Semiconductor device having trench top isolation layer and method for forming the same

• US 6,872,619 B2
• Filed: 07/16/2003
• Issued: 03/29/2005
• Est. Priority Date: 04/15/2003
• Status: Expired due to Term

• Current Assignee: Nanya Technology Corporation
• Original Assignee: Nanya Technology Corporation
• Inventors: Chen, Yi-Nan, Wu, Tieh-Chiang, Lin, Feng-Chuan
• Primary Examiner(s): Pham, Long
• Assistant Examiner(s): TRINH, HOA B
• Application Number:
  US10/620,869
• Publication Number:
  US 20040209422A1
• Time in Patent Office: 622 Days
• Field of Search: 438/242, 438/258, 438/253, 438/338, 438/386, 438/270, 257/300, 257/301, 257/302, 257/296, 257/330, 257/315, 257/530
• US Class Current: 438/242
• CPC Class Codes: H10B 12/0383 wherein the transistor is vertical
• CPC Class Codes: H10B 12/0385 Making a connection between the transistor and the capacitor, e.g. buried strap

Abstract

A method for forming a semiconductor device having a trench top isolation layer. A collar insulating layer is formed over a lower portion of the sidewall of the trench formed in a substrate. A first conductive layer is formed in the lower portion of the trench and protrudes the collar insulating layer, and a second conductive layer is formed overlying the first conductive layer and covers the collar insulating layer. An insulating spacer is formed over an upper portion of the sidewall of the trench and separated from the second conductive layer by a gap. The second conductive layer is partially thermally oxidized to form an oxide layer thereon whereby the gap is filled. After the oxide layer is removed, a reverse T-shaped insulating layer is formed thereon by chemical vapor deposition to serve as a trench top isolation layer. Finally, the insulating spacer is removed.

Claims

1. A method for forming a semiconductor device having a trench top isolation layer, comprising the steps of:

providing a substrate having at least one trench therein;

forming a collar insulating layer over the sidewall of a lower portion of the trench;

forming a first conductive layer protruding to the collar insulating layer in the lower portion of the trench;

forming a second conductive layer overlying the first conductive layer and covering the collar insulating layer;

forming an insulating spacer over an upper portion of the sidewall of the trench and separated from the second conductive layer by a gap;

thermally oxidizing a portion of the second conductive layer to form an oxide layer thereon whereby the gap is filled;

removing the oxide layer to expose the second conductive layer;

forming a reverse T-shaped insulating layer by chemical vapor deposition to serve as the trench top isolation layer; and

removing the insulating spacer.

2. The method as claimed in claim 1, further forming a gate insulated from the substrate and overlying the reverse T-shaped insulating layer.

3. The method as claimed in claim 1, wherein the collar insulating layer is a silicon oxide layer.

4. The method as claimed in claim 1, wherein the first conductive layer is a polysilicon layer.

5. The method as claimed in claim 1, wherein the second conductive layer is a doped polysilicon layer.

6. The method as claimed in claim 1, wherein the insulating spacer is composed of a pad oxide layer and an overlying silicon nitride layer.

7. The method as claimed in claim 6, wherein the insulating spacer has a thickness of about 200-300 Å

.

8. The method as claimed in claim 1, wherein the gap has a width of about 50-60 Å

.

9. The method as claimed in claim 1, wherein the reverse T-shaped insulating layer is formed by low pressure chemical vapor deposition (LPCVD).

10. The method as claimed in claim 1, wherein the reverse T-shaped insulating layer is a tetraethyl orthosilicate (TEOS) oxide.

11. A semiconductor device having a trench top isolation layer, comprising:

a substrate having at least one trench formed therein;

a collar insulating layer disposed over a lower portion of the sidewall of the trench;

a first conductive layer disposed in the lower portion of the trench and protruding the collar insulating layer;

a second conductive layer disposed overlying the first conductive layer and covering the collar insulating layer;

a reverse T-shaped insulating layer disposed overlying the second conductive layer to serve as the trench top isolation layer; and

a gate disposed overlying the reverse T-shaped insulating layer and insulated from the substrate.

12. The semiconductor device as claimed in claim 11, wherein the collar insulating layer is a silicon oxide layer.

13. The semiconductor device as claimed in claim 11, wherein the first conductive layer is a polysilicon layer.

14. The semiconductor device claimed in claim 11, wherein the second conductive layer is a doped polysilicon layer.

15. The semiconductor device claimed in claim 11, wherein the reverse T-shaped insulating layer is a tetraethyl orthosilicate (TEOS) oxide.