Interferometry system having a dynamic beam steering assembly for measuring angle and distance

• US 6,888,638 B1
• Filed: 05/05/2000
• Issued: 05/03/2005
• Est. Priority Date: 05/05/1999
• Status: Expired due to Fees

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Primary Examiner(s): Turner, Samuel A.
• Application Number:
  US10/009,012
• Time in Patent Office: 1,824 Days
• Field of Search: 356/508, 356/510, 356/485, 356/486, 356/487, 356/496, 356/498, 356/500, 356/517
• US Class Current: 356/498
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02003 using beat frequencies
• CPC Class Codes: G01B 9/02019 contacting different points on same face of object
• CPC Class Codes: G01B 9/02068 Auto-alignment of optical elements
• CPC Class Codes: G01B 9/02081 simultaneous quadrature detection, e.g. by spatial phase shifting
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

In one aspect, the invention features an angle-measuring interferometry system that includes an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct the measurement beam and an electronic positioning system to selectively orient the beam steering element within the interferometer. The angle-measuring interferometry system also includes an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam, wherein the measurement signal is derived from at least one interferometric signal produced by combining at least a portion of the measurement beam with a second beam after the measurement beam contacts the measurement object.

Claims

1. An angle-measuring interferometry system comprising:

an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct the measurement beam and an electronic positioning system to selectively orient the beam steering element within the interferometer; and

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam,

wherein the measurement signal is derived from at least one interferometric signal produced by combining at least a portion of the measurement beam with a second beam after the measurement beam contacts the measurement object.

2. The system of claim 1, further comprising an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object and generate the measurement signal.

3. The system of claim 1 further comprising:

a control circuit which during operation causes the positioning system to reorient the beam steering element in response to the change in the angular orientation of the measurement object.

4. The system of claim 3, wherein the control circuit reorients the beam steering element based on a control signal derived from the measurement beam.

5. The system of claim 4, further comprising an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object and generate the control signal.

6. The system of claim 5, wherein the measurement signal is derived from the angle displacement interferometer.

7. The system of claim 4 further comprising a detector having spatially resolved detector elements operative to measure the position and/or direction of at least a portion of the measurement beam after it contacts the measurement object.

8. The system of claim 7, wherein during operation the detector having the spatially resolved detector elements generates the control signal.

9. The system of claim 4, wherein the measurement signal is derived from the reorientation of the beam steering element caused by the control circuit.

10. The system of claim 3, wherein during operation the control circuit causes the measurement beam to contact the measurement object at substantially normal incidence over a range of angular orientations of the measurement object.

11. The system of claim 1, wherein the second beam is a second measurement beam that contacts the measurement object.

12. The system of claim 1, wherein the measurement signal is derived from at least two interferometric signals produced by combining at least two portions of the measurement beam with corresponding portions of another beam after the measurement beam contacts the measurement object.

13. The system of claim 1, wherein during operation the angle measurement system further calculates a change in optical path length to the measurement object based on interferometric information derived from the measurement beam and a reference beam.

14. The system of claim 1, wherein during operation the interferometer directs only one measurement beam to contact the measurement object.

15. The system of claim 14, wherein during operation the interferometer directs the measurement beam to make only a single pass to the measurement object.

16. The system of claim 14, wherein during operation the interferometer directs the measurement beam to make only a single pass to the measurement object.

17. The system of claim 1, wherein the beam steering element has two reflective faces and wherein during operation the interferometer directs the measurement beam to contact the first face before contacting the measurement object and directs the measurement beam to contact the second face after contacting the measurement object.

18. The system of claim 17, wherein during operation the interferometer separates the measurement beam into at least two portions after contacting the measurement object but before contacting the second face.

19. The system of claim 17, wherein during operation the interferometer separates the measurement beam into at least two portions after contacting the second face.

25. The system of claim 1 or 20, wherein the beam steering element is positioned to contact and direct the measurement beam before the measurement beam contacts the measurement object.

26. The system of claim 25, wherein the beam steering element is positioned to contact and direct the measurement beam before the measurement beam contacts the measurement object and after the measurement beam contacts the measurement object.

