Out-of-plane compensation suspension for an accelerometer
First Claim
1. A high aspect ratio microelectromechanical system device for measuring an applied force, the device comprising:
- a frame;
a proof mass coupled to the frame for in-plane motion along an axis of symmetry, the proof mass having first and second pluralities of spaced apart capacitor plates projected therefrom on each side of the axis of symmetry and oriented substantially crosswise to the axis of symmetry; and
third and fourth pluralities of spaced apart capacitor plates oriented substantially crosswise to the axis of symmetry of the proof mass and intermeshed respectively with the first and second pluralities of capacitor plates, the third and fourth pluralities of capacitor plates being suspended for rotational motion relative to the frame about respective first and second axes of rotation oriented substantially parallel with the axis of symmetry of the proof mass.
2 Assignments
0 Petitions
Accused Products
Abstract
A high aspect ratio microelectromechanical system device for measuring an applied force and having a suspension structure for compensating out-of-plane displacements of the device proof mass, wherein the device includes a frame; a proof mass coupled to the frame for in-plane motion along an axis of symmetry, the proof mass having first and second sets of spaced apart capacitor plates projected therefrom on each side of the axis of symmetry and oriented substantially crosswise to the axis of symmetry; and third and fourth sets of spaced apart capacitor plates oriented substantially crosswise to the axis of symmetry of the proof mass and intermeshed respectively with the first and second sets of capacitor plates, the third and fourth sets of capacitor plates being suspended for motion relative to the frame about respective first and second axes of motion oriented substantially parallel with the axis of symmetry of the proof mass.
-
Citations
22 Claims
-
1. A high aspect ratio microelectromechanical system device for measuring an applied force, the device comprising:
-
a frame; a proof mass coupled to the frame for in-plane motion along an axis of symmetry, the proof mass having first and second pluralities of spaced apart capacitor plates projected therefrom on each side of the axis of symmetry and oriented substantially crosswise to the axis of symmetry; and third and fourth pluralities of spaced apart capacitor plates oriented substantially crosswise to the axis of symmetry of the proof mass and intermeshed respectively with the first and second pluralities of capacitor plates, the third and fourth pluralities of capacitor plates being suspended for rotational motion relative to the frame about respective first and second axes of rotation oriented substantially parallel with the axis of symmetry of the proof mass. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. A high aspect ratio microelectromechanical system device for measuring an applied force, the device comprising:
-
a proof mass having first and second pluralities of electrodes extending on opposing first and second sides of an axis of symmetry and having spaces formed between adjacent electrodes; first and second sets of reference electrodes being spaced from the proof mass on the opposing first and second sides of the axis of symmetry, each set of reference electrodes further comprising a plurality of electrodes positioned in the spaces between the respective first and second pluralities of proof mass electrodes; a frame; one or more proof mass flexures suspending the proof mass relative to the frame for displacement along the axis of symmetry; and first and second reference electrode flexures suspending the respective first and second sets of reference electrodes relative to the frame for motion about respective first and second axes substantially parallel with the proof mass axis of symmetry. - View Dependent Claims (8, 9, 10, 11, 12)
-
-
13. An in-plane comb-type capacitive readout force transducer fabricated as a high aspect ratio microelectromechanical system device for measuring an applied force, the transducer comprising:
-
an instrument frame; a substrate of substantially uniform thickness having substantially planar and mutually parallel spaced apart upper and lower surfaces; a proof mass formed in the substrate of substantially uniform width and length and suspended by one or more flexures at each of two opposing ends for motion relative to the frame in the plane of the substrate and along an axis of motion crosswise to the width, the proof mass having on each of two edges spaced apart by the width a plurality of outwardly projected electrode fingers spaced along the length and aligned substantially crosswise to the axis of motion and forming individual substantially planar capacitor plates oriented substantially crosswise to the axis of motion; and first and second pluralities of frame electrode fingers formed in the substrate and spaced on opposite sides of the proof mass and substantially fixedly secured to the frame relative to the axis of motion of the proof mass, the first and second pluralities of frame electrode fingers being inwardly projected toward the proof mass and inter-spaced with the outwardly projected electrode fingers spaced along the length of the proof mass and forming individual substantially planar capacitor plates oriented substantially crosswise to the axis of motion of the proof mass and cooperating with the capacitor plates of the proof mass for forming individual capacitors therebetween when an electrical current is applied thereto, each of the first and second pluralities of frame electrode fingers being suspended by one or more torsional flexures for motion relative to the frame about respective first and second axes of rotation aligned substantially parallel with the axis of motion of the proof mass. - View Dependent Claims (14, 15, 16, 17, 18)
-
-
19. A method of forming a suspension structure for compensating out-of-plane displacements of a proof mass of a device formed as a high aspect ratio microelectromechanical system, the method comprising:
-
forming a frame in a first substrate, using a high aspect ratio microelectromechanical system method of fabrication, forming in a second substrate, a proof mass having first and second sets of spaced apart capacitor plates projected therefrom on each side of an axis of symmetry and oriented substantially crosswise to the axis of symmetry, one or more in-line flexures coupled to the proof mass in line with the axis of symmetry, third and fourth sets of spaced apart capacitor plates oriented substantially crosswise to the axis of symmetry of the proof mass and intermeshed respectively with the first and second sets of capacitor plates, and first and second torsional flexures coupled to the third and fourth sets of capacitor plates along respective first and second axes of motion substantially aligned with the axis of symmetry of the proof mass; securing the in-line flexures for suspending the proof mass for primary motion along the axis of symmetry; and securing ends of the first and second torsional flexures for suspending the third and fourth sets of capacitor plates for motion about the respective first and second axes of motion. - View Dependent Claims (20, 21, 22)
-
Specification