Noncontact measuring system for electrical conductivity

• US 6,879,167 B2
• Filed: 05/20/2003
• Issued: 04/12/2005
• Est. Priority Date: 11/27/2002
• Status: Expired due to Fees

• Current Assignee: Tohoku Techno Arch Co., Ltd.
• Original Assignee: Tohoku Techno Arch Co., Ltd.
• Inventors: Abe, Hiroyuki, Ju, Yang, Saka, Masumi
• Primary Examiner(s): Deb, Anjan
• Assistant Examiner(s): NGUYEN, HOAI AN D
• Application Number:
  US10/441,552
• Publication Number:
  US 20040100280A1
• Time in Patent Office: 693 Days
• Field of Search: 324/642, 324/637, 324/629, 324/600, 324/71.1, 324/250, 324/158.1, 324/750, 324/752, 324/754, 324/765, 324/766, 324/767, 324/76.14, 324/76.56, 438/10, 438/13, 438/17, 438/139, 356/237.4, 356/237.5
• US Class Current: 324/642
• CPC Class Codes: G01N 22/02 Investigating the presence of flaws
• CPC Class Codes: G01R 27/06 Measuring reflection coefficients; Measuring standing-wave ratio
• CPC Class Codes: G01R 27/2658 Cavities, resonators, free space arrangements, reflexion or interference arrangements G01R27/2647 takes precedence; optical methods G01R27/2682
• CPC Class Codes: G01R 31/311 of integrated circuits G01R31/31728 takes precedence

Abstract

The invention provides a noncontact measuring system for electrical conductivity, which uses a microwave. In the measuring system for electrical conductivity, the microwave generated in a network analyzer (NA) 110 is guided to a surface of a silicon wafer (sample) 160 through a waveguide 130 and a sensor 140. The surface of the silicon wafer 160 is irradiated with the microwave, and the sensor 140 receives the reflected microwave. The electrical conductivity of the silicon wafer 160 is measured in such a manner that a computer (personal computer) 120 calculates the electrical conductivity from an amplitude ratio A and phase difference θ to a reflected wave of the silicon wafer 160, which is determined with the network analyzer 110. The computer 120 performs not only the calculation of the measurement but also whole control of the measuring system such as positioning of the sample.

Claims

1. A noncontact measuring system for measuring electrical conductivity of a semiconductor wafer comprising:

a microwave transmitter and receiver, including a reflective type of microwave converging antenna, for transmitting microwaves to a minute region of a surface of the semiconductor wafer and for receiving microwaves reflected therefrom;

a reflectivity measurer for measuring reflectivity of a top surface of the semiconductor wafer; and

an electrical conductivity sensor for determining electrical conductivity of a low frequency from the measured reflectivity.

2. A noncontact measuring system as defined by claim 1, further comprising:

an electrical conductivity calibrator for creating a two-dimensional distribution map of said electrical conductivity.

3. A noncontact measuring system for measuring electrical conductivity of a semiconductor wafer comprising:

a microwave transmitter and receiver, including a reflective type of microwave converging antenna, for transmitting microwaves to a minute region of a surface of the semiconductor wafer and for receiving microwaves reflected therefrom;

a reflectivity measurer for measuring reflectivity of a top surface of the semiconductor wafer from an amplitude ratio and phase difference of the transmitted and received waves;

an electrical conductivity sensor for determining an apparent electrical conductivity from the measured reflectivity; and

an electrical conductivity calibrator for determining electrical conductivity of a low frequency from the determined apparent electrical conductivity.

4. A noncontact measuring system as defined by claim 3, further comprising:

an electrical conductivity calibrator for creating a two-dimensional distribution map of said electrical conductivity.