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Method of manufacturing semiconductor device capable of sensing dynamic quantity

  • US 6,906,394 B2
  • Filed: 05/30/2003
  • Issued: 06/14/2005
  • Est. Priority Date: 05/28/2001
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising:

  • a substrate including;

    a first semiconductor layer;

    an insulation layer formed on the first semiconductor layer; and

    a second semiconductor layer formed on the insulation layer and having a trench extending to the insulation layer from a surface of the second semiconductor layer;

    a plurality of anchor portions secured on the insulation layer;

    a movable section formed in the trench and including a mass portion supported on opposite ends thereof by the plurality of anchor portions via beam portions;

    a plurality of first electrodes integrally formed with the mass portion and protruding therefrom; and

    a plurality of fixed sections formed in the trench, each of the fixed sections including a wiring portion secured on the insulation layer and a plurality of second electrodes integrally formed with the wiring portion and protruding therefrom to interleave with the plurality of first electrodes;

    wherein the plurality of first electrodes is displaceable in response to an applied dynamic quantity, and at least one of the anchor portions and the wiring portion of each of the plurality of fixed sections has a bottom-most portion that is narrower than a surface portion thereof.

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