High pressure processing apparatus

• US 6,874,513 B2
• Filed: 04/17/2002
• Issued: 04/05/2005
• Est. Priority Date: 04/17/2001
• Status: Expired due to Fees

• Current Assignee: Klaus Schmidt, SCREEN Holdings Co., Ltd.
• Original Assignee: Klaus Schmidt, SCREEN Holdings Co., Ltd.
• Inventors: Yamagata, Masahiro, Muraoka, Yusuke, Saito, Kimitsugu, Oshiba, Hisanori, Kitakado, Ryuji, Sakashita, Yoshihiko, Mizobata, Ikuo, Inoue, Yoichi
• Primary Examiner(s): Stinson, Frankie L.
• Application Number:
  US10/123,252
• Publication Number:
  US 20020148492A1
• Time in Patent Office: 1,084 Days
• Field of Search: 134/95.3, 134/103.1, 134/200, 134/107, 134/108, 134/902, 68/18.R, 68/18.C
• US Class Current: 134/95.3
• CPC Class Codes: B08B 3/02 Cleaning by the force of jets or sprays
• CPC Class Codes: B08B 7/0021 by liquid gases or supercritical fluids
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed.

Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.

Claims

1. A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state, comprising:

a plurality of high-pressure processing chambers,

a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers,

a common chemical liquid supply unit for supplying the chemical liquid to each high-pressure processing chambers, and

a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed,

wherein the plurality of high-pressure processing chambers are installed in a clean room, and the high-pressure fluid supply unit, the chemical liquid supply unit and the separating unit are installed outside the clean room.

2. A high-pressure processing apparatus according to claim 1, wherein at least the plurality of high-pressure processing chambers are installed in a clean room, and at least the high-pressure fluid supply unit is installed outside the clean room.

3. A high-pressure processing apparatus according to claim 2, wherein the separating unit and the high-pressure fluid supply unit are connected, a liquefying unit is provided between the separating unit and the high-pressure fluid supply unit, and the liquefying unit is installed outside the clean room.

4. A high-pressure processing apparatus according to claim 2, wherein a heating unit is provided for each of the high-pressure processing chambers and installed in the clean room.

5. A high-pressure processing apparatus according to claim 1 or 2, wherein the separating unit is provided for each of the high-pressure processing chambers.

6. A high-pressure processing apparatus according to claim 1 or 2, wherein a first separating unit is provided for each of the high-pressure processing chambers and a second separating unit common to the high-pressure processing chambers is provided downstream of these first separating units.

7. A high-pressure processing apparatus according to claim 6, further comprising a returning unit for returning the fluid liquefied by a liquefying unit to the second separating unit as a high-pressure fluid containing no unnecessary matter.

8. A high-pressure processing apparatus according to claim 6, wherein the high-pressure fluid supply unit includes a high-pressure fluid medium storage tank, a pressurizing unit provided downstream of the storage tank, and a heating unit provided downstream of the pressurizing unit, and a bypass for feeding at least part of the high-pressure fluid obtained through the pressurizing unit and the heating unit to at least one of the first separating unit and the second separating unit is formed.

9. A high-pressure processing apparatus according to claim 2, wherein:

chemical liquid supply control units for controlling a supplied amount of the chemical liquid are provided for the respective high-pressure processing chambers between the chemical liquid supply unit and the respective high-pressure processing chambers,

mixing units for mixing the high-pressure fluid and the chemical liquid are provided between the respective chemical liquid supply control units and the respective high-pressure processing chambers, and

the chemical liquid supply control units and the mixing units are installed in the clean room.

10. A high-pressure processing apparatus according to claim 9, wherein each of the mixing units mix the high-pressure fluid and the chemical liquid by controlling flowing directions of the high-pressure fluid and the chemical liquid to join them.

11. A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state, comprising:

a plurality of high-pressure processing chambers,

a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers,

a common chemical liquid supply unit for supplying the chemical liquid to each high-pressure processing chambers, and

a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed, wherein at least the plurality of high-pressure processing chambers are installed in a clean room, and at least the high-pressure fluid supply unit is installed outside the clean room, wherein the separating unit and the high-pressure fluid supply unit are connected, a liquefying unit is provided between the separating unit and the high-pressure fluid supply unit, and the liquefying unit is installed outside the clean room,

further comprising a returning unit for returning the fluid liquefied by the liquefying unit to the separating unit as a high-pressure fluid containing no unnecessary matter.

12. A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state, comprising:

a plurality of high-pressure processing chambers,

a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers,

a common chemical liquid supply unit for supplying the chemical liquid to each high-pressure processing chambers, and

a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed, wherein the high-pressure fluid supply unit includes a high-pressure fluid medium storage tank, a pressurizing unit provided downstream of the storage tank, and a heating unit provided downstream of the pressurizing unit, and a recirculating path for returning at least part of the high-pressure fluid pressurized by the pressurizing unit to the high-pressure fluid medium storage tank from an upstream side of the heating unit is formed.

13. A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state, comprising:

a plurality of high-pressure processing chambers,

a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers,

a common chemical liquid supply unit for supplying the chemical liquid to each high-pressure processing chambers, and

a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed, wherein the high-pressure fluid supply unit includes a high-pressure fluid medium storage tank, a pressurizing unit provided downstream of the storage tank, and a heating unit provided downstream of the pressurizing unit, and a bypass for feeding at least part of the high-pressure fluid obtained through the pressurizing unit and the heating unit to the separating unit is formed.

14. A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state, comprising:

a plurality of high-pressure processing chambers,

a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers,

a common chemical liquid supply unit for supplying the chemical liquid to each high-pressure processing chambers,

a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed, wherein at least the plurality of high-pressure processing chambers are installed in a clean room, and at least the high-pressure fluid supply unit is installed outside the clean room,

chemical liquid supply control units for controlling a supplied amount of the chemical liquid are provided for the respective high-pressure processing chambers between the chemical liquid supply unit and the respective high-pressure processing chambers, and

mixing units for mixing the high-pressure fluid and the chemical liquid are provided between the respective chemical liquid supply control units and the respective high-pressure processing chambers, wherein the chemical liquid supply control units and the mixing units are installed in the clean room.