Nonvolatile semiconductor memory device, manufacturing method thereof, and operating method thereof
First Claim
1. A nonvolatile memory device, comprising:
- a first diffusion layer and second diffusion layer separated by a channel region;
a first insulating layer for trapping a charge formed on a first portion of the channel region adjacent to the first diffusion layer;
a second insulating layer, different than the first insulating layer, formed on a second portion of the channel region different from the first portion of the channel region; and
an integrated gate electrode that covers the first insulating layer and second insulating layer.
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Abstract
Nonvolatile memory elements are disclosed which can have increased capacity, reduced operating voltage and/or faster operating speeds. According to one embodiment, a nonvolatile memory element can include a first diffusion layer (2) and a second diffusion layer (3) formed in a main surface of a substrate (1). A laminate film can be formed near a first diffusion layer (2) and/or a second diffusion layers (3) that includes a first insulating film (4a or 4), a second insulating film (5a or 5), and a third insulating film (6a or 6). A gate insulating film (7) can be formed a channel region and gate electrode (8) can be formed to cover gate insulating film (7) and the laminate film(s) that has a T-shape. A gate electrode (8) can have end portions that sandwich a first insulating film (4a or 4), a second insulating film (5a or 5), and a third insulating film (6a or 6) with a first diffusion layer (2) and/or second diffusion layer (3).
136 Citations
9 Claims
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1. A nonvolatile memory device, comprising:
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a first diffusion layer and second diffusion layer separated by a channel region;
a first insulating layer for trapping a charge formed on a first portion of the channel region adjacent to the first diffusion layer;
a second insulating layer, different than the first insulating layer, formed on a second portion of the channel region different from the first portion of the channel region; and
an integrated gate electrode that covers the first insulating layer and second insulating layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification