Step and repeat imprint lithography systems

• US 6,900,881 B2
• Filed: 07/11/2002
• Issued: 05/31/2005
• Est. Priority Date: 07/11/2002
• Status: Expired due to Term

• Current Assignee: Mii Newco, Inc. (Canon Inc.)
• Original Assignee: Molecular Imprints, Inc. (Canon Inc.)
• Inventors: Sreenivasan, Sidlgata V., Watts, Michael P. C., Voisin, Ronald D., Choi, Byung Jin, Schumaker, Norman E., Meissl, Mario J.
• Primary Examiner(s): Kim, Peter B.
• Application Number:
  US10/194,414
• Publication Number:
  US 20040008334A1
• Time in Patent Office: 1,055 Days
• Field of Search: 355/72, 355/78, 355/87, 355/91, 396/428, 430/322, 430/324, 430/22, 430/30, 264/401, 427/458, 700/240
• US Class Current: 355/72
• CPC Class Codes: B29C 2035/0827 using UV radiation
• CPC Class Codes: B29C 2059/023 Microembossing
• CPC Class Codes: B29C 35/0888 using transparant moulds
• CPC Class Codes: B29C 59/022 characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
• CPC Class Codes: B81C 1/0046 using stamping, e.g. imprinting nanoimprinting for making etch masks G03F7/0002
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: H01L 21/0271 comprising organic layers

Abstract

Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.

Claims

1. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light;

a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;

an imprint head coupled to the body, wherein the imprint head is configured to selectively hold the patterned template proximate to the substrate, wherein the imprint head comprises a fine orientation system, wherein the fine orientation system is configured to allow motion of the patterned template with respect to the substrate to achieve a substantially parallel orientation of the patterned template with respect to the substrate;

a force detector coupled to the imprint head, wherein the force detector is configured to determine a resistive force applied to the template;

a liquid dispenser coupled to the body, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate, with said resistive force resulting from contact of the template with the liquid; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

2. The system of claim 1, wherein the fine orientation system is configured to allow motion of the patterned template to a substantially parallel orientation with respect to the substrate when the template contacts a liquid disposed on the substrate.

3. The system of claim 1, wherein the fine orientation system comprises one or more passive compliant members.

4. The system of claim 1, wherein the fine orientation system comprises:

a first flexure member, wherein the first flexure member is configured to pivot about a first orientation axis;

a second flexure member coupled to the first flexure member, wherein the second flexure member is configured to pivot about a second orientation axis; and

a support coupled to the second flexure member, wherein the support is configured to hold the patterned template;

wherein the second flexure member is coupled to the first flexure member such that the patterned template, when disposed in the support, moves about a pivot point intersected by the first and second orientation axes.

5. The system of claim 4, wherein the first flexure member comprises first and second arms, wherein the first arm comprises a first set of flexure joints which are configured to provide pivotal motion of the first flexure member about the first orientation axis, and wherein the second arm comprises a second set of flexure joints which are configured to provide pivotal motion of the first flexure member about the first orientation axis, and wherein the second flexure member comprises third and fourth arms, wherein the third arm comprises a third set of flexure joints which are configured to provide pivotal motion of the second flexure member about the second orientation axis, and wherein the fourth arm comprises a fourth set of flexure joints which are configured to provide pivotal motion of the second flexure member about the second orientation axis.

6. The system of claim 4, wherein the first flexure member comprises a first opening, the second flexure member comprises a second opening, and the support comprises a third opening, wherein each of the first, second and third openings are configured to allow the activating light to be directed onto the template, wherein the first, second and third openings are substantially aligned when the first flexure member is coupled to the second flexure member.

7. The system of claim 4, further comprising a precalibration stage coupled to the fine orientation system, wherein the precalibration stage is configured to move the fine orientation system toward and away from the substrate.

8. The system of claim 1, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

9. The system of claim 1, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 10 ppm/°

C. at about 25°

C.

