Temperature controlled window with a fluid supply system
First Claim
1. A processing chamber, comprising:
- a chamber body;
a substrate support member disposed within the chamber body;
a retaining ring having one or more feedthrough holes formed therein;
one or more feedthroughs disposed in the one or more feedthrough holes; and
a chamber lid connected to the retaining ring by the one or more feedthroughs, the chamber lid comprising a first plate coupled to a second plate, wherein the first plate and the second plate form a temperature control channel, wherein a fluid inlet and a fluid outlet are formed in the chamber lid, and wherein the fluid inlet and the fluid outlet are fluidly coupled to the one or more feedthroughs.
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Accused Products
Abstract
The present invention provides a temperature controlled energy transparent window or electrode used to advantage in a substrate processing system. The invention also provides methods associated with controlling lid temperature during processing and for controlling etching processes. In a preferred embodiment the invention provides a fluid supply system for the lid which allows the fluid to flow through a feedthrough and into and out of a channel formed in the window or electrode. The fluid supply system may also mount the window or electrode to a retaining ring which secures the window or electrode to the chamber. In another aspect the invention provides a bonded window or electrode having a first and second plate having a channel formed in the plates so that when the plates are bonded together they form a channel therein through which a temperature controlling fluid can be flowed. An external control system preferably regulates the temperature of the fluid.
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Citations
20 Claims
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1. A processing chamber, comprising:
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a chamber body;
a substrate support member disposed within the chamber body;
a retaining ring having one or more feedthrough holes formed therein;
one or more feedthroughs disposed in the one or more feedthrough holes; and
a chamber lid connected to the retaining ring by the one or more feedthroughs, the chamber lid comprising a first plate coupled to a second plate, wherein the first plate and the second plate form a temperature control channel, wherein a fluid inlet and a fluid outlet are formed in the chamber lid, and wherein the fluid inlet and the fluid outlet are fluidly coupled to the one or more feedthroughs. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A processing chamber comprising:
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a chamber body;
a substrate support member disposed within the chamber body;
a retaining ring coupled to the chamber body, wherein the retaining ring has a feedthrough hole formed therein;
a chamber lid coupled to the retaining ring, wherein the chamber lid forms a fluid inlet, a fluid outlet, and a temperature control channel, and wherein the temperature control channel is fluidly connected to the fluid inlet and fluid outlet; and
a feedthrough disposed in a feedthrough hole, wherein the feedthrough is fluidly connected to the temperature control channel, and wherein the feedthrough attaches the chamber lid to the retaining ring.
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Specification