Method for coating internal surface of plasma processing chamber

• US 6,875,477 B2
• Filed: 03/03/2003
• Issued: 04/05/2005
• Est. Priority Date: 02/04/2003
• Status: Expired due to Fees

• Current Assignee: Hitachi High-Technologies Corporation (Hitachi, Ltd.)
• Original Assignee: Hitachi High-Technologies Corporation (Hitachi, Ltd.)
• Inventors: Trickett, Douglas M., Furuse, Muneo
• Primary Examiner(s): BAREFORD, KATHERINE A
• Application Number:
  US10/376,304
• Publication Number:
  US 20040151841A1
• Time in Patent Office: 764 Days
• Field of Search: 427/454, 427/453
• US Class Current: 427/454
• CPC Class Codes: C23C 4/02 Pretreatment of the material to be coated, e.g. for coating on selected surface areas
• CPC Class Codes: C23C 4/11 Oxides
• CPC Class Codes: H01J 37/32495 Means for protecting the vessel against plasma

Abstract

The present invention comprises an aluminum base material 2 constituting the plasma processing chamber of the plasma processing apparatus, a bonding layer 3 deposited on the base material consisting of a transition metal or transition metal alloy that modifies the difference in thermal expansion coefficient of the base material and the material constituting a plasma contact surface, and the plasma contact surface 1 formed of a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O₁₉, and a mixture of La₂O₃ and Al₂O₃ being a metal oxide including at least La and O deposited on the bonding layer 3 via a thermal spray process.

Claims

1. A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing a mixture of MgAl₂O₄+LaAlO₃ on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O₁₉, and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.

2. A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing a mixture of MgO+Al₂O₃+La₂O₃ on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O₁₉, and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.

3. A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing LaAlO₃ on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La₂O₃, MgLaAl₁₁O₁₉, and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.

4. A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, forming a middle layer by depositing MgAl₂O₄ on the transition material via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O₁₉, and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.

5. A method for coating an internal surface of a plasma processing chamber comprising forming a middle layer by depositing a mixture of MgO+Al₂O₃+La₂O₃ on a base material constituting the plasma processing chamber via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O₁₉, and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.

6. A method for coating an internal surface of a plasma processing chamber comprising forming a middle layer by depositing LaAlO₃ on a base material constituting the plasma processing chamber via a thermal spray process, and forming a plasma contact surface by depositing one material selected from a group consisting of La₂O₃ and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.

7. A method for coating an internal surface of a plasma processing chamber comprising forming a middle layer by depositing MgAl₂O₄ on a base material of the plasma processing chamber via a thermal spray process, and forming a plasma contact surface by depositing a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O_19, and La₂O₃+Al₂O₃ on the middle layer via a thermal spray process.