27. The system of claim 1 or 20, wherein the beam steering element is positioned to contact and direct the measurement beam only after the measurement beam contacts the measurement object.

44. The system of claim 2, 5, 21, 30, 41, or 42 wherein the angle displacement interferometer comprises an etalon.

46. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer;

an illumination system for imaging spatially patterned radiation onto the wafer;

a positioning system for adjusting the position of the stage relative to the imaged radiation; and

the interferometry system of claim 1, 20, 28, 42, or 45 for monitoring the position of the wafer relative to the imaged radiation.

47. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer; and

an illumination system including a radiation source, a mask, a positioning system, a lens assembly, and the interferometry system of claim 1, 20, 28, 42, or 45, wherein during operation the source directs radiation through the mask to produce spatially patterned radiation, the positioning system adjusts the position of the mask relative to the radiation from the source, the lens assembly images the spatially patterned radiation onto the wafer, and the interferometry system monitors the position of the mask relative to the radiation from the source.

48. A beam writing system for use in fabricating a lithography mask, the system comprising:

a source providing a write beam to pattern a substrate;

a stage supporting the substrate;

a beam directing assembly for delivering the write beam to the substrate;

a positioning system for positioning the stage and beam directing assembly relative one another; and

the inteferometry system of claim 1, 20, 28, 42, or 45 for monitoring the position of the stage relative to the beam directing assembly.

20. An interferometry system comprising:

an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct the measurement beam and an electronic positioning system to selectively orient the beam steering element within the interferometer; and

a control circuit which during operation causes the positioning system to reorient the beam steering element based on an interferometric control signal derived from the measurement beam indicative of a change in the angular orientation of the measurement object.

21. The interferometry system of claim 20, further comprising an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object, wherein during operation the angle displacement interferometer generates the interferometric control signal.

22. The system of claim 21, further comprising an angle measurement system which during operation calculates the change in angular orientation of the measurement object based on the interferometric control signal generated by the angle displacement interferometer.

23. The system of claim 20, wherein during operation the control circuit causes the measurement beam to contact the measurement object at substantially normal incidence over a range of angular orientations of the measurement object.

24. The system of claim 20, wherein during operation the interferometer directs only one measurement beam to contact the measurement object.

28. An angle-measuring interferometry system comprising:

an interferometer which during operation receives an input beam, separates the input beam into a measurement beam and at least one other beam, and directs the measurement beam to contact a measurement object;

a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometer and an electronic positioning system to selectively orient the beam steering element relative to the interferometer; and

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam and calculates a change in optical path length to the measurement object based on interferometric information derived from the measurement beam and another beam.

29. The system of claim 28 further comprising:

a control circuit which during operation causes the positioning system to reorient the beam steering element in response to the change in the angular orientation of the measurement object based on a control signal derived from the measurement beam.

30. The system of claim 29, further comprising an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object, and wherein during operation the angle displacement interferometer generates the control signal.

31. The system of claim 30, wherein the measurement signal is derived from the angle displacement interferometer.

32. The system of claim 29 further comprising a detector having spatially resolved detector elements operative to measure the position and/or direction of at least a portion of the measurement beam after it contacts the measurement object, and wherein during operation the detector generates the control signal.

33. The system of claim 29, wherein during operation the control circuit causes the measurement beam to contact the measurement object at substantially normal incidence over a range of angular orientations of the measurement object.

34. The system of claim 29, wherein the measurement signal is derived from the reorientation of the beam steering element caused by the control circuit.

35. The system of claim 29, wherein the measurement signal is derived from at least two interferometric signals produced by combining at least two portions of the measurement beam with corresponding portions of another beam after the measurement beam contacts the measurement object.

36. The system of claim 28, wherein during operation the interferometer directs only one measurement beam to contact the measurement object.

37. The system of claim 36, wherein during operation the interferometer directs the measurement beam to make only a single pass to the measurement object.

38. The system of claim 28, wherein the beam steering element has two reflective faces and wherein during operation the input beam contacts the first face and at least a portion of measurement beam contacts the second face after contacting the measurement object.

