High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices
First Claim
1. A method to improve the resistance to radiation-induced damage in an optical micro-electromechanical system (MEMS) comprising at least one movable modulating element, said damage resulting from cumulative pulses of low-fluence, short wavelength electromagnetic radiation, comprising the action of:
- forming at least one radiation-resistant layer on a front side of at least one movable modulating element.
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Accused Products
Abstract
The present invention includes methods and devices that improve the radiation-resistance of a movable micromechanical optical element. In particular, a radiation-resistant layer is added to a movable micro-mechanical optical element, suitable to reduce the surface and bulk material changes to the element that result from exposure to pulsed laser energy densities less than 100 micro-joules per square centimeter and at wavelengths less than or equal to about 248 nm.
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Citations
46 Claims
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1. A method to improve the resistance to radiation-induced damage in an optical micro-electromechanical system (MEMS) comprising at least one movable modulating element, said damage resulting from cumulative pulses of low-fluence, short wavelength electromagnetic radiation, comprising the action of:
forming at least one radiation-resistant layer on a front side of at least one movable modulating element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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38. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein said radiation-resistant layer is substantially reflective of radiation at an operating wavelength of about 248 nm or less.
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39. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein the movable modulating element and the radiation-resistant layer are substantially transmissive at an operating wavelength of about 248 nm or less.
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40. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein said radiation-resistant layer includes at least one of hafnium oxide (HfO2), magnesium fluoride (MgF2), aluminum oxide (Al2O3), silicon dioxide (SiO2) or lithium fluoride (LiF2).
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41. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein said radiation-resistant layer includes an oxide of hafnium, an oxide of aluminum or an oxide of silicon.
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42. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein said radiation-resistant layer includes a fluoride of magnesium, a fluoride of calcium or a fluoride of lithium.
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43. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein said radiation-resistant layer is an implanted layer at the front side of the movable modulating element.
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44. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, wherein the front side is flat, having an RMS of 2 nm or better.
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45. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, further including;
a back side of the movable modulating element; and
at least one anti-reflective layer formed on the back side.
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46. At least one movable modulating element of an optical micro-electromechanical system (MEMS), comprising:
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a front side; and
at least one radiation-resistant layer over the front side, further including;
a non-movable substrate below the movable modulating element, to which the movable element is movably coupled; and
at least one anti-reflective layer formed on a part of the non-movable substrate.
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Specification