Ellipsometric method and control device for making a thin-layered component
First Claim
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1. A method of controlling manufacture of anisotropic objects and controlling manufacture of depolarizing objects, comprising the sequential steps of:
- determining at least two selected components of the Mueller matrix that represents the object and that characterizes the manufacture of the object, the selected components being other than ellipsometric angles ψ and
Δ and
the trigonometric functions of the ellipsometric angles ψ and
Δ
;
making an ellipsometric measurement of object during manufacture;
extracting, from the ellipsometric measurement, only the determined selected components of the Mueller matrix; and
controlling the manufacture of the object in relation to the extracted components of the Mueller matrix, the at least two selected components being one of a linear combination of the lines of the Mueller matrix and a linear combination of the columns of the Mueller matrix.
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Abstract
A method for controlling the production of an object controlled by a gas panel, by performing an ellipsometric measurement on the object represented by its Mueller matrix; controlling, with a gas panel, the manufacture on the basis of the ellipsometric measurement. Certain parameters of the Mueller matrix are determined in advance, for characterizing the manufacture, and only these parameters are extracted from the ellipsometric measurement during manufacture, the parameters being two different parameters of the ellipsometric angles ψ and Δ and trigonometric functions thereof.
19 Citations
18 Claims
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1. A method of controlling manufacture of anisotropic objects and controlling manufacture of depolarizing objects, comprising the sequential steps of:
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determining at least two selected components of the Mueller matrix that represents the object and that characterizes the manufacture of the object, the selected components being other than ellipsometric angles ψ and
Δ and
the trigonometric functions of the ellipsometric angles ψ and
Δ
;
making an ellipsometric measurement of object during manufacture;
extracting, from the ellipsometric measurement, only the determined selected components of the Mueller matrix; and
controlling the manufacture of the object in relation to the extracted components of the Mueller matrix, the at least two selected components being one of a linear combination of the lines of the Mueller matrix and a linear combination of the columns of the Mueller matrix. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An installation for making anisotropic objects and making depolarizing objects, comprising:
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an ellipsometer configured to make an ellipsometric measurement of an object during manufacture;
a processor configured to extract, from the ellipsometric measurement, only determined selected components of the Mueller matrix that represents the object and that characterizes the manufacture of the object, the processor also configured to control the manufacture of the object in relation to the extracted components of the Mueller matrix, wherein, the determined selected components are at least two selected components of the Mueller matrix that characterize the manufacture of the object, and the determined selected components are other than ellipsometric angles ψ and
Δ and
trigonometric functions of the ellipsometric angles ψ and
Δ
,the at least two selected components being one of a linear combination of the lines of the Mueller matrix and a linear combination of the columns of the Mueller matrix. - View Dependent Claims (14, 15, 16, 17)
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18. A manufacturing installation, comprising:
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a plasma chamber (1) with power control;
a support (3) within the chamber for supporting a substrate (2) serving as an original element of a solid-state wafer to be manufactured;
a pump (4) connected to the chamber to maintain a pressure within the chamber;
a gas panel (6) connected to the chamber to supply the chamber with gas, the gas panel having plural gas inputs (62-65), each gas input connected to the chamber via a flow-meter (621, 631, 641, 651) and a valve (622, 632, 642, 652);
an ellipsometer (9) comprising a transmission head (91) and a receiving assembly (92), the ellipsometer arranged to control the gas panel to control a preparation of layers on the substrate based on ellipsometric measurement of the substrate, the transmission head comprising a phase modulator, the receiving assembly comprising a polarizer-analyzer;
a first processing unit (93) connected to the transmission head to control the phase modulator, and connected to the receiving assembly to receive an output signal from the polarizer-analyzer, the first processing unit configured to extract, from the ellipsometric measurement, only determined selected components of the Mueller matrix describing the substrate and to control the manufacture of the substrate in relation to the extracted components of the Mueller matrix, a second processing unit connected to the first processing unit for receiving control signals from the first processing unit, and connected to the gas panel, the pump, and the power control of the chamber, wherein, the determined selected components are at least two selected components of the Mueller matrix that characterize the manufacture of the object, the selected components being other than ellipsometric angles ψ and
Δ and
trigonometric functions of the ellipsometric angles ψ and
Δ
,the two selected components being one of a linear combination of the lines of the Mueller matrix and a linear combination of the columns of the Mueller matrix.
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Specification
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Current AssigneeCentre National De La Recherche Scientifique
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Original AssigneeCentre National De La Recherche Scientifique
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InventorsDrevillon, Bernard
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Primary Examiner(s)Smith, Zandra V.
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Application NumberUS09/719,825Time in Patent Office2,216 DaysField of Search438/3, 438 5- 18, 356/31, 356364-370, 356/5, 430/30, 430/5, 250/225US Class Current356/369CPC Class CodesG01N 21/211 Ellipsometry optical thickn...
