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Programmable photolithographic mask system and method

  • US 6,888,616 B2
  • Filed: 06/25/2003
  • Issued: 05/03/2005
  • Est. Priority Date: 06/27/1997
  • Status: Expired due to Fees
First Claim
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1. An exposure system that exposes a substrate with electromagnetic energy from an electromagnetic energy source, said system comprising:

  • a programmable mask comprising at least one two-dimensional array of structures that, in use, is disposed between the substrate and the electromagnetic energy source, at least some of said structures within said array having an active region comprising a material with a bandgap, the material being changed from transparent to opaque by application of a stimulus; and

    a controller coupled to the mask, the controller controlling the stimulus applied to said structures to cause the structures to interact with and selectively modulate, in accordance with a programmable two-dimensional pattern, electromagnetic energy from the source so as to provide a two-dimensional programmable exposure pattern of electromagnetic energy exposing at least part of the substrate.

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