10. The system of claim 1, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 1 ppm/°

C. at about 25°

C.

11. The system of claim 1, wherein the motion stage comprises an air-bearing stage.

12. The system of claim 1, further comprising an encoder system coupled to the motion stage, wherein the linear encoder system is configured to determine the displacement of the motion stage with respect to a reference point on the body.

13. The system of claim 12, wherein the encoder system comprises a glass scale linear encoder system.

14. The system of claim 1, further comprising an encoder system coupled to the motion stage, wherein the linear encoder system is configured to determine the displacement of the motion stage toward the template with respect to a reference point on the body.

15. The system of claim 1, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configured to inhibit temperature variation of greater than about 1°

C. within the enclosure.

16. The system of claim 1, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configured to inhibit temperature variations of greater than about 0.1°

C. within the enclosure.

17. The system of claim 1, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

18. The system of claim 1, wherein the patterned template further comprises a surface treatment layer on at least a portion of the first surface, and wherein the surface treatment layer comprises a reaction product of an alkylsilane, a fluoroalkylsilane or a fluoroalkyltrichlorosilane with water.

19. The system of claim 1, wherein the patterned template further comprises a surface treatment layer on at least a portion of the first surface, and wherein the surface treatment layer comprises a reaction product of tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane with water.

20. The system of claim 1, wherein the patterned template further comprises a surface treatment layer on at least a portion of the lower surface, and wherein the surface treatment layer reduces the surface free energy of the lower surface measured at 25°

C. to less than about 40 dynes/cm.

21. The system of claim 1, wherein at least a portion of the template comprises silicon, silicon dioxide, silicon germanium carbon, gallium nitride, silicon germanium, sapphire, gallium arsenide, epitaxial silicon, poly-silicon, gate oxide, quartz, indium tin oxide, an oxide of silicon or a combination thereof.

22. The system of claim 1, wherein the liquid dispenser is coupled to the imprint head.

23. The system of claim 1, further comprising an air gauge coupled to the imprint head, wherein the air gauge is configured to determine a distance between the substrate and the template.

24. The system of claim 1, further comprising an air gauge coupled to the motion stage, wherein the air gauge is configured to determine a distance between the substrate and the template.

25. The system of claim 1, wherein the imprint head is configured to move the template toward the substrate.

26. The system of claim 1, wherein the imprint head is configured to move the patterned template toward the substrate.

27. The system of claim 1, wherein the motion stage is configured to move the substrate toward the patterned template.

28. The system of claim 1, wherein the motion stage is positioned below the imprint head.

29. The system of claim 1, wherein the motion stage is positioned above the imprint head.

30. The system of claim 1, wherein the activating light source is positioned with respect to the body such that the activating light source is thermally insulated from the body.

84. The system as recited in claim 1 said template is formed from a material selected from a set of materials consisting essentially of silicon, silicon dioxide, silicon germanium carbon, gallium nitride, silicon germanium, sapphire, gallium arsenide, epitaxial silicon, poly-silicon, gate oxide, quartz, indium tin oxide, and an oxide of silicon.

31. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light, and wherein the patterned template comprises a first surface and a plurality of recesses formed in a patterning area of the template extending from the first surface toward a second surface of the template, where the recesses define a plurality of features in the first surface of the patterned template, and wherein the patterned template comprises a border formed about the perimeter of the patterning area, wherein a depth of the border is greater than a depth of the recesses;

a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template, and wherein the motion stage comprises a fine orientation system, wherein the fine orientation system is configured to allow motion of the substrate with respect to the patterned template to achieve a substantially parallel orientation of the substrate with respect to the patterned template;

an imprint head coupled to the body, wherein the imprint head is configured to selectively position the patterned template proximate to the substrate;

a force detector coupled to the motion stage, wherein the force detector is configured to determine a resistive force applied to the substrate;

a liquid dispenser coupled to the body, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate, with the resistive force being generated by contact of the template with the liquid; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