39. The system of claim 38, wherein during operation the interferometer separates the measurement beam into at least two portions after contacting the measurement object but before contacting the second face.

40. The system of claim 39, wherein during operation the interferometer combines the two portions of the measurement beam with corresponding portions of a reference beam prior to contacting the second face.

41. The system of claim 28, further comprising an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object and generate the measurement signal.

42. An interferometry system comprising:

an interferometer which during operation receives an input beam, separates the input beam into a measurement beam and at least one other beam, and directs the measurement beam to contact a measurement object;

a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometer and an electronic positioning system to selectively orient the beam steering element relative to the interferometer; and

a control circuit which during operation causes the positioning system to reorient the beam steering element based on an interferometric control signal derived from the measurement beam indicative of a change in the angular orientation of the measurement object.

43. The interferometry system of claim 42, further comprising an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object, wherein during operation the angle displacement interferometer generates the interferometric control signal.

45. An interferometry system comprising:

an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct at least a portion of the measurement beam only after the measurement beam contacts the measurement object and an electronic positioning system to selectively orient the beam steering element within the interferometer; and

a control circuit which during operation causes the positioning system to reorient the beam steering element in response to a change in angular orientation of the measurement object.

49. An angle-measuring interferometry system comprising:

an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct the measurement beam and an electronic positioning system to selectively orient the beam steering element within the interferometer; and

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam;

wherein the measurement signal is derived from at least two interferometric signals produced by combining at least two portions of the measurement beam with corresponding portions of another beam after the measurement beam contacts the measurement object.

50. An angle-measuring interferometry system comprising:

an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct the measurement beam and an electronic positioning system to selectively orient the beam steering element within the interferometer; and

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam;

wherein the beam steering element has two reflective faces and wherein during operation the interferometer directs the measurement beam to contact the first face before contacting the measurement object and directs the measurement beam to contact the second face after contacting the measurement object.

51. The system of claim 50, wherein the beam steering element has two reflective faces and wherein during operation the interferometer directs the measurement beam to contact the first face before contacting the measurement object and directs the measurement beam to contact the second face after contacting the measurement object.

52. An angle-measuring interferometry system comprising:

an interferometer which during operation receives an input beam, separates the input beam into a measurement beam and at least one other beam, and directs the measurement beam to contact a measurement object;

a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometer and an electronic positioning system to selectively orient the beam steering element relative to the interferometer;

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam;

a control circuit which during operation causes the positioning system to reorient the beam steering element in response to the change in the angular orientation of the measurement object based on a control signal derived from the measurement beam; and

an angle displacement interferometer positioned to receive at least a portion of the measurement beam after it contacts the measurement object, and wherein during operation the angle displacement interferometer generates the control signal,

wherein the measurement signal is derived from the angle displacement interferometer.

53. An angle-measuring interferometry system comprising:

an interferometer which during operation receives an input beam, separates the input beam into a measurement beam and at least one other beam, and directs the measurement beam to contact a measurement object;

a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometer and an electronic positioning system to selectively orient the beam steering element relative to the interferometer;

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam; and

a control circuit which during operation causes the positioning system to reorient the beam steering element in response to the change in the angular orientation of the measurement object based on a control signal derived from the measurement beam,

wherein the measurement signal is derived from at least two interferometric signals produced by combining at least two portions of the measurement beam with corresponding portions of another beam after the measurement beam contacts the measurement object.

54. An angle-measuring interferometry system comprising:

an interferometer which during operation receives an input beam, separates the input beam into a measurement beam and at least one other beam, and directs the measurement beam to contact a measurement object;

a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometer and an electronic positioning system to selectively orient the beam steering element relative to the interferometer; and

an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam,

wherein the beam steering element has two reflective faces and wherein during operation the input beam contacts the first face and at least a portion of measurement beam contacts the second face after contacting the measurement object.

55. The system of claim 54, wherein during operation the interferometer separates the measurement beam into at least two portions after contacting the measurement object but before contacting the second face.

56. The system of claim 55, wherein during operation the interferometer combines the two portions of the measurement beam with corresponding portions of a reference beam prior to contacting the second face.