Shower head of a wafer treatment apparatus having a gap controller
First Claim
1. A shower head for supplying a reactant gas to a process region within a reaction chamber during manufacture of a semiconductor device, the shower head comprising:
- a top plate having a gas port for introducing the reactant gas supplied from an outside source into the reaction chamber;
a face plate disposed opposite the process region, the face plate having a plurality of through holes;
a first baffle plate, having a plurality of through holes, the first baffle plate disposed between the top plate and the face plate so that it is capable of moving up or down, the first baffle plate having a top surface that defines a first gap for forming a first lateral flow passage of the reactant gas;
a second baffle plate, having a plurality of through holes, the second baffle plate disposed between the first baffle plate and the face plate so that it is capable of moving up or down, the second baffle plate having a top surface that defines a second gap for forming a second lateral flow passage of the reactant gas between the first and second baffle plates; and
a gap controller that is capable of variably adjusting a width of the first gap and variably adjusting a width of the second gap by varying a width of the gap controller so as to move at least one of the first and second baffle plates.
1 Assignment
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Accused Products
Abstract
A shower head for adjusting distribution of a reactant gas in a process region of a semiconductor manufacturing reaction chamber, wherein a top plate has a gas port for introducing the reactant gas into the reaction chamber; a face plate, having through holes, disposed opposite the process region; a first baffle plate, having through holes, disposed between the top plate and the face plate and capable of moving up or down, wherein the first baffle plate has a top surface that defines a first gap for forming a first lateral flow passage; a second baffle plate, having through holes, disposed between the first baffle plate and the face plate and capable of moving up or down, wherein the second baffle plate has a top surface that defines a second gap for forming a second lateral flow passage; and a gap controller for determining widths of the first and second gaps.
475 Citations
78 Claims
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1. A shower head for supplying a reactant gas to a process region within a reaction chamber during manufacture of a semiconductor device, the shower head comprising:
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a top plate having a gas port for introducing the reactant gas supplied from an outside source into the reaction chamber;
a face plate disposed opposite the process region, the face plate having a plurality of through holes;
a first baffle plate, having a plurality of through holes, the first baffle plate disposed between the top plate and the face plate so that it is capable of moving up or down, the first baffle plate having a top surface that defines a first gap for forming a first lateral flow passage of the reactant gas;
a second baffle plate, having a plurality of through holes, the second baffle plate disposed between the first baffle plate and the face plate so that it is capable of moving up or down, the second baffle plate having a top surface that defines a second gap for forming a second lateral flow passage of the reactant gas between the first and second baffle plates; and
a gap controller that is capable of variably adjusting a width of the first gap and variably adjusting a width of the second gap by varying a width of the gap controller so as to move at least one of the first and second baffle plates. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55)
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56. A shower head for supplying a reactant gas to a process region within a reaction chamber, the shower head comprising:
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a first baffle plate having a plurality of first and second through holes in order to selectively adjust the amount of the reactant gas supplied from an outside source according to a radius from the central axis, wherein the plurality of first through holes are spaced from a central axis by a first radius and the plurality of second through holes are spaced apart from the central axis by a second radius;
a second baffle plate disposed below the first baffle plate so that a gap for providing a lateral flow passage is formed between the first and second baffle plates, the second baffle plate having a plurality of through holes; and
a gap controller for moving at least one of the first and second baffle plates in order to variably adjust the width of the gap. - View Dependent Claims (57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 71, 72, 73, 74, 75, 76, 77, 78)
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70. The shower head of claim 70, wherein the gap controller comprises a driving shaft for selectively moving the first baffle plate upwardly or downwardly in order to determine the width of the gap.
Specification