Photoelectrochemical undercut etching of semiconductor material

• US 6,884,740 B2
• Filed: 09/03/2002
• Issued: 04/26/2005
• Est. Priority Date: 09/04/2001
• Status: Expired due to Fees

• Current Assignee: Regents of the University of California (University of California)
• Original Assignee: Regents of the University of California (University of California)
• Inventors: Stonas, Andreas R., Hu, Evelyn L.
• Primary Examiner(s): Pert, Evan
• Assistant Examiner(s): Kilday, Lisa
• Application Number:
  US10/234,535
• Publication Number:
  US 20030045120A1
• Time in Patent Office: 966 Days
• Field of Search: 438/708, 438/746, 438/962, 438/52, 438/733, 438/739, 156/643.1, 205/666, 216/2, 216/13, 216/94, 216/99, 216/96, 216/100, 216/103, 216/106, 216/108
• US Class Current: 438/708
• CPC Class Codes: H01L 21/30635 of AIIIBV compounds
• CPC Class Codes: Y10S 438/962 Quantum dots and lines

Abstract

Photoelectrochemical (PEC) etching is restricted to a group III nitride semiconductor-barrier interface to laterally etch or undercut the target group III nitride. The barrier interface is provided by the transparent sapphire substrate on which the target group III nitride is epitaxially grown or by a layer of material in intimate contact with the target group III nitride material and having a bandgap sufficiently high to make it resistant to PEC etching. Due to the first orientation in which this effect was first observed, it has been named backside-Illuminated photoelectrochemical (BIPEC) etching. It refers to a preferential etching at the semiconductor-barrier layer interface. The assembly can be exposed to light from any direction to effectuate bandgap-selective PEC etching. An opaque mask can be applied to limit the lateral extent of the photoelectrochemical etching.

Claims

1. A method of wet etching a layer of target semiconductor material, comprising:

providing at least one lateral side of said layer of target semiconductor material in intimate contact with at least one barrier material to form at least one interface of barrier material and target semiconductor material;

immersing the target semiconductor material and barrier material in a solution capable of etching the target semiconductor material under photoelectrochemical conditions and not capable of etching the barrier material under said photoelectrochemical conditions; and

illuminating the semiconductor material with light having a frequency above the energy bandgap of the target semiconductor material in a manner whereby to restrict photoelectrochemical etching to said interface, said light having sufficient energy to photoelectrochemically laterally etch the target semiconductor material at said interface.

2. The method of claim 1 wherein said barrier material is a transparent or translucent substrate on which the layer of target semiconductor material is epitaxially grown, and the semiconductor material is illuminated only through the substrate.

3. The method of claim 2 wherein the target semiconductor material is a group III nitride.

4. The method of claim 3 wherein the substrate is formed of sapphire.

5. The method of claim 1 wherein each lateral side of said layer of target semiconductor material is in intimate contact with barrier material to form two interfaces of barrier material and target semiconductor material.

6. The method of claim 5 wherein the semiconductor material is illuminated from above, from below, from one or both of the sides, or from an angle thereto.

7. The method of claim 5 wherein the barrier material on one lateral side of the target semiconductor material is a transparent or translucent substrate and the barrier material on the other lateral side of the target semiconductor material is semiconductor material having a higher energy band gap than the target semiconductor material.

8. The method of claim 5 wherein the barrier material each lateral side of the target semiconductor material is semiconductor material having a higher energy band gap than the target semiconductor material.

9. The method of claim 8 wherein the barrier material on one lateral side of the target semiconductor is in intimate contact with a transparent or translucent substrate.

10. The method of claim 1 in which an opaque mask is applied to the outer surface of the barrier material to limit the lateral extent of the photoelectrochemical etching.

11. The method of claim 7 in which an opaque mask is applied to the outer surface of the substrate to limit the lateral extent of the photoelectrochemical etching.

12. The method of claim 8 in which an opaque mask is applied to the outer surface of the semiconductor barrier material to limit the lateral extent of the photoelectrochemical etching.

13. A method of wet etching a layer of target group III nitride semiconductor material, comprising:

providing at least one lateral side of said layer of target semiconductor material in intimate contact with at least one barrier material to form at least one interface of barrier material and target semiconductor material;

immersing the target semiconductor material and barrier material in a solution capable of etching the target semiconductor material under photoelectrochemical conditions and not capable of etching the barrier material under said photoelectrochemical conditions; and

illuminating the semiconductor material with light having a frequency above the energy bandgap of the target semiconductor material in a manner whereby to restrict photoelectrochemical etching to said interface, said light having sufficient energy to photoelectrochemically laterally etch the target semiconductor material at said interface.

14. The method of claim 13 wherein the target semiconductor material is gallium nitride.

15. The method of claim 14 wherein the barrier material is formed of sapphire.