32. The system of claim 31, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

33. The system of claim 31, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system as configured to inhibit temperature variations of greater than about 1°

C. within the enclosure.

34. The system of claim 31, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

36. The system of claim 33, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

35. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light, and wherein the patterned template comprises a first surface and a plurality of recesses formed in a patterning area of the template extending from the first surface toward a second surface of the template, where the recesses define a plurality of features in the first surface of the patterned template, and wherein the patterned template comprises a border formed about the perimeter of the patterning area, wherein a depth of the border is greater than a depth of the recesses;

an imprint head, wherein the imprint head is configured to hold the patterned template;

a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate, wherein the imprint head comprises a fine orientation system, wherein the fine orientation system is configured to allow motion of the patterned template with respect to the substrate to achieve a substantially parallel orientation of the patterned template with respect to the substrate;

a substrate support coupled to the body, wherein the substrate support is configured to selectively position the substrate proximate to the patterned template,

a liquid dispenser coupled to the motion stage, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

37. The system of claim 35, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configure to inhibit temperature variations of greater than about 1°

C. within the enclosure.

38. The system of claim 35, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

39. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light, and wherein the patterned template comprises a first surface and a plurality of recesses formed in a patterning area of the template extending from the first surface toward a second surface of the template, where the recesses define a plurality of features in the first surface of the patterned template, and wherein the patterned template comprises a border formed about the perimeter of the patterning area, wherein a depth of the border is greater than a depth of the recesses;

an imprint head, wherein the imprint head is configured to hold the patterned template;

a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate;

a substrate support coupled to the body, wherein the substrate support is configured to selectively position the substrate proximate to the patterned template, and wherein the substrate support comprises a fine orientation system, wherein the fine orientation system is configured to allow motion of the substrate with respect to the patterned template to achieve a substantially parallel orientation of the substrate with respect to the patterned template

a liquid dispenser coupled to the motion stage, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

40. The system of claim 39, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm °

C. at about 25°

C.

41. The system of claim 39, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configured to inhibit temperature variations of greater than about 1°

C. within the enclosure.

42. The system of claim 39, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

43. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light;

a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template, wherein the motion stage comprises;

a substrate chuck configured to support the substrate; and

a substrate tilt module coupled to the substrate chuck, wherein the substrate tilt module is configured to alter a tilt of the substrate when the substrate is coupled to the substrate chuck, and wherein the substrate chuck and substrate tilt module have a stiffness sufficient to inhibit the tilt of the substrate when the template applies a force to a liquid disposed on the substrate;

an imprint head coupled to the body, wherein the imprint head is configured to selectively position the patterned template proximate to the substrate, wherein the imprint head comprises a fine orientation system, wherein the fine orientation system is configured to allow motion of the patterned template with respect to the substrate to achieve a substantially parallel orientation of the patterned template with respect to the substrate;

a force detector coupled to the imprint head, wherein the force detector is configured to determine a resistive force applied to the template;

a liquid dispenser coupled to the body, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate, with the resistive force being generated by contact of the template with the liquid; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

44. The system of claim 43 wherein the substrate tilt module has a stiffness sufficient to inhibit tilt of the substrate when the template applies a force of between about 1 lb. to about 10 lbs. to a liquid disposed on the substrate.

45. The system of claim 43, wherein the substrate tilt module has a stiffness sufficient to allow inhibit tilt of the substrate when the template applies a force to a liquid disposed on the substrate, wherein the tilt of the substrate is less than about 5 micro radians when the template applies a force of between about 1 lb. to about 10 lb.

46. The system of claim 43, further comprising an air gauge coupled to the imprint head, where the air gauge is configured to determine the tilt of the substrate when the substrate is coupled to the motion stage.

