Color filter substrate as well as method of manufacturing the same, electro-optic device and electronic equipment

• US 6,906,841 B2
• Filed: 07/01/2003
• Issued: 06/14/2005
• Est. Priority Date: 07/09/2002
• Status: Expired due to Term

• Current Assignee: BOE Technology Group Co., Ltd.
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Adachi, Isao
• Primary Examiner(s): Sugarman, Scott J.
• Assistant Examiner(s): Hanig, Richard
• Application Number:
  US10/609,643
• Publication Number:
  US 20040036945A1
• Time in Patent Office: 714 Days
• Field of Search: 359/245, 359/253, 359/266, 349/106, 362/293
• US Class Current: 359/245
• CPC Class Codes: G02F 1/133516 Methods for their manufacture, e.g. printing, electro-deposition or photolithography
• CPC Class Codes: G02F 1/133519 Overcoatings
• CPC Class Codes: G02F 1/133555 Transflectors
• CPC Class Codes: G02F 2203/09 transflective

Abstract

The invention provides a color filter substrate in which light leakage ascribable to the gap of colored layers, etc. are reduced or prevented from occurring, and which is capable of displaying a color image of high quality, and a method of manufacturing the same. A color filter substrate which has pixel portions arrayed in the shape of a matrix on a substrate includes a first colored layer which is formed at parts in either of a transmission region and a reflection region adjacent to each other within each of the pixel portions, and a second colored layer which is formed in both the regions and on the whole surfaces thereof except the formation region of the first colored layer.

Claims

1. A color filter substrate, comprising:

a substrate;

pixel portions arrayed in a matrix on the substrate;

a first region and a second region formed adjacent to each other within each of the pixel portions;

a first colored layer formed at parts in the first region; and

a second colored layer formed in the second region, and formed at parts in the first region except a formation region of the first colored layer.

2. The color filter substrate as defined in claim 1, the first colored layer being formed in a matrix-like pattern within the first region.

3. The color filter substrate as defined in claim 1, a predetermined distance being set between an outer edge of the region in which the first colored layer is formed and an inner edge of the other region.

4. The color filter substrate as defined in claim 1, a thickness of the first colored layer and a thickness of the second colored layer being the same.

5. The color filter substrate as defined in claim 1, the first colored layer and the second colored layer being made of materials which have spectral transmission factors that are different from each other.

6. An electro-optic device, comprising:

the color filter substrate of claim 1;

another substrate arranged in opposition to the color filter substrate; and

an electro-optic substance arranged between the color filter substrate and the other substrate.

13. An electronic equipment, comprising:

the electro-optic device of claim 6.

7. A method of manufacturing a color filter substrate having pixel portions arrayed in a matrix on a substrate, comprising:

forming a first region and a second region adjacent to each other within each of the pixel portions;

forming a first colored layer at parts in the first region; and

forming a second colored layer in the second region and parts of the first region except a formation region of the first colored layer.

8. The method of manufacturing a color filter substrate as defined in claim 7, the forming the first colored layer further including:

forming a first raw material film on a whole surface of the each pixel portion;

forming a resist film on the first raw material film;

subjecting the resist film to exposure to light for a predetermined pattern, and developing an exposed region of the resist film; and

etching both the resist film and the first raw material film.

9. The method of manufacturing a color filter substrate as defined in claim 7, the forming the second colored layer further including:

forming a second raw material film having a thickness greater than a thickness of the second colored layer to be finally formed; and

baking the second raw material film.

10. The method of manufacturing a color filter substrate as defined in claim 8, the predetermined pattern including a matrix-like pattern at parts corresponding to the first region.

11. The method of manufacturing a color filter substrate as defined in claim 10, a total of areas of individual shapes constituting the matrix-like pattern being smaller than an area of a part within the matrix-like pattern except the individual shapes.

12. The method of manufacturing a color filter substrate as defined in claim 7, a predetermined distance being set between an outer edge of a region where the first colored layer is formed and an inner edge of the first region.