Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system configured to supply a beam of radiation;
a first object table configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
a second object table configured to hold a substrate; and
a projection system configured to project the patterned beam of radiation onto a target portion of the substrate;
a reference frame; and
a position measuring device comprising;
a radiation source mounted on the reference frame;
a two-dimensional radiation detector mounted in a fixed position on the reference frame; and
a mirroring device mounted on one of the object tables that is moveable relative to the reference frame so as to reflect radiation emitted by the radiation source toward the radiation detector onto a return path that is parallel to but displaced from an incident light path.
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Abstract
A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.
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Citations
20 Claims
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1. A lithographic apparatus, comprising:
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an illumination system configured to supply a beam of radiation;
a first object table configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
a second object table configured to hold a substrate; and
a projection system configured to project the patterned beam of radiation onto a target portion of the substrate;
a reference frame; and
a position measuring device comprising;
a radiation source mounted on the reference frame;
a two-dimensional radiation detector mounted in a fixed position on the reference frame; and
a mirroring device mounted on one of the object tables that is moveable relative to the reference frame so as to reflect radiation emitted by the radiation source toward the radiation detector onto a return path that is parallel to but displaced from an incident light path. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A lithographic apparatus, comprising:
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an illumination system configured to supply a projection beam of radiation;
a first object table configured to hold a patterning device configured to pattern the beam of radiation according to a desired pattern;
a second object table configured to hold a substrate; and
a projection system configured to image the patterned beam of radiation onto a target portion of the substrate;
a reference frame; and
a position measuring device comprising;
a radiation source mounted on the reference frame;
a two-dimensional radiation detector mounted in a fixed position on the reference frame;
a mirroring device mounted on one of the object tables that is moveable relative to the reference frame so as to reflect radiation emitted by the radiation source toward the radiation detector onto a return path that is parallel to but displaced from an incident light path;
an incremental position sensing device configured to detect a position of the moveable object table in a detection range wider than that of the position measuring device; and
a combiner configured to combine output signals from the incremental position sensing device and the position measuring device to determine an absolute position of the object table in the detection range.
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14. A device manufacturing method, comprising:
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projecting a patterned beam onto target portions of a substrate on an object table;
determining a reference position of the object table relative to a reference frame by;
emitting radiation from a radiation source mounted on the reference frame toward a mirroring device mounted on the object table;
reflecting the radiation by the mirroring device toward a two-dimensional radiation detector onto a return path that is parallel to but displaced from an incident light path; and
detecting the reflected radiation in the two-dimensional radiation detector mounted in a fixed position on the reference frame. - View Dependent Claims (15, 16)
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17. A position measuring device, comprising:
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a radiation source mounted on a reference frame;
a two-dimensional radiation detector mounted in a fixed position on the reference frame; and
a mirroring device mounted on an object that is moveable relative to the reference frame so as to reflect radiation emitted by the radiation source toward the radiation detector onto a return path that is parallel to but displaced from an incident light path.
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18. A method of determining a reference position of a moveable object table, comprising:
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emitting radiation from a radiation source mounted on a reference frame toward a mirroring device mounted on the moveable object table;
reflecting the radiation by the mirroring device toward a two-dimensional radiation detector onto a return path that is parallel to but displaced from an incident light path; and
detecting the reflected radiation in the two-dimensional radiation detector mounted on a fixed position on the reference frame.
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19. A lithographic apparatus, comprising:
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an illumination system configured to supply a projection beam of radiation;
a first object table configured to hold a patterning device configured to pattern the beam of radiation according to a desired pattern;
a second object table configured to hold a substrate;
a projection system configured to image the patterned beam of radiation onto a target portion of the substrate;
a reference frame; and
a position system including three position measuring devices, each position measuring device comprising;
a radiation source mounted on the reference frame;
a two-dimensional radiation detector mounted in a fixed position on the reference frame; and
a mirroring device mounted on one of the object tables that is moveable relative to the reference frame so as to reflect radiation emitted by the radiation source toward the radiation detector onto a return path that is parallel to but displaced from an incident light path, wherein the three position measuring devices are arranged non-parallel to each other. - View Dependent Claims (20)
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Specification