Tunneling floating gate APS pixel

• US 6,897,519 B1
• Filed: 07/25/2003
• Issued: 05/24/2005
• Est. Priority Date: 02/26/2003
• Status: Active Grant

• Current Assignee: United Microelectronics Corporation
• Original Assignee: Dialog Semiconductor plc (Renesas Electronics Corporation)
• Inventors: Dosluoglu, Taner
• Primary Examiner(s): LOKE, STEVEN HO YIN
• Application Number:
  US10/627,796
• Time in Patent Office: 669 Days
• Field of Search: 257/315, 257/461, 257/292, 257/291
• US Class Current: 257/315
• CPC Class Codes: H01L 27/14603 Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
• CPC Class Codes: H01L 27/14643 Photodiode arrays; MOS imagers
• CPC Class Codes: H01L 31/112 characterised by field-effect operation, e.g. junction field-effect phototransistor

Abstract

A floating gate pixel is described which is formed by forming an N well in a P type silicon substrate. A P well is formed in the N well A gate is formed over a thin gate oxide, about 25 Angstroms thickness, such that the gate is directly over part of the P well and part of the N well. A P⁺ contact in the P well allows connection to a reset voltage source, usually through a reset transistor, to reset the pixel. The pixel is reset by setting the potential between the P well and the substrate, which is usually held at ground potential. When the pixel is reset tunneling current through the thin gate oxide sets the voltage of the floating gate. During the charge integration cycle an input signal to the pixel, such as a light signal, changes the potential of the pixel. After the charge integration cycle the tunneling current through the gate oxide changes the potential of the floating gate by an amount related to the input signal to the pixel. The potential of the floating gate can then be read out to determine the input signal to the pixel. The pixel can also be embodied using a P well formed in an N type substrate, an N well formed in the P well, and an N⁺ contact formed in the N well.

Claims

1. A method of operating a floating gate pixel, comprising:

providing a P type silicon substrate;

forming an N well in said substrate, wherein said N well is N type silicon and has no contact regions formed therein;

forming a P well in said N well, wherein said P well is P type silicon;

forming a contact region in said P well, wherein said contact region is P⁺ type silicon and is the only contact region formed in said P well;

forming a gate oxide on said substrate, wherein said gate oxide has a thickness which is sufficiently small to allow tunneling through said gate oxide;

forming a floating gate on said gate oxide, wherein said floating gate is directly over part of said P well and part of said N well and the only electrical connection to said floating gate is to connect said floating gate to a means for determining the potential of said floating gate;

resetting the potential between said P well and said substrate during a reset period wherein a tunneling current between said P well and said floating gate resets the potential of said floating gate;

accumulating charge at the PN junction between said P type silicon substrate and said N well during a charge integration period, thereby changing the potential of said N well, said P well, and said floating gate and wherein said charge integration period follows said reset period; and

reading the potential of said floating gate after said charge integration period has been completed.

2. The method of claim 1 wherein the charge accumulated at the PN junction between said P type silicon substrate and said N well is related to the amount of light incident on the P type silicon substrate and the N well during said charge integration period.

3. The method of claim 1, further comprising:

forming an electrical connection between said contact region formed in said P well and a means for resetting the potential between said P well and said substrate; and

forming an electrical connection between said floating gate and said means for determining the potential of said floating gate.

4. The method of claim 1 wherein the PN junction between said P type silicon substrate and said N well forms a photodiode.

5. The method of claim 1 wherein the thickness of said gate oxide is less than or equal to 30 Angstroms.

6. The method of claim 1 wherein said resetting the potential between said P well and said substrate is accomplished using a reset transistor.

7. The method of claim 1 wherein said means for determining the potential of said floating gate comprises a source follower transistor circuit.

