Process monitoring device for sample processing apparatus and control method of sample processing apparatus
First Claim
1. A process monitoring device for monitoring plasma processing of one or more semiconductor samples in a sample processing apparatus, said process monitor device comprising:
- a monitor data acquisition section for acquiring plural kinds of monitor data of plasma status inside said sample processing apparatus, via one or more sensors, said plural kinds of monitor data indicating states of said plasma including, but not limited to, optical emission spectra of plasma and electrical states of plasma inside said sample processing apparatus;
a data selection section for extracting temporally, without performing time-compression processing, plural kinds of monitor data acquired during a designated time portion of one processing step within a sample processing sequence of one semiconductor sample, from among said plural kinds of monitor data;
a monitoring signal generation section for generating monitoring signals respectively corresponding in a time series manner to the monitor data extracted by said data selection section; and
a display setting controller for displaying a plurality of said monitoring signals obtained with respect to plural semiconductor samples processed in said sample processing apparatus, on a display section in a time series manner.
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Abstract
A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.
33 Citations
19 Claims
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1. A process monitoring device for monitoring plasma processing of one or more semiconductor samples in a sample processing apparatus, said process monitor device comprising:
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a monitor data acquisition section for acquiring plural kinds of monitor data of plasma status inside said sample processing apparatus, via one or more sensors, said plural kinds of monitor data indicating states of said plasma including, but not limited to, optical emission spectra of plasma and electrical states of plasma inside said sample processing apparatus;
a data selection section for extracting temporally, without performing time-compression processing, plural kinds of monitor data acquired during a designated time portion of one processing step within a sample processing sequence of one semiconductor sample, from among said plural kinds of monitor data;
a monitoring signal generation section for generating monitoring signals respectively corresponding in a time series manner to the monitor data extracted by said data selection section; and
a display setting controller for displaying a plurality of said monitoring signals obtained with respect to plural semiconductor samples processed in said sample processing apparatus, on a display section in a time series manner. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A sample manufacturing method for manufacturing and monitoring plasma processing of one or more semiconductor samples in a sample processing apparatus, said process monitor device comprising the steps of:
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acquiring plural kinds of monitor data of plasma status inside said sample processing apparatus, via one or more sensors, said plural kinds of monitor data indicating states of said plasma including, but not limited to, optical emission spectra of plasma and electrical states of plasma inside said sample processing apparatus;
extracting temporally, without performing time-compression processing, plural kinds of monitor data acquired during a designated time portion of one processing step within a sample processing sequence for one semiconductor sample, from among said plural kinds of monitor data;
generating monitoring signals respectively corresponding in a time series manner to the monitor data extracted; and
conducting processing control of said sample by using said monitoring signals and conducting sample manufacturing.
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15. A process monitoring device for monitoring plasma processing of one or one semiconductor samples in a sample processing apparatus, said process monitor device comprising:
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a monitor data acquisition section for acquiring plural kinds of monitor data of plasma status inside said sample processing apparatus, via one or more sensor, said plural kinds of monitor data indicating states of said plasma including, but not limited to, optical emission spectra of plasma and electrical states of plasma inside said sample processing apparatus;
a data selection section for temporally extracting, without performing time-compression processing, plural kinds of monitor data acquired during a designated time portion of one processing step within a sample processing sequence of one semiconductor sample, from among said plural kinds of monitor data;
a monitoring signal generation section for generating monitoring signals respectively corresponding in a time series manner to the monitor data extracted; and
a display setting controller for displaying a plurality of said monitoring signals obtained with respect to plural semiconductor samples processed in the sample processing apparatus, on a display section in a time series manner. - View Dependent Claims (16)
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17. A sample processing apparatus, comprising:
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a process monitoring device comprising;
a monitor data acquisition section for acquiring plural kinds of monitor data of plasma status inside the sample processing apparatus, via one or more sensor, said plural kinds of monitor data indicating states of said plasma including, but not limited to, optical emission spectra of plasma and electrical states of plasma;
a data selection section for temporally extracting, without performing time-compression processing, plural kinds of monitor data acquired during a designated time portion of one processing step within a sample processing sequence of one semiconductor sample, from among said plural kinds of monitor data;
a monitoring signal generation section for generating monitoring signals respectively corresponding in a time series manner to the monitor data extracted; and
a display setting controller for displaying a plurality of said monitoring signals obtained with respect to the semiconductor sample processed in the sample processing apparatus, on a display section in a time series manner; and
a processing section for processing the semiconductor sample by using said monitor signals. - View Dependent Claims (18)
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19. A sample processing method, comprising the step of:
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processing a semiconductor sample using a process monitor device in a sample processing apparatus, the process monitor device comprising;
a monitor data acquisition section for acquiring plural kinds of monitor data of plasma status inside the sample processing apparatus, via one or more sensor, said plural kinds of monitor data indicating states of said plasma including, but not limited to, optical emission spectra of plasma and electrical states of plasma inside the sample processing apparatus;
a data selection section for temporally extracting, without performing time-compression processing, plural kinds of monitor data during a designated time portion of one processing step within a sample processing sequence of one semiconductor sample, from among said plural kinds of monitor data;
a monitoring signal generation section for generating monitoring signals respectively corresponding in a time series manner to the monitor data extracted; and
a display setting controller for displaying a plurality of said monitoring signals obtained with respect to plural semiconductor samples processed in the sample processing apparatus, on a display section in a time series manner.
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Specification