Bistable actuation techniques, mechanisms, and applications

• US 6,911,891 B2
• Filed: 01/18/2002
• Issued: 06/28/2005
• Est. Priority Date: 01/19/2001
• Status: Expired due to Fees

• Current Assignee: Massachusetts Institute of Technology
• Original Assignee: Massachusetts Institute of Technology
• Inventors: Slocum, Alexander H., Li, Jian, Qiu, Jin, Struempler, Ralf, Brenner, Michael P., Lang, Jeffrey H.
• Primary Examiner(s): Vortman, Anatoly
• Application Number:
  US10/052,667
• Publication Number:
  US 20030029705A1
• Time in Patent Office: 1,257 Days
• Field of Search: 337/14, 337/16, 337/36, 337/52, 337/53, 337/85, 337/89, 337/139, 337/140, 337/333, 337/362, 337/365, 251/129.02, 60527-529
• US Class Current: 337/53
• CPC Class Codes: B33Y 80/00 Products made by additive manufacturing
• CPC Class Codes: B81B 2201/016 having a bridge fixed on two ends and connected to one or more dimples
• CPC Class Codes: B81B 2203/0109 Bridges
• CPC Class Codes: B81B 2203/051 Translation according to an axis parallel to the substrate
• CPC Class Codes: B81B 3/0051 For defining the movement, i.e. structures that guide or limit the movement of an element mechanical arrangements for preventing or damping vibration or shock H01H3/60
• CPC Class Codes: H01H 1/0036 Switches making use of microelectromechanical systems [MEMS] for electromagnetic relays H01H50/005; for electrostatic relays H01H59/0009
• CPC Class Codes: H01H 1/24 with resilient mounting
• CPC Class Codes: H01H 2001/0042 Bistable switches, i.e. having two stable positions requiring only actuating energy for switching between them, e.g. with snap membrane or by permanent magnet
• CPC Class Codes: H01H 2061/006 Micromechanical thermal relay
• CPC Class Codes: H01H 50/005 using micromechanics
• CPC Class Codes: H01H 59/0009 making use of micromechanics
• CPC Class Codes: H01H 61/00 Electrothermal relays thermal switches not operated by electrical input, thermal switches with anticipating electrical input H01H37/00; thermally-sensitive members H01H37/32

Abstract

A bistable structure provided by the invention is characterized as including a deflection element that has mechanically constrained end points and a compliant span between the end points that is substantially free to deflect between two stable positions when a force is applied at a point along the span. The deflection element span is provided, as-fabricated, curved in one of the two stable positions and in a mechanically unstressed condition along the length of the span. The as-fabricated curve of the deflection element span includes a curve maxima at a point along the span length that is at least about ¼ of the span length from the end points of the span. The deflection element span is constrained to substantially prohibit development of a second bending mode that is characteristic for the span as the element deflects between the two stable positions.

Claims

1. A bistable structure comprising:

a deflection element including mechanically constrained end points and a compliant span between the end points that is substantially free to deflect between two stable positions when a force is applied to the span;

wherein the deflection element span is provided, as-fabricated, curved in one of the two stable positions;

wherein the as-fabricated curve of the deflection element span includes a curve maxima at a point along span length that is at least about ¼

of the span length from the end points of the span;

wherein the deflection element span is characterized by a thickness that is modulated along the span; and

wherein the deflection element span is configured to substantially prohibit development of a second bending mode that is characteristic for the span as the element deflects between the two stable positions.

2. The bistable structure of claim 1 wherein the deflection element comprises a beam.

3. The bistable structure of claim 1 wherein the deflection element comprises two beams connected together at a point along the spans of the beams by an interconnecting clamp that limits development of a second bending mode that is otherwise characteristic for the spans as the element deflects between the two stable positions.

4. The bistable structure of claim 1 wherein the deflection element comprises a plate constrained at its outside diameter.

5. The bistable structure of claim 1 wherein the deflection element comprises a diaphragm constrained at its outside diameter.

6. The bistable structure of claim 1 wherein the constrained end points of the span are rigidly constrained to prevent angular deflection.

7. The bistable structure of claim 1 wherein the constrained end points of the span are hinged to allow angular deflection.

8. The bistable structure of claim 1 wherein the constrained end points of the span comprises torsional spring elements.

9. The bistable structure of claim 1 wherein the span comprises aluminum.

10. The bistable structure of claim 1 wherein the span comprises silicon.

11. The bistable structure of claim 9 wherein the curve of the deflection element span corresponds to a lithographic mask defining the curve as-fabricated.

12. The bistable structure of claim 11 wherein the lithographic mask defines an etch mask pattern for etching the curve of the deflection element span.

13. The bistable structure of claim 1 wherein the curve of the deflection element span comprises a trajectory along the span length corresponding to a first bending mode characteristic for the span.

14. The bistable structure of claim 1 wherein the curve of the deflection element span comprises a trajectory along the span length defined as $\frac{\stackrel{\_}{d}(1-\cos }{}$

(2⁢

π

⁢

 

⁢

x/l)2,

where {overscore (d)} is the curve maxima value and x is the distance along the span length between 0 and l.

15. The bistable structure of claim 1 wherein the maxima of the curve of the deflection element span is located at substantially the center of the span.

16. The bistable structure of claim 1 further comprising a plurality of electrically conductive relay contacts disposed at positions that are separated from the deflection element by a separation distance selected such that an electrical connection is provided between the relay contacts when the deflection element is in one of the two stable positions.

17. The bistable structure of claim 16 wherein the electrical connection provided between the relay contacts comprises mechanical contact of each relay contact with an electrically conducting cross bar that is compliantly connected to the deflection element.

18. The bistable structure of claim 1 further comprising a force generation actuator including a mechanical force applicator that is disposed relative to the deflection element to apply a force to the deflection element span and that is connected to receive an electrical stimulus for applying the force.

19. The bistable structure of claim 18 wherein the electrical stimulus comprises an electrostatic actuation voltage.

20. The bistable structure of claim 18 wherein the electrical stimulus comprises a thermal actuation voltage.

21. The bistable structure of claim 1 wherein the modulated element thickness comprises a gradual variation in thickness lengthwise along the deflection element span.

22. The bistable structure of claim 21 wherein the gradual variation in thickness comprises a sinusoidal variation.

23. The bistable structure of claim 1 wherein the deflection element thickness modulation produces a ratio in force required to move from a first stable position to a second stable position and from the second stable position back to the first stable position that is less than 1.5.

24. The bistable structure of claim 4 wherein the deflection element comprises two plates connected together at a point between the plates by an interconnecting feature that limits development of a second bending mode that is otherwise characteristic for the plates as the element deflects between the two stable positions.

25. The bistable structure of claim 5 wherein the deflection element comprises two diaphragms connected together at a point between the diaphragms by an interconnecting feature that limits development of a second bending mode that is otherwise characteristic for the diaphragms as the element deflects between the two stable positions.

26. The bistable structure of claim 1 wherein the span comprises a material characterized by a constant Young'"'"'s modulus, obeying Hooke'"'"'s Law.

27. The bistable structure of claim 1 wherein the span comprises a microelectronic material.

28. The bistable structure of claim 1 wherein the span is configured to support passage of an electrical current along the span in a direction corresponding to an applied magnetic field for generating a magnetic deflection force on the deflection element.