47. The system of claim 43, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

48. The system of claim 43, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configure to inhibit temperature variations of greater than about 1°

C. within the enclosure during use.

49. The system of claim 43, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

50. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light;

a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template, and wherein the motion stage comprises;

a substrate chuck configured to support the substrate; and

a substrate tilt module coupled to the substrate chuck, wherein the substrate tilt module is configured to alter a tilt of the substrate when the substrate is coupled to the substrate chuck, and wherein the substrate tilt module is configured to allow motion of the substrate with respect to the template to achieve a substantially parallel orientation of the substrate with respect to the patterned template, and wherein the substrate chuck and substrate tilt module have a stiffness sufficient to inhibit the tilt of the substrate when the template applies a force to a liquid disposed on the substrate;

an imprint head coupled to the body, wherein the imprint head is configured to selectively position the patterned template proximate to the substrate;

a force detector coupled to the imprint head, wherein the force detector is configured to determine a resistive force applied to the template;

a liquid dispenser coupled to the body, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate, with the resistive force being generated by contact of the template with the liquid; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

51. The system of claim 50, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

52. The system of claim 50, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configured to inhibit temperature variations of greater than about 1°

C. within the enclosure.

53. The system of claim 50, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

54. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light;

an imprint head, wherein the imprint head is configured to hold the patterned template;

a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate, wherein the imprint head comprises a fine orientation system, wherein the fine orientation system is configured to allow motion of the patterned template with respect to the substrate to achieve a substantially parallel orientation of the patterned template with respect to the substrate;

a substrate support coupled to the body, wherein the substrate support is configured to selectively position the substrate proximate to the patterned template, and

a substrate chuck configured to support the substrate; and

wherein the substrate support comprises;

a substrate chuck, and a substrate tilt module coupled to the substrate chuck, wherein the substrate tilt module is configured to alter a tilt of the substrate when the substrate is coupled to the substrate chuck, and wherein the substrate chuck and substrate tilt module have a stiffness sufficient to inhibit the tilt of the substrate when the template applies a force to a liquid disposed on the substrate;

a liquid dispenser coupled to the motion stage, wherein the liquid, dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

55. The system of claim 54, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material, having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

56. The system of claim 54, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the temperature control system is configure to inhibit temperature variations of greater than about 1°

C. within the enclosure.

57. The system of claim 54, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

58. A system for forming a pattern on a substrate comprising:

a body;

a patterned template, wherein the patterned template is substantially transparent to an activating light;

an imprint head, wherein the imprint head is configured to hold the patterned template;

a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate;

a substrate support coupled to the body, wherein the substrate support is configured to selectively position the substrate proximate to the patterned template, and a substrate chuck configured to support the substrate; and

wherein the substrate support comprises;

a substrate chuck, and

a substrate tilt module coupled to the substrate chuck, wherein the substrate tilt module is configured to alter a tilt of the substrate when the substrate is coupled to the substrate chuck, and wherein the substrate tilt module is configured to allow motion of the substrate with respect to the template to achieve a substantially parallel orientation of the substrate with respect to the patterned template, and wherein the substrate chuck and substrate tilt module have a stiffness sufficient to inhibit the tilt of the substrate when the template applies a force to a liquid disposed on the substrate;

a liquid dispenser coupled to the motion stage, wherein the liquid dispenser is configured to dispense an activating light curable liquid onto at least a portion of the substrate; and

an activating light source optically coupled to the patterned template, wherein the activating light source is configured to direct the activating light through the patterned template.

59. The system of claim 58, further comprising a support structure coupled to the imprint head and to the motion stage, wherein the support structure comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C. at about 25°

C.

60. The system of claim 58, further comprising an enclosure around at least the imprint head and the motion stage, and a temperature control system, wherein the the temperature control system is configure to inhibit temperature variations of greater than about 1°

C. within the enclosure.

61. The system of claim 58, wherein at least a portion of the first surface of the patterned template comprises a surface treatment layer.

62. A system for forming a pattern on a substrate, said system comprising:

a body, with said substrate supported on said body;

a template having a patterning area facing said substrate;

a dispenser coupled to said body to dispense an activating light curable liquid onto said substrate; and

a displacement system coupled to said body and said template to vary a distance between said template and said substrate and cause said liquid to concurrently contact said substrate and said template while inhibiting a quantity of said liquid to extend to areas outside of said patterning area.

