Layout to minimize gate orientation related skew effects
First Claim
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1. A method of making a symmetric transistor device comprising:
- depositing a first conductive layer on a substrate, the first conductive layer forming an even number of transistor legs, laid out in an intersecting pattern, forming a bilaterally symmetric base;
doping the substrate to form source and drain regions and non-diffused areas around the intersections of the transistor legs; and
forming a plurality of transistors defined by a portion of a transistor leg forming a gate and the source and drain areas on either side of the leg forming a source and a drain.
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Abstract
A method and apparatus for a driver layout is described. The layout includes an first number of gate lines arranged along a first axis and a second equal number of gates arranged along a second axis, such that the first set of gates lines is orthogonal to the second set of gates lines. The layout includes a total of N discrete transistors.
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Citations
10 Claims
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1. A method of making a symmetric transistor device comprising:
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depositing a first conductive layer on a substrate, the first conductive layer forming an even number of transistor legs, laid out in an intersecting pattern, forming a bilaterally symmetric base;
doping the substrate to form source and drain regions and non-diffused areas around the intersections of the transistor legs; and
forming a plurality of transistors defined by a portion of a transistor leg forming a gate and the source and drain areas on either side of the leg forming a source and a drain. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of making a symmetric transistor device comprising:
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depositing a first conductive layer on a substrate, the first conductive layer forming an even number of transistor legs, laid out in an intersecting pattern, forming a bilaterally symmetric base;
doping the substrate to form source and drain regions; and
forming a plurality of transistors defined by a portion of a transistor leg forming a gate and the source and drain areas on either side of the leg forming a source and a drain, so as to reduce skew effects due to mask alignment and gate orientation. - View Dependent Claims (9, 10)
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Specification