Diamond grid CMP pad dresser
First Claim
1. A chemical mechanical polishing (CMP) pad dresser comprising:
- a substrate member; and
a plurality of abrasive particles each coupled to the substrate member at a specific location in accordance with a predetermined pattern wherein said abrasive particles are coupled to the substrate member by a brazing alloy comprising a nickel alloy having a chromium amount of at least about 2 wt %.
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Abstract
The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles protruding therefrom. The abrasive particles are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride(PcBN). The abrasive particles are brazed to a substrate which may be then coated with an additional anti-corrosive layer. The anti-corrosive layer is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate, the abrasive particles extend for a uniform distance away from the substrate, allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions. A method of producing such a CMP pad dresser is also disclosed.
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Citations
36 Claims
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1. A chemical mechanical polishing (CMP) pad dresser comprising:
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a substrate member; and
a plurality of abrasive particles each coupled to the substrate member at a specific location in accordance with a predetermined pattern wherein said abrasive particles are coupled to the substrate member by a brazing alloy comprising a nickel alloy having a chromium amount of at least about 2 wt %. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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29. A chemical mechanical polishing (CMP) pad dresser comprising:
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a substrate member;
a plurality of abrasive particles each coupled to the substrate member by brazing with a brazing alloy at a specific location in accordance with a predetermined pattern; and
an overlay material having a working surface that is smoother than a working surface of the brazing alloy. - View Dependent Claims (30, 31, 32, 33, 34, 35)
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36. A method of reducing flaking in a CMP pad dresser having a plurality of abrasive particles coupled to a brazing layer comprising the steps of:
applying a layer of an overlay material to the brazing layer said overlay material having working surface that is smoother than a working surface of the brazing layer.
Specification