63. The system as recited in claim 62 further including a light source to impinge actinic radiation upon said liquid.

64. The system as recited in claim 62 wherein said displacement system further includes a motion stage, disposed upon the body, to support the substrate and to provide relative movement between the substrate and the template along first and second transverse axes and an imprint head, to which the template is attached, to provide relative movement between the template and the substrate along a third axis that extends transversely to the first and second axes.

65. The system of claim 62 further including a fine orientation system connected to the template to allow pivotal movement of the template with respect to the substrate to maintain a substantially parallel orientation with respect to the substrate in response to a contact force.

66. The system as recited in claim 62 wherein said displacement system further includes a fine orientation system to allow motion of said substrate with respect to the template in response to a contact force.

67. The system as recited in claim 62 wherein said displacement system further includes a substrate chuck, disposed upon said body, to support the substrate and a substrate tilt module coupled to the substrate chuck, and a fine orientation system connected to the tilt module to allow the tilt module to vary the tilt of the substrate and maintain a substantially parallel orientation of the substrate and the template in response to a contact force.

68. The system of claim 62 wherein the template further includes first and second opposed sides with the patterning region and a first surface disposed on the first side, the patterning region including a pattern surface and a recess extending from the pattern surface toward the second side, ending in a terminus, with the first surface being spaced-apart from the second side a first distance, the terminus being spaced apart from the second side a second distance and the pattern surface being spaced-apart from the second side a third distance, with the first distance differing from both the second and third distances.

69. The system of claim 62 wherein said displacement system further includes a fine orientation system having a first flexure member, wherein the first flexure member is configured to pivot about a first orientation axis and a second flexure member coupled to the first flexure member, wherein the second flexure member is configured to pivot about a second orientation axis a support coupled to the second flexure member, with said template being coupled to said support.

70. The system of claim 62 wherein said displacement system further includes a precalibration stage coupled to the fine orientation system, wherein the precalibration stage.

71. The system of claim 62 further comprising an enclosure and a temperature control system, with said enclosure enclosing a region with said template and said substrate disposed in said region, surrounding around at least the imprint head and the body, and said temperature control system being configured to minimize temperature variations in said region.

72. The system of claim 62 further comprising an enclosure and a temperature control system, with said enclosure enclosing a region with said template and said substrate disposed in said region, surrounding around at least the imprint head and the body, and said temperature control system being configured to minimize temperature variations in said region of greater than about 1°

C.

73. The system of claim 62 further comprising an air gauge coupled to said displacement system to determine a distance between said substrate and said patterning region.

74. The system as recited in claim 62 wherein said patterning area has a substantially smooth profile.

75. The system as recited in claim 62 wherein said patterning area includes a plurality of features.

76. The system as recited in claim 62 wherein said body comprises a material having a linear thermal expansion coefficient of less than about 20 ppm/°

C.

77. The system as recited in claim 62 wherein said displacement system further includes an air-bearing stage to support said substrate.

78. The system as recited in claim 62 further including a linear encoder system coupled to the displacement system, with the linear encoder system configured to determine a displacement of said substrate with respect to a reference point on said body.

79. The system as recited in claim 78 wherein said encoder system comprises a glass scale linear encoder system.

80. The system as recited in claim 62 wherein said patterning area includes a surface treatment layer.

81. The system as recited in claim 62 wherein said patterning area includes a surface treatment layer comprising a reaction product of an alkylsilane, a fluoroalkylsilane, or a fluoroalkyltrichlorosilane with water.

82. The system as recited in claim 62 wherein said patterning area includes a surface treatment layer comprising a reaction product of tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane with water.

83. The system as recited in claim 62 wherein said pattering area includes a surface treatment layer providing said patterning region with a surface free energy measured at 25°

C. to less than about 40 dynes/cm.