Segmented sputtering target and method/apparatus for using same

• US 6,878,242 B2
• Filed: 04/08/2003
• Issued: 04/12/2005
• Est. Priority Date: 04/08/2003
• Status: Expired due to Term

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Wang, Hong, Seder, Thomas A
• Primary Examiner(s): VERSTEEG, STEVEN H
• Application Number:
  US10/408,790
• Publication Number:
  US 20040206620A1
• Time in Patent Office: 735 Days
• Field of Search: 204/298.12, 204/298.13, 204/298.28, 204/192.12, 204/192.15, 204/192.22
• US Class Current: 204/192.22
• CPC Class Codes: C23C 14/3407 Cathode assembly for sputtering apparatus, e.g. Target
• CPC Class Codes: C23C 14/352 using more than one target C23C14/56 takes precedence
• CPC Class Codes: H01J 37/3405 Magnetron sputtering
• CPC Class Codes: H01J 37/3429 Plural materials

Abstract

A rotating sputtering target(s) is segmented so as to include a plurality of different sputtering material portions or segments radially dispersed around the outer periphery of the target. This enables a plurality of different layers to be sputter-deposited, one after the other, using the same sputtering target as the target rotates. The thicknesses of the different layers can be controlled by the radially extensive size of the different segments, the rotation speed of the target, the material sputter rate, the sputtering power used, and/or the line speed of the sputter coater in which the target(s) is located. One or more such targets may be used in a coater according to different embodiments of this invention.

Claims

1. A rotating sputtering target for depositing layers of different material, the rotating sputtering target comprising:

a continuous outer periphery to be sputtered, the continuous outer periphery being circular in shape when viewed cross sectionally,

the continuous outer periphery of the rotating sputtering target comprising, around its circumference, a plurality of immediately adjacent segments of different materials to be sputtered for forming respective different layers on a substrate, and wherein the segments of different materials are located at different radial locations around the circumference of the rotating sputtering target.

2. The sputtering target of claim 1, wherein the different materials comprise first and second materials so that a first group of segments comprises the first material and a second group of segments comprises the second material, the first material for forming a layer having a higher index of refraction than a layer formed by the second material.

3. The sputtering target of claim 2, wherein the second material is for forming a layer(s) having an index of refraction at least 10% less than a layer(s) formed by the first material.

4. The sputtering target of claim 1, wherein the different materials comprise first and second materials so that at least a first segment comprises the first material and at least a second segment comprises the second material, the second material having an index of refraction at least 10% less than the first material.

5. The sputtering target of claim 1, wherein at least one of the segments extends over an arcuate portion of the outer periphery of the target, the arcuate portion being defined by an angle θ

of from 20 to 180 degrees.

6. The sputtering target of claim 5, wherein the angle θ

is from 30 to 45 degrees.

7. The sputtering target of claim 1, wherein the target comprises from 2 to 16 of the segments.

8. The sputtering target of claim 1, wherein the different materials comprise first and second materials so that a first group of segments comprises the first material and a second group of segments comprises the second material, wherein the first and second materials comprise metals.

9. The sputtering target of claim 8, wherein the first material is selected from the group consisting of:

Ti, V, W, Al, Nb, and Cr.

10. The sputtering target of claim 8, wherein each of the first and second materials are selected from the group consisting of:

Ti, V, W, Al, Nb and Cr.

11. The sputtering target of claim 1, wherein the target comprises segments of at least three different materials, respectively, around its circumference.

12. A method of sputtering at least part of a coating on a substrate, the method comprising:

providing a rotatable sputtering target with an outer periphery comprising, around its circumference, a plurality of different segments of respective different materials to be sputtered for forming respective different layers on the substrate, and

rotating the target and sputtering the outer periphery thereof so as to form at least first and second different layers on the substrate, wherein the first layer comprises a material from a first one of the segments and the second layer comprises a material from a second of the segments.

13. The method of claim 12, wherein the target comprises segments of at least three different materials, respectively, around its circumference.

14. The method of claim 12, wherein the different materials comprise first and second materials so that a first group of segments comprises the first material and a second group of segments comprises the second material, and wherein the first material comprises at least one of:

Ti, V, W, Al, Nb, and Cr.

15. The method of claim 14, wherein the second material is different than the first material, but also comprises at least one of Ti, V, W, Al, Nb, and Cr.

16. The method of claim 14, wherein the first material comprises a nitride of at least one of Ti, V, W, Al, Nb and Cr.

17. The method of claim 12, wherein the different materials comprise first and second materials so that at least a first segment comprises the first material and at least a second segment comprises the second material, the second material having an index of refraction at least 10% less than the first material.

18. The method of claim 12, wherein at least one of the segments extends over an arcuate portion of the outer periphery of the target, the arcuate portion being defined by an angle θ

of from 20 to 180 degrees.

19. The method of claim 18, wherein the angle θ

is from 30 to 45 degrees.