Deposition monitoring system
First Claim
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1. A deposit monitoring apparatus located above ground level comprising:
- an acoustic device for operating in a longitudinal mode and in a resonance mode in a frequency range of 10 kHz to 250 kHz, the device including a monitoring surface directly exposed to fluids prone to causing deposition of material, wherein the deposition of the material on the monitoring surface is monitored by measuring a change in resonance frequency of the acoustic device; and
a power supply for supplying said acoustic device with electrical energy.
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Abstract
Described is an apparatus for detecting and removing deposits from a surface exposed to wellbore fluids. The apparatus can monitor the rate of deposition and subsequently remove the deposited material. The combination of detection apparatus and removal apparatus provides an instrument with self-cleaning operation mode.
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Citations
28 Claims
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1. A deposit monitoring apparatus located above ground level comprising:
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an acoustic device for operating in a longitudinal mode and in a resonance mode in a frequency range of 10 kHz to 250 kHz, the device including a monitoring surface directly exposed to fluids prone to causing deposition of material, wherein the deposition of the material on the monitoring surface is monitored by measuring a change in resonance frequency of the acoustic device; and
a power supply for supplying said acoustic device with electrical energy. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A monitoring apparatus located above ground level comprising:
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a monitor to measure characteristics of fluids, the monitor having a monitoring surface that is directly exposed to the fluids;
a deposit removal system including an acoustic device for exerting a physical force on the monitoring surface to at least partially remove deposition from the monitoring surface, the deposit removal system being in a control loop with said monitor; and
a power supply for supplying said acoustic device with electrical energy, wherein the monitor further uses said acoustic device, said acoustic device to be operated in a resonance mode, and wherein the monitor measures deposition of the material on the monitoring surface by measuring a change in resonance frequency of the acoustic device and wherein the acoustic device operates in a longitudinal mode. - View Dependent Claims (16, 17)
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18. A monitoring apparatus located above ground level comprising:
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a monitor to measure characteristics of fluids, the monitor having a monitoring surface that is directly exposed to the fluids;
a deposit removal system including an acoustic device for exerting a physical force on the monitoring surface to at least partially remove deposition from the monitoring surface, the deposit removal system being in a control loop with said monitor; and
a power supply for supplying said acoustic device with electrical energy, wherein the monitor is selected from a group comprising optical sensors, electro-chemical sensors, nuclear sensors, separation membranes, or acoustic sensors separate from the force exerting acoustic device. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25)
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26. A deposit monitoring apparatus located above ground level comprising:
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an acoustic device to operate in a resonance mode including a monitoring surface directly exposed to fluids produced by a hydrocarbon wellbore, wherein the deposition of material on the monitoring surface is monitored by measuring a change in resonance frequency of the acoustic device, and wherein by measuring said change in resonance frequency of the acoustic device a thickness of deposited material of 600 microns can be distinguished from a thickness of deposited material of 1050 microns; and
a power supply for supplying said acoustic device with electrical energy, wherein the acoustic device operates in a longitudinal mode. - View Dependent Claims (27, 28)
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Specification