High rate deposition of titanium dioxide
First Claim
Patent Images
1. A structure comprising:
- a substrate; and
a titanium oxide layer disposed over the substrate, wherein the titanium oxide layer is characterized by a property, wherein the property is at least one of an absorbency per unit thickness at an optical wavelength of 330 nm of greater than 4/μ
m, or an absorbency per unit thickness at an optical wavelength of 330 nm of greater than 4/μ
m which decreases by no more than 5% after the structure is submerged for 3 days in distilled water at 65°
C.
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Abstract
There is provided a structure. The structure comprises a substrate, and a titanium oxide layer disposed over the substrate. There is also provided a method of forming a titanium oxide coating on a substrate. The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate; and forming the titanium oxide coating on the substrate.
43 Citations
19 Claims
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1. A structure comprising:
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a substrate; and
a titanium oxide layer disposed over the substrate, wherein the titanium oxide layer is characterized by a property, wherein the property is at least one of an absorbency per unit thickness at an optical wavelength of 330 nm of greater than 4/μ
m, or an absorbency per unit thickness at an optical wavelength of 330 nm of greater than 4/μ
m which decreases by no more than 5% after the structure is submerged for 3 days in distilled water at 65°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification