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Design driven inspection or measurement for semiconductor using recipe

  • US 6,886,153 B1
  • Filed: 12/21/2001
  • Issued: 04/26/2005
  • Est. Priority Date: 12/21/2001
  • Status: Expired due to Term
First Claim
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1. For an instrument responsive to recipe parameters, a method for creating a recipe, the method comprising:

  • accessing mask set data;

    recognizing a target structure in the mask set data;

    extracting parameters from the mask set data; and

    configuring the recipe based on the extracted parameters responsive to the recognized target structure, wherein the configuration of the recipe is performed before a wafer printed with a mask created from the mask set data is generated.

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