8. A method of operating a floating gate pixel, comprising:

providing an N type silicon substrate;

forming a P well in said substrate, wherein said P well is P type silicon and has no contact regions formed therein;

forming an N well in said P well, wherein said N well is N type silicon;

forming a contact region in said N well, wherein said contact region is N⁺ type silicon and is the only contact region formed in said N well;

forming a gate oxide on said substrate, wherein said gate oxide has a thickness which is sufficiently small to allow tunneling through said gate oxide;

forming a floating gate on said gate oxide, wherein said floating gate is directly over part of said N well and part of said P well and the only electrical connection to said floating gate is to connect said floating gate to a means for determining the potential of said floating gate;

resetting the potential between said N well and said substrate during a reset period wherein a tunneling current between said N well and said floating gate resets the potential of said floating gate;

accumulating charge at the PN junction between said N type silicon substrate and said P well during a charge integration period, thereby changing the potential of said P well, said N well, and said floating gate and wherein said charge integration period follows said reset period; and

reading the potential of said floating gate after said charge integration period has been completed.

9. The method of claim 8 wherein the charge accumulated at the PN junction between said N type silicon substrate and said P well is related to the amount of light incident on the N type silicon substrate and the P well during said charge integration period.

10. The method of claim 8, further comprising:

forming an electrical connection between said contact region formed in said N well and a means for resetting the potential between said N well and said substrate; and

forming an electrical connection between said floating gate and said means for determining the potential of said floating gate.

11. The method of claim 8 wherein the PN junction between said P well and said N type silicon substrate forms a photodiode.

12. The method of claim 8 wherein the thickness of said gate oxide is less than or equal to 30 Angstroms.

13. The method of claim 8 wherein said resetting the potential between said N well and said substrate is accomplished using a reset transistor.

14. The method of claim 8 wherein said reading the potential of said floating gate comprises a source follower transistor circuit.

15. A floating gate pixel, comprising:

a P type silicon substrate;

an N well formed in said substrate, wherein said N well is N type silicon and has no contact regions formed therein;

a P well formed in said N well, wherein said P well is P type silicon;

a contact region formed in said P well, wherein said contact region is P⁺ type silicon and is the only contact region formed in said P well;

a gate oxide formed on said substrate, wherein said gate oxide has a thickness which is sufficiently small to allow tunneling through said gate oxide;

a floating gate formed on said gate oxide, wherein said floating gate is directly over part of said P well and part of said N well;

means for resetting the potential between said P well and said substrate; and

means for reading the potential of said floating gate, wherein the only electrical connection to said floating gate is to connect said floating gate to said means for reading the potential of said floating gate.

16. The floating gate pixel of claim 15 further comprising:

electrical connection between said contact region formed in said P well and said means for resetting the potential between said P well and said substrate; and

electrical connection between said floating gate and said means for reading the potential of said floating gate.

17. The floating gate pixel of claim 15 wherein the PN junction between said P type silicon substrate and said N well forms a photodiode.

18. The floating gate pixel of claim 15 wherein the thickness of said gate oxide is less than or equal to 30 Angstroms.

19. The floating gate pixel of claim 15 wherein said means for resetting the potential between said P well and said substrate comprises a reset transistor.

20. The floating gate pixel of claim 15 wherein said means for reading the potential of said floating gate comprises a source follower transistor circuit.

21. A floating gate pixel, comprising:

an N type silicon substrate;

a P well formed in said substrate, wherein said P well is P type silicon and has no contact regions formed therein;

an N well formed in said P well, wherein said N well is N type silicon;

a contact region formed in said N well, wherein said contact region is N⁺ type silicon and is the only contact region formed in said N well;

a gate oxide formed on said substrate, said gate oxide has a thickness which is sufficiently small to allow tunneling through said gate oxide;

a floating gate formed on said gate oxide, wherein said floating gate is directly over part of said N well and part of said P well;

means for resetting the potential between said N well and said substrate; and

means for determining the potential of said floating gate, wherein the only electrical connection to said floating gate is to connect said floating gate to said means for determining the potential of said floating gate.

22. The floating gate pixel of claim 21 further comprising:

an electrical connection between said contact region formed in said N well and said means for resetting the potential between said N well and said substrate; and

an electrical connection between said floating gate and said means for determining the potential of said floating gate.

23. The floating gate pixel of claim 21 wherein the PN junction between said N type silicon substrate and said P well forms a photodiode.

24. The floating gate pixel of claim 21 wherein the thickness of said gate oxide is less than or equal 30 Angstroms.

25. The floating gate pixel of claim 21 wherein said means for resetting the potential between said N well and said substrate comprises a reset transistor.

26. The floating gate pixel of claim 21 wherein said means for determining the potential of said floating gate comprises a source follower transition circuit.