the design of a filter with piezoelectric resonators with at least approximately the same ratio of capacitances and at least similar inductances.

33. Process according to claim 1, characterised by the fact that it is used for the design of a hybrid filter or multiplexer using inductances and dielectric resonators and/or piezoelectric resonators.

34. Process according to claim 1, characterised by the fact that it is used for the design of a ladder pass band filter.

35. Process according to claim 1;

characterised by the fact that it is used for the design of a polynomial filter formed of a succession of series LC dipoles in the horizontal arms and parallel LC dipoles in the vertical arms.

36. Process according to claim 1, characterised by the fact that it is used on bulk or surface wave piezoelectric crystal resonator filters, or piezoelectric resonators using non-crystalline materials, such that the ratios of parallel C/series C elements in the equivalent resonator circuit remain within a given range or are equal to a given value, and that the inductances of these resonators are equal to a given value adapted to economic, easy and high performance production of these resonators.

37. Process according to claim 1, characterised by the fact that it is used to make connection filters composed of filters connecting n input accesses to p output accesses, only allowing a finite number of frequency bands to pass from one input to one output.

38. Process according to claim 1, characterised by the fact that it is used for the design of matchable filters for which it is required to limit the variation of coupling capacitances between resonators while keeping a pass band with an approximately constant value.

39. Process according to claim 1, characterised by the fact that the optimisation applies to a circuit composed of only part of a filter.

40. Process according to claim 1, characterised by the fact that it comprises the step comprising transforming a T circuit into a Π

circuit.

41. Process according to claim 1, characterised by the fact that it comprises the step comprising transforming a Π

circuit into a T circuit.

42. Pass band filter obtained by using a process which includes the following steps:

i) decomposing resonators with X elements into several parallel or series capacitances,

ii) inserting pairs of transformers between the first separate element and the rest of the resonator,

iii) displacing transformers to modify resonator impedance levels, and

iv) absorbing residual transformers by transformation.

43. Filters according to claim 42, characterised by the fact that they are grouped for making pass band multiplexers formed from several filters connecting n input accesses to p outputs, only allowing a finite number of frequency bands to pass from an input to an output.

44. Filters according to claim 43, characterised by the fact that they comprise a 2-channel to 1-channel duplexer or a 1-channel to 2-channel duplexer.