Electromagnetophoretic display system and method
First Claim
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1. An electromagnetophoretic ink material comprisingan encapsulating structure;
- a first aspect medium within said encapsulating structure, and a plurality of second aspect elements within said encapsulating structure;
wherein each of said plurality of second aspect elements comprises a second aspect inner layer, and a second aspect outer layer;
wherein said each of said plurality of second aspect elements is configured to translationally displace within said encapsulating structure under the influence of an applied gradient field, and wherein said each of said plurality of second aspect elements is further configured to translationally displace within said encapsulating structure under the influence of an applied vector field.
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Abstract
The present invention comprises an electromagnetophoretic ink material for use as electronic and magnetic display elements. In particular, the present invention relates to the preparation and use of microencapsulated aspect elements having both an electrostatic layer and a magnetic layer, and that can be addressed to produce a display aspect by the application of external electric fields and external magnetic fields.
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20 Claims
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1. An electromagnetophoretic ink material comprising
an encapsulating structure; -
a first aspect medium within said encapsulating structure, and a plurality of second aspect elements within said encapsulating structure;
wherein each of said plurality of second aspect elements comprises a second aspect inner layer, and a second aspect outer layer;
wherein said each of said plurality of second aspect elements is configured to translationally displace within said encapsulating structure under the influence of an applied gradient field, and wherein said each of said plurality of second aspect elements is further configured to translationally displace within said encapsulating structure under the influence of an applied vector field. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of addressing electromagnetophoretic ink material to present an aspect,
said electromagnetophoretic ink material comprising a first aspect medium within an encapsulating structure and a plurality of second aspect elements within said encapsulating structure; -
wherein each of said plurality of second aspect elements comprises a second aspect inner layer, and a second aspect outer layer;
said method comprising introducing a vector field to said electromagnetophoretic ink material in a first direction, and introducing a gradient field to said electromagnetophoretic ink material said first direction.
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15. A method of addressing electromagnetophoretic ink material to present an aspect,
said electromagnetophoretic ink material comprising a first aspect medium within an encapsulating structure and a plurality of second aspect elements within said encapsulating structure; -
wherein each of said plurality of second aspect elements comprises a second aspect inner layer, and a second aspect outer layer;
said method comprising introducing a vector field to said electromagnetophoretic ink material in a first direction, and introducing a gradient field to said electromagnetophoretic ink material a second direction, wherein said second direction is antiparallel to said first direction. - View Dependent Claims (17, 18)
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16. A method of addressing electromagnetophoretic ink material to present an aspect,
said electromagnetophoretic ink material comprising a first aspect medium within an encapsulating structure and a plurality of second aspect elements within said encapsulating structure; -
wherein each of said plurality of second aspect elements comprises a second aspect inner layer, and a second aspect outer layer;
said method comprising introducing a first vector field to said electromagnetophoretic ink material in a first direction, introducing a gradient field to said electromagnetophoretic ink material in a second direction, and then introducing a second vector field to said electromagnetophoretic ink material in said second direction, wherein said second direction is antiparallel to said first direction, and wherein the magnitude of said second vector field is less than the magnitude of said first vector field. - View Dependent Claims (19, 20)
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Specification